Catadioptric projection objective with parallel, offset optical axes

ABSTRACT

A projection objective configured to image an object field in an object plane into an image field in an image field plane includes a reflective unit, a first refractive unit, and a second refractive unit. An optical axis of the first refractive unit is parallel to but displaced from an optical axis of the second refractive unit. The reflective unit includes a first curved mirror and a second curved mirror. The second curved mirror is immediately downstream from the first curved mirror in a path of light from the object plane to the image plane. The projection objective is a microlithography projection objective.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of U.S. patent application Ser. No. 14/677,089, filed Apr. 2, 2015, which is a continuation of U.S. patent application Ser. No. 14/317,327, filed Jun. 27, 2014, which is a continuation of U.S. patent application Ser. No. 13/495,763, filed Jun. 13, 2012, now U.S. Pat. No. 8,804,234, which is a continuation of U.S. patent application Ser. No. 13/153,544, filed Jun. 6, 2011, now U.S. Pat. No. 8,289,619, which is a continuation of U.S. patent application Ser. No. 12/817,628, filed Jun. 17, 2010, now U.S. Pat. No. 8,339,701, which is a continuation of U.S. patent application Ser. No. 12/100,233, filed Apr. 9, 2008, now U.S. Pat. No. 7,869,122, which is a divisional of U.S. patent application Ser. No. 11/035,103, filed Jan. 14, 2005, now U.S. Pat. No. 7,385,756, which claims priority benefit to U.S. Provisional 60/536,248 filed Jan. 14, 2004; U.S. Provisional 60/587,504 filed Jul. 14, 2004; U.S. Provisional 60/612,823 filed Sep. 24, 2004; U.S. Provisional 60/617,674 filed Oct. 13, 2004. The disclosures of all of these Provisional applications and of U.S. patent application Ser. Nos. 11/035,103, 12/100,233, 12/817,628, 13/153,544, 13/495,763 and 14/317,327 are incorporated into this application by reference.

BACKGROUND OF THE INVENTION Field of the Invention

The invention relates to a catadioptric projection objective for imaging a pattern arranged in an object plane onto an image plane.

Description of the Related Art

Projection objectives of that type are employed on projection exposure systems, in particular wafer scanners or wafer steppers, used for fabricating semiconductor devices and other types of microdevices and serve to project patterns on photomasks or reticles, hereinafter referred to generically as “masks” or “reticles,” onto an object having a photosensitive coating with ultrahigh resolution on a reduced scale.

In order create even finer structures, it is sought to both increase the image-end numerical aperture (NA) of the projection objective to be involved and employ shorter wavelengths, preferably ultraviolet light with wavelengths less than about 260 nm.

However, there are very few materials, in particular, synthetic quartz glass and crystalline fluorides, that are sufficiently transparent in that wavelength region available for fabricating the optical elements required. Since the Abbé numbers of those materials that are available lie rather close to one another, it is difficult to provide purely refractive systems that are sufficiently well color-corrected (corrected for chromatic aberrations).

In view of the aforementioned problems, catadioptric systems that combine refracting and reflecting elements, i.e., in particular, lenses and mirrors, are primarily employed for configuring high-resolution projection objectives of the aforementioned type.

The high prices of the materials involved and limited availability of crystalline calcium fluoride in sizes large enough for fabricating large lenses represent problems, particularly in the field of microlithography at 157 nm for very large numerical apertures, NA, of, for example, NA=0.80 and larger. Measures that will allow reducing the number and sizes of lenses employed and simultaneously contribute to maintaining, or even improving, imaging fidelity are thus desired.

Catadioptric projection objectives having at least two concave mirrors have been proposed to provide systems with good color correction and moderate lens mass requirements. The U.S. Pat. No. 6,600,608 B1 discloses a catadioptric projection objective having a first, purely refractive objective part for imaging a pattern arranged in the object plane of the projection objective into a first intermediate image, a second objective part for imaging the first intermediate image into a second intermediate image and a third objective part for imaging the second intermediate image directly, that is without a further intermediate image, onto the image plane. The second objective part is a catadioptric objective part having a first concave mirror with a central bore and a second concave mirror with a central bore, the concave mirrors having the mirror faces facing each other and defining an intermirror space or catadioptric cavity in between. The first intermediate image is formed within the central bore of the concave mirror next to the object plane, whereas the second intermediate image is formed within the central bore of the concave mirror next to the object plane. The objective has axial symmetry and provides good color correction axially and laterally. However, since the reflecting surfaces of the concave mirrors are interrupted at the bores, the pupil of the system is obscured.

The Patent EP 1 069 448 B1 discloses another catadioptric projection objective having two concave mirrors facing each other. The concave mirrors are part of a first catadioptric objective part imaging the object onto an intermediate image positioned adjacent to a concave mirror. This is the only intermediate image, which is imaged to the image plane by a second, purely refractive objective part. The object as well as the image of the catadioptric imaging system are positioned outside the intermirror space defined by the mirrors facing each other. Similar systems having two concave mirrors, a common straight optical axis and one intermediate image formed by a catadioptric imaging system and positioned besides one of the concave mirrors are disclosed in Japanese patent application JP 2002208551 A and US patent application US 2002/00241 A1.

European patent application EP 1 336 887 (corresponding to US 2004/0130806 A1) discloses catadioptric projection objectives having one common straight optical axis and, in that sequence, a first catadioptric objective part for creating a first intermediate image, a second catadioptric objective part for creating a second intermediate image from the first intermediate image, and a refractive third objective part forming the image from the second intermediate image. Each catadioptric system has two concave mirrors facing each other. The intermediate images lie outside the intermirror spaces defined by the concave mirrors. Concave mirrors are positioned optically near to pupil surfaces closer to pupil surfaces than to the intermediate images of the projection objectives.

In the article “Nikon Projection Lens Update” by T. Matsuyama, T. Ishiyama and Y. Ohmura, presented by B. W. Smith in: Optical Micro lithography XVII, Proc. of SPIE 5377.65 (2004) a design example of a catadioptric projection lens is shown, which is a combination of a conventional dioptric DUV system and a 6-mirror EUV catoptric system inserted between lens groups of the DUV system. A first intermediate image is formed behind the third mirror of the catoptric (purely reflective) group upstream of a convex mirror. The second intermediate image is formed by a purely reflective (catoptric) second objective part. The third objective part is purely refractive featuring negative refractive power at a waist of minimum beam diameter within the third objective part for Petzval sum correction.

Japanese patent application JP 2003114387 A and international patent application WO 01/55767 A disclose catadioptric projection objectives having one common straight optical axis, a first catadioptric objective part for forming an intermediate image and a second catadioptric objective part for imaging the intermediate image onto the image plane of this system. Concave and convex mirrors are used in combination.

US provisional application with Ser. No. 60/511,673 filed on Oct. 17, 2003 by the applicant discloses catadioptric projection objectives having very high NA and suitable for immersion lithography at NA>1. In preferred embodiments, exactly three intermediate images are created. A cross-shaped embodiment has a first, refractive objective part creating a first intermediate image from the object, a second, catadioptric objective part for creating a second intermediate image from the first object, a third, catadioptric objective part for creating a third intermediate image from the second intermediate image and a fourth, refractive objective part for imaging the third intermediate image onto the image plane. The catadioptric objective parts each have one concave mirror, and planar folding mirrors are associated therewith. The concave mirrors are facing each other with the concave mirror surfaces. The folding mirrors are arranged in the middle or the intermirror space defined by the concave mirrors. The concave mirrors may be coaxial and the optical axes of the catadioptric parts may be perpendicular or at an angle with respect to the optical axis defined in the refractive imaging systems.

The full disclosure of the documents mentioned above is incorporated into this application by reference.

The article “Camera view finder using tilted concave mirror erecting elements” by D. DeJager, SPIE. Vol. 237 (1980) p. 292-298 discloses camera view finders comprising two concave mirrors as elements of a 1:1 telescopic erecting relay system. The system is designed to image an object at infinity into a real image, which is erect and can be viewed through an eyepiece. Separate optical axes of refractive system parts upstream and downstream of the catoptric relay system are parallel offset to each other. In order to build a system having concave mirrors facing each other mirrors must be tilted. The authors conclude that physically realizable systems of this type have poor image quality. International patent applications WO 92/05462 and WO 94/06047 and the article “Innovative Wide-Field Binocular Design” in OSA/SPIE Proceedings (1994) pages 389ff disclose catadioptric optical systems especially for binoculars and other viewing instruments designed as in-line system having a single, unfolded optical axis. Some embodiments have a first concave mirror having an object side mirror surface arranged on one side of the optical axis and a second concave mirror having a mirror surface facing the first mirror and arranged on the opposite side of the optical axis such that the surface curvatures of the concave mirrors define and intermirror space. A front refractive group forms a first intermediate image near the first mirror and a second intermediate image is formed outside of the space formed by the two facing mirrors. A narrow field being larger in a horizontal direction than in a vertical direction is arranged offset to the optical axis. The object side refractive group has a collimated input and the image side refractive group has a collimated output and entrance and exit pupils far from telecentric are formed. The pupil shape is semi-circular unlike pupil surfaces in lithographic projection lenses, which have to be circular and centered on the optical axis.

The PCT application WO 01/044682 A1 discloses catadioptric UV imaging systems for wafer inspection having one concave mirror designed as Mangin mirror.

SUMMARY OF THE INVENTION

It is one object of the invention to provide a catadioptric projection objective suitable for use in the vacuum ultraviolet (VUV) range having potential for very high image side numerical aperture which may be extended to values allowing immersion lithography at numerical apertures NA>1. It is another object of the invention to provide catadioptric projection objectives that can be build with relatively small amounts of optical material.

As a solution to these and other objects the invention, according to one formulation, provides a catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective comprising:

a first objective part for imaging the pattern provided in the object plane into a first intermediate image;

a second objective part for imaging the first intermediate image into a second intermediate image;

a third objective part for imaging the second intermediate image onto the image plane;

wherein a first concave mirror having a first continuous mirror surface and at least one second concave mirror having a second continuous mirror surface are arranged upstream of the second intermediate image;

pupil surfaces are formed between the object plane and the first intermediate image, between the first and the second intermediate image and between the second intermediate image and the image plane; and

all concave mirrors are arranged optically remote from a pupil surface.

In designs according to this aspect of the invention a circular pupil centered around the optical axis can be provided in a centered optical system. Two or more concave mirrors in the system parts contributing to forming the second intermediate image are provided, where the used area of the concave mirrors deviates significantly from an axial symmetric illumination. In preferred embodiments exactly two concave mirrors are provided and are sufficient for obtaining excellent imaging quality and very high numerical aperture. Systems having one common unfolded (straight) optical axis can be provided which facilitate manufacturing, adjustment and integration into photolithographic exposure systems. No planar folding mirrors are necessary. However, one ore more planar folding mirrors can be utilized to obtain more compact designs.

All concave mirrors are arranged “optically remote” from pupil surfaces which means that they are arranged outside an optical vicinity of a pupil surface. They may be arranged optically nearer to field surfaces than to pupil surfaces. Preferred positions optically remote from a pupil surface (i.e. outside an optical vicinity of a pupil surface) may be characterized by the ray height ratio H=h_(C)/h_(M)>1, where h_(C) is the height of a chief ray and h_(M) is the height of a marginal ray of the imaging process. The marginal ray height h_(M) is the height of a marginal ray running from an inner field point (closest to the optical axis) to the edge of an aperture stop, whereas the chief ray height h_(C) is the height of a chief ray running from an outermost field point (farthest away from the optical axis) parallel to or at small angle with respect to the optical axis and intersecting the optical axis at a pupil surface position where an aperture stop may be positioned. With other words: all concave mirrors are in positions where the chief ray height exceeds the marginal ray height.

A position “optically remote” from a pupil surface is a position where the cross sectional shape of the light beam deviates significantly from the circular shape found in a pupil surface or in an immediate vicinity thereto. The term “light beam” as used here describes the bundle of all rays running from the object plane to the image plane. Mirror positions optically remote from a pupil surface may be defined as positions where the beam diameters of the light beam in mutually perpendicular directions orthogonal to the propagation direction of the light beam deviate by more than 50% or 100% from each other. In other words, illuminated areas on the concave mirrors may have a shape having a form strongly deviating from a circle and similar to a high aspect ratio rectangle corresponding to a preferred field shape in lithographic projection objectives for wafer scanners. Therefore, small concave mirrors having a compact rectangular or near rectangular shape significantly smaller in one direction than in the other may be used. A high aperture light beam can therefore be guided through the system without vignetting at mirror edges.

Wherever the terms “upstream” or “downstream” are used in this specification these terms refer to relative positions along the optical path of a light beam running from the object plane to the image plane of the projection objective. Therefore, a position upstream of the second intermediate image is a position optically between the object plane and the second intermediate image.

According to another aspect of the invention there is provided a catadioptric projection objective for imaging a pattern provided in an objective plane of the projection objective onto an image plane of the projection objective comprising:

a first objective part for imaging the pattern provided in the object plane into a first intermediate image;

a second objective part for imaging the first intermediate image into a second intermediate image;

a third objective part for imaging the second intermediate image onto the image plane;

wherein the second objective part includes a first concave mirror having a first continuous mirror surface and a second concave mirror having a second continuous mirror surface, the concave mirror surfaces of the concave mirrors facing each other and defining an intermirror space;

wherein at least the first intermediate image is located geometrically within the intermirror space between the first concave mirror and the second concave mirror.

In this specification the term “intermediate image” generally refers to a “paraxial intermediate image” formed by a perfect optical system and located in a plane optically conjugated to the object plane. Therefore, wherever reference is made to a location or position of an intermediate image, the axial location of this plane optically conjugated to the object plane is meant.

The above aspect of invention may be understood more clearly based on the following general considereations.

As Jan Hoogland has pointed out in some publications, the most difficult requirement that you can ask of any optical design is that it have a flat image, especially if it is an all-refractive design. Providing a flat image requires opposing lens powers and that leads to stronger lenses, more system length, larger system glass mass, and larger higher-order image aberrations that result from the stronger lens curves.

By contrast to this, allowing a system to have a curved image automatically leads to low lens powers, weaker curves, a more compact design with much less glass mass, and much smaller higher-order image aberrations.

Shafer has shown a lens design with a curved image that only uses positive lenses (and no aspherics) and has very good performance. A group of 4 or 5 weak positive lenses in front can provide correction of spherical aberration and coma, and a thick positive immersion lens can provide astigmatism correction. The image is quite curved.

However, a flat image is essential for lithography. Therefore the question then becomes how to provide this with the least disturbance of the good properties that result when a curved image is allowed.

Some classical lens types like the Cooke Triplet and the Double-Gauss designs achieve a flat image by putting strong negative power in the middle of the design. But that completely destroys all the benefits that were just listed of having a curved image, and the lens powers have to be strong and the curves lead to bad higher-order aberrations.

A much better solution is provided by the classical field-flattened Petzval lens design, where a strong negative lens is placed just in front of the image, the closer the better. This negative lens, at the very end of the design, then provides all the image flattening means of the design and the rest of the design has weak curves, low lens powers, small glass volume, etc. In addition, the aberration correction performance is extremely high. That is why this design form was used for the extremely high resolution aerial reconnaissance lenses of the 1960's.

However, this great design cannot be used in lithography since putting a strong negative lens right before the image leads to an exit pupil location that is very far from telecentric. And a telecentric exit pupil is always required in lithography.

Possibly the only way a field-flattened Petzval lens can be given a telecentric exit pupil is to move the aperture stop very far out in front of the design, far away from where it wants to be for good higher-order aberration correction. By contrast some other design types, like the Double-Gauss, can be modified to have a telecentric exit pupil without too much change in the aperture stop position, compared to its preferred location. So because of this telecentric exit pupil requirement in lithography, one is forced to abandon the best design form and move to less desirable ones.

The invention considers these aspects and provides a good compromise solution.

One can keep all the many benefits of a curved image design if one can find some way to flatten the image, have a telecentric exit pupil, and yet keep the aperture stop close to where it most wants to be for good aberration correction.

What would be perfect is if a positive power lens could be given the opposite Petzval curvature to what it actually has. Such a “magic lens”, if it could exist, could then be placed right near the curved image of a curved image design. It would then flatten the image and would even help give a telecentric exit pupil while leaving the design's aperture stop where it wants to be.

A concave mirror is ideal for the problem. A concave mirror has positive power, like a positive lens, but the opposite sign of Petzval curvature. So a concave mirror placed right in front of the image could flatten the image of a curved image lens design, have positive power to help in providing a telecentric pupil, and have no color problems.

Unfortunately it also makes the resulting image be completely inaccessible, since it sends the light right back in the direction it came from. One solution might be to use the lens system far off-axis, and then it might be possible to have one or two reflections right near the image and have the final image “walk-off” the mirrors and lie clear outside of the incoming rays. But even a moment of study will show that this is impractical on the high-NA end of the design, or would lead to the main lens system (i.e. the image side focussing lens system) being used so far off-axis that it would have very poor performance.

The situation is much better on the other end of a lithographic design, with about 4× magnification, for example. Then the main refractive design does not have to be used off-axis as much before the low-NA image can be made to “walk-off” a mirror pair. By using two concave mirrors instead of one, the light keeps going in the same direction and the image is accessible. The best performance results occur when the main lens system is used with the least amount of off-axis use. But having the rays get through the concave mirror pair with no vignetting is helped by using the main lens system far off-axis. These are then incompatible goals.

In order to minimize vignetting problems and to make them insensitive on the system overall numerical aperture it is favorable to have intermediate images with low NA next to all positions where two ray bundels before and after a reflection lie geometrically separated, but next to each other. The clearance is then mainly determined by the field size and scales only very poorly with numerical aperture. This is important to reach real high NA catadioptric designs.

The best solution is to not have the two mirrors be between the main lens system and its low-N.A object end. That then avoids a large amount of off-axis use of the main lens in order to have no vignetting at the mirrors. The mirrors should be physically (not necessarily optically) on either side of the low-NA object. Then the main lens system can be used much closer to the optical axis. A less preferable solution is to have both mirrors be outside of the main system and its low NA end object. In either case, of the last two mentioned, there is a need to reimage the low NA object, since it is no longer the end of the complete system.

While reimaging the object to a first real intermediate image, the system magnification of this first relay system may be designed such that it is an enlarging system. This reduces more and more the NA at the intermediate image and thus relaxes the vignetting problem. The vignetting depends less and less on the system NA.

In a preferred design, there are two concave mirrors on either side (again, physically, not optically) of the low-NA object plane of the main lens system and the system is used as close to the axis as possible without mirror vignetting. Then either another refractive system or a catadioptric system, working e.g. at about 1× or 1.5× enlargement, is used to relay this buried object to another real image location.

Another solution, with both mirrors physically and optically outside of the low-NA object, gives the possibility of just these same two mirrors doing the re-imaging. But the requirement of a fairly large working distance and thick mirror substrates makes this not practical without vignetting problems that require using the main system far off-axis. So this other solution also benefits from using a separate 1× or 1.5× enlarging refractive or catadioptric relay system.

In all of these cases, a pair of concave mirrors is used to flatten the image of one or two refractive systems. No convex mirrors are used. The refractive systems can then have the benefits described of being curved image designs.

Designs according to preferred embodiments of the invention with just two reflecting surfaces, both concave, have several advantages compared with the prior art.

In contrast to prior art systems with central pupil obscuration designs according to some embodiments of the invention have small mirror sizes, no obscuration at all, no double or triple-pass lenses, and very effective field flattening of the system due to the strong mirror powers. In other embodiments, double- or triple-pass lenses may be present.

Embodiments according to the invention, which preferably have two refractive relay groups, may have about 3× or 4× reduction magnifycation from the refractive group near the wafer, i.e from the third objective part, (so only high N.A on one end) and the other refractive group (the first objective part) is low NA on both ends. As a result there is much less lens power needed and relatively few elements are needed to get the desired aberration correction.

Some prior art systems have been found to be limited NA systems. By contrast, preferred design according to the invention have no such difficulties and can handle very high NA values close to NA=1 or above, for immersion systems. Preferably, the two intermediate images both have low NA values and there is no problem with the mirrors interfering with each other's space at their rims.

It is to be noted that it is difficult to correct some useful designs according to the present invention for axial colour. However the lenses in preferred embodiments are small enough, and their powers weak enough, so that the axial color of the new design is at an acceptable value.

Other prior art high NA catadioptric systems for lithography, either require at least one convex mirror in the design, or have multiple mirrors and tend to give very long track length designs. The use of a convex mirror, in combination with a concave mirror and some lenses, can be the basis of a catadioptric design and can make it possible to have an unobscured design that does not have to be used too far off-axis to avoid vignetting. This is a characteristic of some prior patent designs which are in-line systems with no flat fold mirrors. The catadioptric part is on the reticle end of the system. There are at least two problems with such designs. One is that the first intermediate image after the reticle has to be clear of the concave mirror, and the light rays leaving the convex mirror tend to have relatively steep angles with respect to the optical axis in order to clear the edge of the concave mirror without vignetting. Some field lenses or field mirrors are then required to catch these rays and bend them back towards the optical axis and the main focusing lens group. These field lens or mirrors have to be quite large and strong in power to catch the rays and reimage the pupil towards the main focusing lens group. If they are field lenses, then they are large in diameter, have strong positive power, and result in an excess of glass volume in the design. In addition they have a lot of positive power and make further difficulties in correcting the Petzval curvature of the system. If, instead, field mirrors are used then they have to be quite large in diameter and it is difficult to configure them to avoid vignetting of the rays. They do, however, help with Petzval correction since they have the opposite sign from field lenses. The second problem with these kinds of system is that the convex mirror in the system has the wrong sign of Petzval curvature to help with image flattening. This then tends to lead to 4 or 6 mirror systems in order to find a way with several mirrors to provide the system with enough good Petzval correction from mostly concave mirrors so that this burden does not fall entirely on the main focusing lens group.

Preferred embodiments of the invention, by contrast, do not have any convex mirror and have some characteristics that allow it to work quite close to the optical axis without obscuration or vignetting. This then means that the intermediate image size is not so large and the field lenses in the design do not have to be too large. Since there is no convex mirror, but just two concave mirrors, the new design is quite simple compared to the multi-mirror systems of the prior art. Its two concave mirrors may provide just the right amount of Petzval correction for the lenses in the system, which may be almost all positive, and the resulting design has a relatively short track length, small size elements, small glass volume, very good aberration correction, and the capability of working with very high immersion NA values.

There are other particularly useful features specific to the new design according to the invention. As the NA value of the design is increased, it makes almost no difference to the sizes of the mirrors, or how close the design can work to the optical axis. All other in-line designs from the prior art have to keep working further and further off-axis, as the NA is increased, in order to avoid vignetting and obscuration. That leads to worse high-order aberrations, a drop in performance, and larger element sizes in the catadioptric part. The new design is quite unusual in not having that problem.

An alternative to embodiments having one common straight optical axis is provided by catadioptric designs which have at least one flat fold mirror. Then part of the optical path is folded, e.g. at 90 degrees to the optical axis, and then brought back and refolded back again so that the reticle and wafer are parallel. The input and output axis (i.e. object and image side part of the optical axis) may be co-axial, in some embodiments, or have a lateral off-set in some other embodiments.

Such designs can have just one powered mirror in the system, which is a concave mirror, and two flat fold mirrors. Some, designs, like the design disclosed in US provisional application with Ser. No. 60/511,673 filed on Oct. 17, 2003 by the applicant, have two concave mirrors and two flat fold mirrors. These folded designs can have many of the good properties of the new design according to the invention that is being discussed here. However, there may occur polarization problems with these fold mirrors and that makes the preferred embodiments, with no fold mirrors, very attractive.

In some embodiments there is at least one lens having a free entry surface and a free exit surface arranged within the intermirror space, wherein the lens is transited at least twice in the optical path between an intermediate image and a concave mirror or vice versa. Such mirror-related lens may have negative refractive power and may be designed as a meniscus lens having a sense of curvature similar to the concave mirror to which it is assigned. Color correction can be positively influenced this way. The lens may be designed as a truncated lens being arranged exclusively on the side of the optical axis where the associated concave mirror is situated. If a mirror-related lens is extended across the optical axis, the lens may be transited three times by the radiation, thus increasing optical effect without significantly increasing lens mass. One or both concave mirrors may have mirror-related lenses.

In some embodiments the first concave mirror and the second concave mirror are designed to have essentially the same or exactly the same curvature. This allows to manufacture the concave mirrors simultaneously from the same blank material such that firstly a mirror blank for the first and second concave mirror is manufactured and that, afterwards, the mirror blank is separated into two truncated mirrors used as the first and second concave mirror. Manufacturing can be facilitated and more cost effective this way. Likewise, lens material used for two similar truncated mirror-related lenses can be manufactured from one lens blank, which is shaped first and than separated into two truncated lenses. Systems having catadioptric subgroups which are designed identically or almost identically and which can be arranged symmetrically with respect to each other can be provided this way at reasonable costs for manufacturing.

In some embodiments at least one mirror surface of a concave mirror is aspheric. In some embodiments, concave surfaces of both concave mirrors are aspheric. Aspheric concave mirrors facilitate optical correction and allow to reduce lens mass.

In some embodiments it has been found useful to have at least one lens arranged between an intermediate image and the associated concave mirror, wherein at least one surface of the lens is aspheric. The aspheric surface may be the surface facing the intermediate image. Field aberrations can be corrected effectively this way.

In some embodiments both concave mirrors have spherical mirror surfaces, thus facilitating manufacturing and improving optical performance. It has been found useful if the following condition is fulfilled: 1<D/(|c₁|+|c₂|)·10⁻⁴<6. Here, D is a maximum diameter of a lens element of the third objective part in [mm] and c₁ and c₂ are the curvatures of the concave mirrors in [mm⁻¹]. If this condition is fulfilled, then there is an optimum balance between the positive power in the third imaging system and the Petzval correction due to the concave mirrors in the projection objective. This condition applies for both spherical and aspherical concave mirrors.

As the basic shape and, if applicable, the aspheric character of a concave mirror strongly influences optical performance, ways of manufacturing of concave mirrors are desired in order to produce high quality mirrors having defined optical properties. It has been found that relatively “flat” concave mirrors, i.e. concave mirrors having a relatively shallow depth on the concave side, can be manufactured with particularly high optical quality if the relation p_(max)<0.22R holds where p_(max)=R−(R²−D²/4)^(0.5). In this relation, R is the curvature radius of the aspherical mirror surface and D is the diameter of the aspherical mirror. Preferably, the condition D≦1.3R or, more preferably, the condition D≦1.2R is fulfilled. Parameter p denotes the “sagitta” or “rising height” of a point on an optical surface. This parameter is sometimes also denoted SAG (for sagitta) in the literature. Sagitta p is a function of the height h, i.e. the radial distance from the optical axis, of the respective point

Generally it may be preferred from a manufacturing point of view to make the curvatures of the concave mirrors at the vertex of the mirror surface (vertex curvature) as similar as possible. If the vertex curvature radii of the first and second mirrors are denoted R1 and R2, preferably the following condition holds: 0.8<|R1/R2|<1.2.

Some embodiments are designed such that the first intermediate image is located geometrically within the intermirror space whereas the second intermediate image is arranged outside the mirror space. The first and second objective parts can then be catadioptric objective parts, wherein the first concave mirror is part of the first objective part creating the first intermediate image, whereas the second concave mirror contributes to forming the second intermediate image from the first intermediate image by the second objective part.

A mirror group defined by the first and second concave mirrors facing each other can have a mirror group entry and a mirror group exit, each positioned next to the closest concave mirror closed to an edge of a concave mirror faced in the optical axis. Pupil surfaces of the projection objective can be arranged in the vicinity of the mirror group entry and the mirror group exit such that the mirror group performance a pupil imaging between the mirror group entry and the mirror group exit. The first and second concave mirror can then be disposed on one side of the optical axis. In other embodiments where field surfaces are in the vicinity of the mirror group entry and mirror group exit, the first and second concave mirror may be positioned at opposite sides of the optical axis.

According to another aspect of the invention a projection objective is provided having a first and at least one second concave mirror, wherein the first concave mirror has a first aspheric mirror surface and the second concave mirror has a second aspheric mirror surface, and wherein the first and second mirror surfaces have essentially the same aspheric shape. The aspheric shapes may be identical, i.e. may be described by identical aspheric constants and basic spherical radius. This aspect of the invention may be utilized in embodiments where all concave mirrors are arranged optically remote from the pupil surface, particularly where exactly two concave mirrors are used. However, the advantages may also be used in projection objectives where one or more concave mirrors are positioned in a pupil surface or optically near a pupil surface. If the first and second mirror surface have essentially the same or identical aspheric shape, manufacturing can be simplified since the aspheric shapes can be manufactured using essentially the same grinding and polishing steps or other steps for removing material from a spheric basic shape. Further, the testing process utilized during manufacturing of the aspheric surfaces can be organized cost-efficient since the same testing device for characterizing the aspheric shape can be used for testing more than one concave mirror surface. In that sense, the term “essentially the same aspheric shape” is to be understood to encompass aspheric surface shapes, which can be tested by the same optical testing device. If applicable, the surface shapes may be similar in that sense that the same optical testing device can be used, but with different working distance.

In one embodiment, the second objective part has two concave mirrors, each having an aspheric surface, wherein the first and second mirror surfaces have essentially the same aspheric shape. In one embodiment, the second objective part of this type is a catoptric objective part, i.e. consisting of only two concave mirrors having aspheric mirror surfaces which have essentially the same aspheric shape. Catadioptric second objective parts of this type are also possible.

According to another aspect, the invention provides a catadioptric projection objective having at least one concave mirror, where the mirror surface of the concave mirror has a parabolic shape. In an embodiment, two concave mirrors are provided, wherein at least one of the concave mirrors has a parabolic shape. Utilizing a parabolic mirror (i.e. a concave mirror where a meridian of the mirror is parabolic) has proven advantageous particularly with regard to testing the aspheric surface shape of the mirror. A parabolic mirror collects parallel incident light into one single focus, whereby parallel light rays impinging on the parabolic mirror surface are collected free of spherical aberration in one focal point. Parabolic mirrors of this type can easily be tested optically using comparatively simple optical testing devices designed for creating a test beam having a planar wave front. Optical testing devices with simple construction can be used, thereby making the testing of the aspheric mirror cost-effective.

Whereas optical properties are essential for obtaining the desired function of a projection objective, other factors related to the costs involved for manufacturing the optical system and/or factors influencing the overall size and shape of the optical system may be critical. Also, aspects of lens mounting and incorporation of lens manipulators must be considered. One class of embodiments is particularly advantageous in this respect in that projection objectives having a small number of lens elements, particularly in the first objective part, are provided. In one embodiment, the first objective part has positive lenses only. The term “lens” as used here is meant to designate optical elements having substantive refractive power. In that respect, a plate having essentially parallel plate surfaces is not a lens and may, therefore, be inserted in addition to the positive lenses. Using positive lenses only is enabling for providing axially compact first objective parts having relatively small maximum lens diameter. In one embodiment, the first objective part has only six lenses having substantial refractive power. One or more aspheric surfaces may be provided in the first objective part. By using suitable aspheric shapes of aspheric lens surfaces a compact design can be obtained. As a tendency, the first objective part can be designed more compact the more aspheric surfaces are used. In preferred embodiments a ratio between a number of lens element and a number of aspheric surfaces is less than 1.6. In one embodiment, a first lens element of the first objective part immediately following the object plane has an aspheric surface facing the object plane, wherein the aspheric surface is essentially flat having a local radius R of curvature where R>300 mm at each point of the aspheric surface. Object side telecentricity and an effective correction of field aberration, such as distortion, can be obtained this way.

A compact shape of a dioptric system can also be facilitated if all negative lenses (i.e. lenses with substantial negative refractive power) are arranged optically remote from a pupil plane. With other words, negative lenses optically near a pupil plane should be avoided if a design is to be optimized in respect to a compact shape.

Aspheric surfaces provided on optical elements, such as lenses, mirrors and/or essentially planar faces of plates, prisms or the like can be utilized to improve both the correction status and the overall size and material consumption of an optical system. Optimum surface shapes of aspheric surfaces may be derived from theoretical considerations and/or numerical calculations. However, whether or not an optical system can be manufactured depends among other factors on the question whether or not an aspherical surface can actually be manufactured in the desired shape with the necessary optical quality. Feasibility studies of the inventors have shown some essential rules governing the use of aspheric surfaces in optical systems, particularly in high-resolution projection objectives suitable for microlithography.

According to one embodiment, the projection objective has at least one optical element having an aspherical surface with a surface shape free of inflection points in an optically used area of the aspheric surface. In a rotationally symmetric aspheric surface an “inflection point” is characterized as a point along a meridional direction where a sign change occurs in the local curvature of the aspherical surface. With other words, an inflection point is found geometrically between a locally convex surface region and a locally concave surface region of an aspheric surface. When a plurality of optical elements having at least one aspherical surface is provided, it is preferred that all aspheric surfaces have surface shapes which are free of inflection points. As a compromise, it may be useful to design a system such that at least 50% or 60% or 70% or 80% or 90% of the aspheric surfaces are free of inflection points. Avoiding inflection points on an aspheric surface has proven to improve the optical quality of the finished aspheric surface when compared to aspherical surfaces including inflection points. It is contemplated that the material removing effects of surface preparation tools can be made more uniform if inflection points are avoided. On the other hand, if a polishing tool is acting on a surface area including an inflection point, the material removing action of the tool on either side of the inflection point may differ considerably, thus leading to irregularities in the optical quality of the finished surface.

According to another aspect of the invention the projection objective includes a plurality of optical elements having at least one aspheric surface, wherein all aspheric surfaces have a surface shape free of extremal points outside the optical axis, wherein an extremal point is defined by the following equations:

$\frac{d\mspace{14mu} p}{d\mspace{14mu} h} = {{0\mspace{14mu} {and}\mspace{14mu} \frac{d^{2}p}{d\mspace{14mu} h^{2}}} \neq 0.}$

In this equation, the parameter “p” represents a distance, measured parallel to the optical axis of an optical element, of a point at height h from the vertex of the surface (positioned on the optical axis) as explained in connection with the equation describing the mathematical description of the aspherical surfaces given above. The parameter p(h) is also denoted as “sagitta” or “rising height” of a point on an optical surface. Based on these considerations, an “extremal point” is a maximum or a minimum of the function p(h), respectively. Studies of the inventors have revealed that extremal points outside the optical axis (where h=0) may be critical during manufacturing of the aspherical surfaces since, in the region of extremal points, the material removing action of tools used for finishing may differ significantly from the action imposed on areas surrounding the extremal point, whereby non-uniform optical surface quality may result.

This condition should be obeyed in an area including the optically utilized area (defined by the optically used radius h_(opt)) but going beyond that area up to a maximum height h_(max)>h_(opt), where h_(max)=h_(opt)+OR and where OR is the radial width of an “overrun area” adjacent to the optically utilized area, where a rotary tool will be in contact with the optical surface when the periphery of the optically used area is polished. Typical widths of the overrun area are dependent on the tool dimensions and may be in the order of 5 mm to 15 mm.

Whereas extremal points on aspheric surfaces may be critical from a manufacturing point of view, extremal points may be desirable from an optical point of view to provide a desired change of refractive power of an aspheric surface in radial (meridonal) direction. As a compromise, it has been found advantageous that aspheric surfaces having at least one extremal point should be essentially flat cross the entire usable diameter. With other words, the basic shape of the aspherical surface having at least one extremal point should be a plane or should have only small deviations from a plane. In that respect, projection objectives are preferred with at least one aspheric surface having at least one extremal point, where the following condition holds for these aspheric surfaces:

|p(h)|<p _(max),

where p_(max)=0.5. More preferably, p_(max)=0.25.

The preferred conditions for aspheric surfaces given above have been derived from feasibility studies performed on certain embodiments of this invention. However, the conditions may also be utilized on other types of optical systems having optical elements with aspheric surfaces. Therefore, these aspects of the invention are useful independent of other features of preferable embodiments of the invention.

According to another aspect of the invention the first objective part includes a concave mirror and at least one additional mirror having a curved mirror surface, where curved mirror surfaces of the concave mirror and the additional mirror are facing each other. In this embodiment two mirrors having curved mirror surfaces contribute to the formation of the first intermediate image. Preferably, first objective parts of this type are catadioptric, i.e. at least one lens ist provided in addition to the concave mirror and the additional mirror. The concave mirror and the additional mirror preferably share a common straight optical axis coinciding with the optical axes of the second and third objective part such that all objective parts share a common straight optical axis.

Preferably first objective parts of this type are designed as enlarging imaging system. In some embodiments the additional mirror is a convex mirror having a convex mirror surface compensating as at least partially the effect of the concave mirror of that objective part. Preferably, first objective parts of this type are combined with a second objective part including a first and a second concave mirror, the concave mirror surfaces of which are facing each other and define an intermirror space. Whereas typically the first intermediate image may be positioned outside that intermirror space in these embodiments, the second intermediate image may be positioned inside the intermirror space. Embodiments having at least three concave mirrors, preferably exactly three concave mirrors, distributed in two objective parts (first objective part and second objective part) may be designed such that all concave mirrors are arranged optically remote from a pupil surface. However, if desired, it is also possible that at least one concave mirror, particularly the concave mirror positioned in the first objective part, is positioned optically near a pupil surface.

In embodiments of this type the correction capabilities provided by concave mirrors can be advantageously distributed between two objective parts separated by an intermediate image, whereby a good balance and compensation between the correcting actions can be obtained. It is also possible to design the first and second objective part such that certain correction effects supported by concave mirrors are present twice in the optical path. The correcting means may, however, be arranged in optical positions where they have different optical effects since the heights of principal ray (chief ray) and marginal ray may be different for different concave mirrors in different objective parts. All advantages provided by in-line-arrangement of the optical elements (one common straight optical axis) can be preserved.

The previous and other properties can be seen not only in the claims but also in the description and the drawings, wherein individual characteristics may be used either alone or in sub-combinations as an embodiment of the invention and in other areas and may individually represent advantageous and patentable embodiments.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a longitudinally sectioned view of a first embodiment of a projection objective according to the invention;

FIG. 2 is a representation of an inner off-axis beam passing through the system of FIG. 1,

FIG. 3 is a representation of an outer off-axis beam passing through the system of FIG. 1;

FIG. 4 is a longitudinally sectioned view of a second embodiment of a projection objective according to the invention;

FIG. 5, 6 are schematic diagrams showing footprints of beams on the concave mirrors of the embodiment shown in FIG. 4;

FIGS. 7, 8 and 9 show variants of the embodiment of FIG. 4 having different NA values and different positions of the aperture stop.

FIG. 10, 11 show a schematic representation and a lens section, respectively, of a third embodiment of a projection objective according to the invention;

FIG. 12, 13 show a schematic representation and a lens section, respectively, of a fourth embodiment of a projection objective according to the invention;

FIG. 14 shows a perspective view of the catadioptric objective part of the third embodiment to demonstrate the mirror geometry;

FIG. 15 shows a schematic representation of another embodiment having double-passed lenses between concave mirrors and an oblique field (FIG. 15A);

FIG. 16 shows a lens section through an embodiment constructed according to FIG. 15;

FIG. 17 shows a lens section of another embodiment constructed according to the principles shown in FIG. 15;

FIG. 18 shows a schematic representation of an embodiment having triple-passed lenses between the concave mirrors;

FIG. 19 shows a lens section of an embodiment constructed according to the principles shown in FIG. 18;

FIG. 20 shows a lens section through an embodiment having a mirror-related lens close to one of the concave mirrors;

FIG. 21 shows a lens section through another embodiment of a projection objective according to the invention;

FIG. 22 shows a lens section of another embodiment of a projection objective according to the invention having similar, shallow concave mirrors;

FIG. 23 shows a lens section of another embodiment of a projection objective according to the invention having similar, shallow concave mirrors;

FIG. 24 shows a diagram for defining the plunging depth of a concave mirror;

FIG. 25 shows a lens section of another embodiment of a projection objective according to the invention having only one intermediate image in the intermirror space and pupil planes close to the entrance and exit of the mirror group;

FIG. 26 shows an enlarged view of a section of the embodiment shown in FIG. 25 between the object plane and the first intermediate image;

FIG. 27 shows a lens section of an embodiment of the invention, where a catoptric second objective part has two concave mirrors having exactly the same aspheric shape;

FIG. 28 show a lens section of an embodiment having a catoptric second objective part, where the first concave mirror is designed as a parabolic mirror;

FIG. 29 is a schematic diagram showing a testing device for optically testing a parabolic mirror;

FIGS. 30-32 show embodiments of projection objectives having a compact first objective part having positive lenses only and different numbers of aspheric surfaces;

FIG. 33A and FIG. 33B show schematic diagrams of a conventional aspheric surface having an inflection point;

FIG. 34 shows a lens section of an embodiment where all aspheric surfaces are free of inflection points;

FIG. 35 is a schematic diagram showing aspheric surfaces having extremal points;

FIG. 36 shows a lens section of an embodiment of a projection objective where problems due to the existence of extremal points are avoided;

FIG. 37 shows a lens section of another embodiment having a small number of aspheric surfaces;

FIG. 38 shows a lens section of another embodiment having a small number of aspheric surfaces;

FIG. 39 shows a lens section of an embodiment having a catadioptric first objective part including two curved mirrors and a catadioptric second objective part having two concave mirrors; and

FIG. 40 shows a lens section of another embodiment having a first objective part with two curved mirrors and a catadioptric second objective part having two concave mirrors;

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

In the following description of preferred embodiments of the invention, the term “optical axis” shall refer to a straight line or sequence of straight-line segments passing through the centers of curvature of the optical elements involved. The optical axis is folded by folding mirrors (deflecting mirrors) or other reflective surfaces. In the case of those examples presented here, the object involved is either a mask (reticle) bearing the pattern of an integrated circuit or some other pattern, for example, a grating pattern. In the examples presented here, the image of the object is projected onto a wafer serving as a substrate that is coated with a layer of photoresist, although other types of substrate, such as components of liquid-crystal displays or substrates for optical gratings, are also feasible.

Where tables are provided to disclose the specification of a design shown in a figure, the table or tables are designated by the same numbers as the respective figures.

FIG. 1 shows a first embodiment of a catadioptric projection lens 100 according to the invention designed for ca. 193 nm UV working wavelength. It is designed to project an image of a pattern on a reticle arranged in the object plane 101 into the image plane 102 on a reduced scale, for example, 4:1, while creating exactly two real intermediate images 103, 104. A first refractive objective part 110 is designed for imaging the pattern in the object plane into the first intermediate image 103 at an enlarged scale, a second, catadioptric objective part 120 images the first intermediate image 103 into the second intermediate image 104 at a magnification close to 1:1, and a third, refractive objective part 130 images the second intermediate image 104 onto the image plane 102 with a strong reduction ratio. The second objective part 120 comprises a first concave mirror 121 having the concave mirror surface facing the object side, and a second concave mirror 122 having the concave mirror surface facing the image side. The mirror surfaces are both continuous or unbroken, i.e. they do not have a hole or bore. The mirror surfaces facing each other define a catadioptric cavity 125, which is also denoted intermirror space 125, enclosed by the curved surfaces defined by the concave mirrors. The intermediate images 103, 104 are both situated inside the catadioptric cavity 125, at least the paraxial intermediate images being almost in the middle thereof well apart from the mirror surfaces.

Each mirror surface of a concave mirror defines a “curvature surface” or “surface of curvature” which is a mathematical surface extending beyond the edges of the physical mirror surface and containing the mirror surface. The first and second concave mirrors are parts of rotationally symmetric curvature surfaces having a common axis of rotational symmetry.

For improved clarity of the beam path through the optical system, FIGS. 2 and 3 show two distinguished beam bundles originating from the off-axis object field.

The beam bundle in FIG. 2 originates from an object point closest to the optical axis, whereas in FIG. 3 the beam bundle originates from an object point farthest away from the optical axis. The situation of the intermediate images almost in the middle between the concave mirrors can be clearly seen in this representation. In FIG. 2, the shown positions of the intersections of the crossing light beams between the mirrors are close to the positions of the paraxial intermediate images. In contrast, in FIG. 3 the shown positions or zones of the intersections of the crossing light beams between the mirrors are further offset from the positions of the paraxial intermediate images.

The system 100 is rotational symmetric and has one straight optical axis 105 common to all refractive and reflective optical components. There are no folding mirrors. The concave mirrors have small diameters allowing to bring them close together and rather close to the intermediate images lying in between. The concave mirrors are both constructed and illuminated as off-axis sections of axial symmetric surfaces. The light beam passes by the edges of the concave mirrors facing the optical axis without vignetting (compare e.g. FIG. 4 or FIGS. 7-9).

A maximum light beam height at the concave mirrors is almost the same as the maximum light beam height within the third objective part. Preferably, the maximum light beam height at the concave mirrors is less than the 1.5 fold or less than the 1.2 fold of the maximum light beam height within the third objective part. This allows constructions wherein all light beams within the projection objective are located within a space defined as a cylinder around the optical axis of said third objective part, extending from the object plane to the image plane and having a maximum radius of the 1.5 fold, preferably the 1.2 fold, of a maximum beam height within said third objective part.

The system has good lateral color correction, whereas axial color is not entirely corrected. In this embodiment, both concave mirrors are designed as Mangin mirrors. Each Mangin mirror consists of a negative meniscus lens with a mirrored convex surface. The undercorrected spherical aberration of the mirror is offset by the overcorrected spherical aberration of the negative lens. Both concave mirrors have very little refractive power. The concave mirrors may also be designed as simple mirrors (compare FIG. 4). If they are simple mirrors (without meniscus lens), then the mass of transparent optical material is less but it may be necessary to cut the mirrors.

The projection objective is designed as an immersion lens. The correction status is about 9 milliwaves at 1.1 NA over a 26·5.0 mm² field. The field radius is 65 mm. No aspheric surfaces having a departure from a best fitting sphere (deformation) larger than 1.0 mm are necessary. A maximum diameter of 220 mm for the largest elements shows the potential for a low lens mass consumption. The design has 1160 mm track length (axial distance between object plane and image plane) and small glass mass. The last lens next to the image plane is made of calcium fluoride, for immersion.

This new design has very good lateral colour correction but none for axial colour. But the small lens sizes give it less axial colour than an all-refractive design of the same NA. The pupil aberration is well corrected and the chief rays are almost exactly telecentric on both ends.

The design with only two reflections and the small glass volume has no problem with obscuration, so the mirrors can be a good size—not so large—and their strong power provides almost all the Petzval correction of the system. In the embodiment the two intermediate images are almost exactly in the middle of the catadioptric cavity.

A modification not shown here has a first refractive objective part and a third refractive objective part quite similar to those disclosed in US provisional application with Ser. No. 60/511,673 filed on Oct. 17, 2003 by the applicant. The corresponding specification is incorporated by reference.

This basic design has potential to get by on even smaller amounts of optical material volume, especially if the Mangin mirrors have their glass removed. (Compare FIG. 4).

In FIG. 4 a second embodiment is shown. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals increased by 100.

The projection objective 200 is designed as an immersion lens for λ=193 nm having an image side numerical aperture NA=1.20 when used in conjunction with a high index immersion fluid, e.g. pure water, between the exit face of the objective and the image plane. The field size is 26-5.0 mm². The specifications for this design are summarized in Table 4. The leftmost column lists the number of the refractive, reflective, or otherwise designated surface, the second column lists the radius, r, of that surface [mm], the third column lists the distance, d [mm], between that surface and the next surface, a parameter that is referred to as the “thickness” of the optical element, the fourth column lists the material employed for fabricating that optical element, and the fifth column lists the refractive index of the material employed for its fabrication. The sixth column lists the optically utilizable, clear, semi diameter [mm] of the optical component. A radius r=0 in a table designates a planar surface (having infinite radius).

In the case of this particular embodiment, twelve surfaces, namely surfaces 2, 3, 8, 12, 15, 16, 17, 19, 22, 30, 33 and 35 in table 4, are aspherical surfaces. Table 4A lists the associated data for those aspherical surfaces, from which the sagitta or rising height p(h) of their surface figures as a function of the height h may be computed employing the following equation:

p(h)=[((1/r)h ²)/(1+SQRT(1−(1+K)(1/r)² h ²))]+C1·h ⁴ +C2·h ⁶+ . . . ,

where the reciprocal value (1/r) of the radius is the curvature of the surface in question at the surface vertex and h is the distance of a point thereon from the optical axis. The sagitta or rising height p(h) thus represents the distance of that point from the vertex of the surface in question, measured along the z-direction, i.e., along the optical axis. The constants K, C1, C2, etc., are listed in Table 4A.

Since the objective has 17 lenses, more than 50% or more than 60% of the lenses are aspheric lenses.

Like the embodiment of FIG. 1, there are no folding mirrors leaving a straight, unfolded optical axis common to all optical components. In contrast to the first embodiment, the two concave mirrors 221, 222 facing each other are simple mirrors instead of Mangin-mirrors, which allows to reduce the overall mass of the system. In order to demonstrate the path of the light transiting the catoptric (purely reflective) group 220, FIGS. 5 and 6 show the “footprints” of the beams on the concave mirrors. In FIG. 5, footprints at the position of the first concave mirror 221 are shown. The lower group of elliptic lines represent beams reflected at the first concave mirror 221, and the upper group of elliptic lines represent the beams coming from the second concave mirror 222 towards the second refractive part 230. In FIG. 6, the footprints at the position of the second concave mirror 222 are shown. The lower part represents beams running from the first refractive part 210 to the first concave mirror 221, whereas the upper elliptic lines represent the beams reflected at the second concave mirror 222 and running to the image plane. It can be seen that the used areas on the mirrors have simple contiguous shapes such that the mirrors may be fabricated, for example, as a rectangular mirror, which is easy to mount.

It is a characterizing feature that the overall cross sectional beam shape at a concave mirror deviates significantly from a circular shape found at pupil positions. The beam diameters in mutually perpendicular directions have a ratio of about 1:3 in this embodiment, where the diameter in scan direction y is less than 50% or 30% of the diameter in a cross scan direction x. The beam shape resembles the rectangular field shape indicating that the concave mirror is closer to a field surface than to a pupil surface, i.e. the concave mirror is positioned optically remote from a pupil surface. Small, narrow mirrors can therefore be used as concave mirrors. This facilitates guiding the light flux past the concave mirrors at one side without vignetting even when the numerical aperture is high.

Generally, in embodiments according to the invention, the size of the concave mirrors is not directly coupled to the numerical aperture such that very high values of NA, e.g. NA>1.3 or NA>1.4 can be obtained without unduly increasing the mirror size.

In FIGS. 7 to 9 some beneficial variants of the second embodiment are shown. Features or feature groups identical or similar in structure and/or function to those in FIG. 4 are denoted by similar numerals. All variants are designed as immersion lens for λ=193 nm having an image side numerical aperture NA≧1 when used in conjunction with a high index immersion fluid, e.g. pure water, between the exit face of the objective and the image plane. The field size is 26 mm-5.0 mm. Specifications are given in Tables 7 and 7A for FIG. 7, and in tables 8 and 8A for FIG. 8 and for FIG. 9. The designs in FIGS. 8 and 9 are the same, the difference lies in the position of the aperture stop A.

The variant of FIG. 7 (NA=1.1) is characterized by the fact that the used areas on the concave mirrors are smaller than in the embodiment of FIG. 4. Consequently, the sizes of the rectangularly shaped concave mirrors may be further reduced.

The variant of FIG. 8 (NA=1.15) is characterized by the fact that the aperture stop A is positioned in the third, purely refractive part 230 in the region of maximum beam diameter. By contrast, in the closely related variant in FIG. 9 (NA=1.15) the aperture stop A is positioned in the first refractive objective part 210. This demonstrates that the designs allow flexibility as to where the aperture stop can be placed.

The embodiments described above are characterized by a straight, unfolded optical axis common to all optical elements. A potential problem of such designs may be that the mounts provided for the concave mirrors may lead to a long track length or may interfere with the beam path. In the following, embodiments comprising at least one planar folding mirror are shown as design alternatives to obtain compact designs.

In FIG. 10 a third embodiment is shown. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals increased by 200. FIG. 11 represents a longitudinal sectional view of an embodiment designed on the basis depicted in FIG. 10.

The embodiment of a catadioptric projection objective 300 in FIG. 10 is similar to some of the above mentioned embodiments in that it comprises a first, refractive objective part 310 for creating a first intermediate image 303, a second, catoptric objective part 320 for creating a second intermediate image 304 from the first intermediate image, and a third, refractive objective part 330 for re-imaging the second intermediate image onto the image plane 302. The second objective part may include at least one lens such that it becomes a catadioptric objective part.

In contrast to the embodiments shown above, the second objective part 320 includes four reflective surfaces, namely two planar folding mirrors 306, 307 and two concave mirrors 321, 322 facing each other. The concave mirror surfaces of these mirrors define a catoptric cavity 325 inside which the folding mirrors and the intermediate images are located.

The first folding mirror 306 located immediately near the first intermediate image 303 is arranged for reflecting the radiation coming from the object plane onto the first concave mirror 321, which reflects the light directly, i.e. without intermediate image, to the second concave mirror 322. Light reflected from the second concave mirror strikes the second folding mirror 307 which reflects the light to the object plane, thereby creating the second intermediate image immediately near the second folding mirror. In this construction, the concave mirrors and the mounts of these mirrors are situated outside the central main part running between object plane and image plane. The concave mirrors have a common optical axis 305′ which may be exactly or almost perpendicular to the object side and image side parts 305″ and 305′″ of the optical axis, which are laterally offset in this embodiment. Inclination angles of the folding mirrors with respect to the optical axis may be 45° or may deviate significantly therefrom, e.g. by up to 5 or 10 degrees. Therefore, inclination angles between 70° and 110° may occur between the common optical axis of the concave mirrors and the object and image side part of the optical axis.

Whereas the intermediate images are geometrically situated between the concave mirrors, it is to be noted that no intermediate image lies optically between the concave mirrors. This configuration allows for small spot diameters on the concave mirrors, which is advantageous for reducing the geometric light guidance value (etendue). A pupil plane 309 lies at a distance from both concave mirrors at the position where the chief ray 308 crosses the optical axis 305′ defined by the concave mirrors. An aperture stop may be positioned here. It may be beneficial if at least one of the concave mirrors has an aspheric reflecting surface having a curvature which decreases from the optical axis to the edge of the mirror in a radial direction.

The purely refractive first objective part 310, which transforms the off axis object field into the first intermediate image, has a first lens group LG11 with positive power and a second lens group LG12 with a positive power. An aperture stop may be provided between these lens groups where the chief ray 308 crosses the optical axis. The catoptric objective part 320 images the first intermediate image into the second intermediate image and has a pupil plane between the concave mirrors. The purely refractive third objective part 330 has a first lens group LG31 with positive power, and a second lens group LG32 with a positive power. An position for an aperture A stop lies between LG31 and LG32.

FIG. 12 shows a schematric representation of another projection objective 400 having two concave mirrors 421 and 422 and two intermediate images 403, 404. Features or feature groups identical or similar in structure and/or function to those in FIG. 10 are denoted by similar numerals increased by 100. FIG. 13 represents a longitudinal sectional view of an embodiment designed on the basis depicted in FIG. 12.

In contrast to the embodiment shown in FIGS. 10, 11, the concave mirrors 421, 422 do not share a common straight optical axis. Instead, the optical axis of the concave mirror 421 corresponds to the optical axis 405 between object plane and image plane. The optical axis of the concave mirror 422 is nearly perpendicular to the optical axis 405. The construction space for the mirror mounts lies outside the optical axis connecting object and image plane, which may be favorable. Note that the object side and the image side section of the optical axis are coaxial. As the concave mirrors both lie on one side of the optical axis 405, the first and second folding mirror can be designed as one single planar mirror 406 with a mirror face facing the concave mirrors and used twice as the light passes through. Also, the two separate concave mirrors 421, 422 can be combined to form one single concave mirror which is used twice.

FIG. 14 shows a perspective view of the catoptric objective part of the third embodiment to demonstrate the mirror geometry. It can be seen that the folding mirrors and the concave mirrors can have geometrically simple shapes since the illuminated areas are of simple form and contiguous. The concave mirrors and the folding mirrors in this embodiment have rectangular shape which facilitates mounting.

FIG. 15 shows a schematic representation of another embodiment of a projection objective 500 having features improving optical performance and features facilitating manufacturing. FIG. 16 shows a lens section of a projection objective designed according to the principles shown in FIG. 15. The specification of this embodiment is shown in tables 16 and 16A. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals, increased by 400.

The second objective part 520 which serves to image the first intermediate image 503 into the second intermediate image 504 includes a first concave mirror 521 and a second concave mirror 522 optically downstream of the first concave mirror 521. The curvature surfaces of the first and second concave mirror have a common axis of rotational symmetry co-axial with the optical axis shared by all optical elements of the projection objective. The unbroken mirror surfaces used on the first and second concave mirror are on opposite sides of the optical axis 505. A first mirror-related lens 551 is arranged optically between the first intermediate image 503 and the first concave mirror 521 immediately in front of the first concave mirror such that it is transited twice in the optical path between the first intermediate image and the first concave mirror and in the optical path between the first concave mirror and the second concave mirror. In order to avoid influencing the optical path between the second concave mirror and the image plane the first mirror-related lens 551 is designed as a truncated lens arranged outside the optical axis. A second mirror-related lens 552 is arranged immediately in front of the second concave mirror 522 such that is used twice in the optical path between the first and the second concave mirror and in the optical path between the second concave mirror and the image plane 502. The lens 552 is truncated such that it does not extend into the optical path between the object plane 501 and the first concave mirror 521. Both the first and second mirror related lenses 551, 552 are free standing lenses having free entrance and exit surfaces. Particularly, the lens surfaces facing the respective concave mirrors have curvatures different from the curvatures of the concave mirrors, which allows additional degrees of freedom when compared to the embodiments having Mangin mirrors (compare FIG. 1). Both mirror-related lenses 551, 552 are designed as negative meniscus lenses having a sense of curvature similar to the curvature of the associated concave mirror, i.e. having a convex surface facing the concave mirror surface of the associated concave mirror. The negative refractive power arranged immediately in front of the concave mirrors serves to improve correction of the chromatic length aberration (CHL). All optically active surfaces of the second objective part are spherical, which greatly facilitates manufacturing and improves the optical performance. Particularly, stray light may be reduced when compared to embodiments having aspheric surfaces, particularly aspheric mirror surfaces.

The field having the shape of a high aspect ratio rectangle having a width a in cross-scan direction (x-direction) and a smaller width b in scan direction (y-direction) and arranged off-axis at a distance c from the optical axis is shown in FIG. 15A. The immersion objective has image side numerical aperture NA=1.2 when used in conjunction with pure water as an immersion medium at 193 nm. The system is telecentric on the object and image side and essentially free of field zone aberrations.

In FIG. 17 a lens section of a variant of a system according to the principles explained in connection with FIG. 15 is shown. The specification of the 193 nm immersion lens having NA=1.2 is given in tables 17 and 17A. Features or feature groups identical or similar in structure and/or function to those in FIG. 1 are denoted by similar numerals, increased by 500. The second objective part 620 has aspherical negative meniscus lenses 651, 652 immediately in front of the spherical concave mirrors 621, 622 and used twice in the light path to and from the respective concave mirrors. For the sake of simplicity, each group of optical elements consisting of a concave mirror 621, 622 and the associated lenses 651, 652 immediately ahead of the respective concave mirror is denoted as “catadioptric sub-group”. In the embodiment of FIG. 17 the catadioptric sub-group 621, 651 and the catadioptric sub-group 622, 652 are designed identically and arranged symmetrically with respect to each other. Particularly, the radii of the optical surfaces, the axial distances or thicknesses of the optical surfaces and the diameters of the optical surfaces of the symmetry related lenses as well as the symmetry related concave mirrors are identical. This makes it possible that the lenses 651, 652 and the mirrors 621, 622, respectively, may be manufactured simultaneously from the same blank material. Therefore, arrangements of the type exemplarily shown in FIG. 17 allow for significant reduction in costs for material and manufacturing for the optical elements used in the second, catadioptric objective part.

In a corresponding method of manufacturing optical elements for an catadioptric or catoptric objective part of a projection lens having a first concave mirror and a second concave mirror designed as truncated mirrors the first and second mirrors are fabricated such that firstly a mirror blank for the first and second concave mirror is manufactured to obtain the desired concave shape of the mirror surface and secondly the shaped mirror blank is separated into two truncated mirrors used as first and second concave mirror. The mirror blank may be a single piece cut into two pieces after surface preparation. It is also possible to join two separate blank parts together, e.g. by wringing or cementing, prior to shaping the mirror surface. This allows easy separation after the surface preparation. The coating of the mirror substrate may be performed prior to or after separation of the mirror substrate parts. The mirror related lenses may be manufactured correspondingly.

A further difference to the embodiment shown in FIG. 16 lies in the fact that at least one of the surfaces of the lenses 651, 652 close to the respective concave mirrors has aspheric shape. In the embodiment, each concave lens surface of the lenses 651, 652 is aspheric. The aspheric surfaces arranged closed to the respective intermediate images, which are field surfaces of this system, can be designed such that a strong influence on field dependent aberrations, like distortion on the object imaging or the spherical aberration of the pupil imaging, are influenced. Generally, it may be useful to have at least one lens arranged between an intermediate image and the associated concave mirror optically near the intermediate image (upstream or downstream of the intermediate image), wherein at least one surface of the lens arranged between the intermediate image and the concave mirror is aspheric. Particularly, the lens surface facing the intermediate image may be aspheric.

In an alternative embodiment the mirror related lenses, which are truncated lenses in the embodiments of FIGS. 16 and 17, are designed as full meniscus shaped negative lenses extending across the optical axis such that they are transited three times. Specifically, lens 652 (associated to the second concave mirror 622) may extend across the optical axis 605 such that light coming from the object plane transits this lens prior to forming the first intermediate image 603 and then, on the other side of the optical axis, in the optical path between first and second concave mirror and second concave mirror and image plane. Likewise, lens 651 associated to the first concave mirror 621 may extend across the optical axis such that the lens is used twice in the optical path to and from the first concave mirrors and a third time in the optical path between the second intermediate image 604 and the image plane. In this embodiment, two aspheric surfaces transited three times upstream and downstream of an intermediate image are provided, which facilitates optical correction. In addition, mounting of the lenses is improved when compared to the mounting of truncated lenses (compare FIGS. 18 and 19).

In FIG. 18 a schematic representation of a projection objective 700 having two lenses used three times in transmission is shown. FIG. 19 shows an embodiment of this type, for which the specification is given in tables 19 and 19A. Features similar or identical to features described in detail in connection with FIGS. 15 to 17 are designated with the same reference numbers, increased by 100 or 200, respectively.

The catadioptric second objective part 720 serves to image the first intermediate image 703 into the second intermediate image 704. A first mirror related lens 751 is arranged optically between the first intermediate image 703 and the first concave mirror 721, whereas, on the opposite side of the optical axis 705, the second mirror related lens 752 is arranged optically between the second concave mirror 722 and the second intermediate image 704. Both mirror-related lenses 751, 752 extend across the optical axis into the beam pass of light passing the respective concave mirrors 721, 722. Particularly, the second mirror related lens 752 extends into the beam pass between the object plane 751 and the first concave mirror 721, whereas the first mirror related lens 751 extends into the beam path into the second concave mirror 752 and the image plane. Therefore, each of the mirror-related lenses 751, 752 is optically used three times, whereby the optical effect of a lens can be maximized and, at the same time, the consumption of optical material can by minimized. In addition, mounting of the lenses 751, 752 is facilitated when compared to a mounting of truncated lenses.

The triply passed lenses 751, 752 may preferably be designed as multigrade lenses having a first lens zone associated with one side of the optical axis and transited twice in the optical path to and from the associated concave mirror and a second zone associated with the opposite side of the optical axis and transited once, where the first lens zone and the second lens zone have different lens surface curvature on at least one side of the lens such that the multigrade lens forms a pair of mutually independently acting lenses acting at a common location. A monolithic multigrade lens providing different optical powers on opposite sides of the optical axis may be fabricated from a single lens blank and can be mounted conventionally with a circular mount. The lens zones on either side of the optical axis may have different aspheric shape, where the aspheres are preferably based on the same spherical base shape to facilitate manufacturing. Note that the part of lens 752 closest to the first intermediate image and the part of lens 751 closest to the second intermediate image are both located close to field surfaces such that the lens surfaces are effective for correcting field aberrations, particularly if they are made aspheric.

In the embodiment shown in FIG. 19, both lenses 751, 752 with triple use are designed as negative meniscus lenses having a sense of curvature similar to the related concave mirrors and having weak negative refractive power. In other embodiments, the lenses may also be almost without optical power. In both cases, at least one lens surface may be aspheric in order to support optical correction.

In all embodiments the first, dioptric objective part serves to form the first intermediate image from a flat object field. The size and axial position of the first intermediate image as well as the aberrations associated with the first intermediate image are determined by the optical properties of the first objective part. Like in the embodiments shown above, the first objective part may be subdivided into a first lens group LG11 having positive refractive power and the second lens group LG12 having positive refractive power, wherein a pupil surface 711 of the system is disposed between the lens groups in an axial position where the chief ray 708 of the imaging intersects the optical axis. An aperture stop for determining the numerical aperture used in the imaging process may be provided in the vicinity of this pupil surface. However, in the embodiment shown in FIGS. 18 and 19, the aperture stop A is provided in the vicinity of a pupil surface optically conjugate to this pupil surface in the third, dioptric objective part. The second lens group LG12 between the pupil surface 711 and the first intermediate image includes the negative meniscus lens 752 immediately upstream of the first intermediate image.

In the embodiment of FIG. 19 the first lens group LG11 consists of a positive meniscus lens 781 having an image side concave surface and weak optical power, a negative meniscus lens 782 having an image side concave surface and weak negative power, a positive meniscus lens 783 having an object side concave surface, a biconvex positive lens 784, a positive meniscus lens 785 having an image side concave surface and a positive meniscus lens 786 having an image side concave surface immediately ahead of the pupil surface 711. The second lens group LG12 includes a meniscus shaped lens 787 having a strongly curved concave surface facing the object, a positive meniscus lens 788 having an object side concave surface and a biconvex positive lens 789 immediately behind, and the negative meniscus lens 752 which is integral part of the mirror related second lens. The meniscus lens 787 immediately following the pupil surface and having the concave surface facing the pupil and the object plane is particularly useful for correcting spherical aberration, astigmatism and image curvature in the first objective part. The optical correction is also positively influenced by a negative-positive-doublet formed by the negative meniscus lens 782 and the positive meniscus lens 783 arranged in the divergent beam section of the first lens group LG11. The negative meniscus lens having the concave exit surface optically close to the object plane is arranged in a region where the height of the chief ray is larger than the height of the marginal ray, whereby field aberrations, like distortion, can be effectively corrected.

The embodiment of a projection objective 800 shown in FIG. 20 having a specification as given in tables 20 and 20A can be described as a variant of the embodiment shown in FIG. 19. Similar to that embodiment, a negative meniscus lens 851 is arranged immediately ahead of the first concave mirror 821, the lens 851 being passed three times by the light beam. In contrast to the embodiment of FIG. 19, lens 851 is the only lens passed three times by the light beam. There is no negative refractive power or positive refractive power immediately in front of the second concave mirror 822. Therefore, the mass of transparent optical material required for the catadioptric objective part is smaller than in the embodiment shown in FIG. 19. The first objective part has magnifycation |β₁|≈1.9.

In FIG. 21 another embodiment of a projection objective 900 is shown which is generally designed according to the principles explained in detail in connection with FIG. 15. The specification is given in tables 21 and 21A. Reference numerals are similar, but increased by 400. Particularly, to each concave mirror 921, 922 is as signed a negative meniscus lens 951, 952 immediately in front of the concave mirror optically between the respective concave mirror and an intermediate image upstream or downstream of the concave mirror. Each negative meniscus lens 951, 952 is designed as a truncated lens arranged only at the side of the optical axis where the associated concave mirror is positioned. Therefore, the mirror-related lens is passed twice by the light. The first objective part 910 can be subdivided into two lens groups, lens group LG11 being arranged between the object plane and the pupil plane 911, whereas lens group LG12 is arranged between the pupil plane and the first intermediate image 903. Like in the embodiment shown in FIG. 19, the first lens group LG11 includes a negative-positive-doublet 982, 983, the negative meniscus 982 being arranged close to the object plane and having a concave exit side facing the image plane. The positive refractive power following this negative lens is split into two positive meniscus lenses, each having a concave side facing the object. A meniscus lens 987 having a strongly curved concave entrance side facing the object is arranged immediately downstream of the pupil plane 911. Optically, this lens is useful for correcting spherical aberration, astigmatism and image curvature in the first objective part.

The third objective part 930 is composed of a first lens group LG31 between the second intermediate image 904 and the aperture stop A, and the second lens group LG32 between the aperture stop A and the image plane. The aperture stop is arranged between the region of largest beam diameter of the third objective part and the image plane. The biconvex positive lens 996 immediately following the aperture stop A is a biaspherical lens having both the entrance side and the exit side being aspheric surfaces. The aspheric surfaces in close vicinity to each other and arranged in the convergent beam path immediately upstream of the image plane have a strong influence on aberration correction. Particularly, higher orders of spherical aberration and coma are positively influenced. There is only one negative lens 991 arranged in the third objective part. The biconvex negative lens 991 defines a shallow waist in the beam path of the third objective part. All lenses downstream of negative lens 991 are positive lenses. Avoiding negative lenses in the region of increasing and large beam diameters of the third objective part allows to keep the beam diameter small, thus decreasing the demand of optical material used for the lenses of the third objective part.

Both concave mirrors 921, 922 have spherical mirror surfaces, thus facilitating manufacturing and improving optical performance. If D is a maximum diameter of a lens element of the third objective part in [mm] and c₁ and c₂ are the curvatures of the concave mirrors 921, 922 in [mm⁻¹], then the following condition is fulfilled by the embodiment of FIG. 21: 1<D/(|c₁|+|c₂|)·10⁻⁴<6. The curvature c is the reciprocal of the curvature radius at the vertex. If this condition is fulfilled, then a good balance between Petzval correction and positive power in the third objective part can be obtained.

FIG. 22 shows a variant of a projection objective 1000 having a general construction similar to that of the embodiment shown in FIG. 4, i.e. having a second objective part 1020 consisting of two concave mirrors 1021, 1022 and having no refractive optical elements. Reference numerals for similar features/feature groups are similar, increased by 800. The specification is given in tables 22 and 22A. The first, dioptric objective part 1010 for creating the first intermediate image 1003 is subdivided into a first lens group LG11 between object plane and pupil plane 1011 and a second lens group LG12 between the pupil plane and the first intermediate image. The first lens group LG11 starts with the biconvex positive lens 1081, followed by a negative meniscus lens 1082 having an image side concave surface and a biconvex positive lens 1083. Particularly high incidence angles occur at the concave exit side of the negative meniscus lens 1082, which is arranged in a region where the light beam is slightly divergent. The high incidence angles have strong correcting influence. The sequence positive-negative-positive provided by lenses 1081, 1082, 1083 has been found to be useful. Therefore, it may be preferable if the first objective part creating the first intermediate image includes at least one concave surface facing the image, which is preferably included in a sequence of positive-negative-positive lenses.

FIG. 23 shows another embodiment of a projection objective 1100 generally designed in accordance of the principles explained in connection with the FIG. 4. The specification is given in tables 23 and 23A. The second objective part 1120 is purely reflective, thus requiring no transparent optical material. Some aspects regarding features facilitating manufacturing will now be explained in connection with this embodiment and with FIG. 24. They may, however, be implemented in other embodiments. Both concave mirrors 1121, 1122 have similar surfaces, which facilitates manufacturing and improves optical performance. Generally, the shape of a concave mirror has a strong influence on certain aberrations. Particularly, the image curvature (Petzval curvature) is influenced by the vertex curvature of the mirror. If an aspherical mirror surface is used, the basic data of the aspheric surface define certain field dependent aberrations, particularly the spherical aberration of the pupil, which is proportional to y⁴, where y is the beam height at the concave mirror. Both factors influencing the shape of the mirror surface are deeply rooted in the optical design and are dependent from one another. Particularly, the second factor regarding the type of asphere is strongly influenced by the first factor (basic curvature), since, for example, a strong curvature of the concave mirror will induce strong field dependent aberrations.

Certain crucial factors influencing a good compromise between manufacturability and optical performance of concave mirrors have been identified. One disruptive factor resulting from manufacturing of a concave mirror is the depth up to which a tool must plunge into the material of the mirror substrate in order to create the concave mirror surface. This plunging depth is denoted “p_(max)” in connection with FIG. 24. The maximum sagitta or rising height at the edge of a mirror may be defined as the axial separation of a plane normal to the optical axis and touching the edge of the concave mirror to a plane parallel thereto and touching the vertex of the concave mirror. As schematically shown in FIG. 24, p_(max) is dependent on the curvature radius R of the aspherical mirror surface, and the diameter D of the aspherical mirror. In a first approximation (for aspherical form) p_(max) is given by: p_(max)=R−(R²−D²/4)^(0.5). Since the basic shape of the mirror cannot be altered without strongly influencing the optical effect, only the diameter of the mirror surface can be used as a free parameter to influence manufacturability. When considering manufacturing, the grinding of the mirror substrate necessary to define the basic shape of the mirror substrate prior to polishing is particularly addressed. It has been found that it is preferable if the condition D≦1.3R is fulfilled and that it may be more preferable if the condition D≦1.2R is fulfilled such that also the condition: p_(max)<0.22R is fulfilled. Manufacturing is also facilitated if the radii of curvature at the vertex of the curved mirror surfaces for two mirrors are as similar as possible. If R1 is the vertex radius of curvature of a first mirror and R2 is the vertex radius of curvature of the second mirror, it is preferable that the following condition is fulfilled: 0.8<|R1/R2|<1.2. In the embodiment shown in FIG. 23 this condition and the two following conditions are fulfilled: p_(max)≦0.22R and D≦1.3R. It may be sufficient if, in addition to the condition regarding the relation of curvature radii one of the latter conditions is fulfilled.

In the embodiment shown in FIG. 23 the curvatures of the mirrors 1121, 1122 are almost identical (curvature radii differ within less than 1%) and the aspheric shapes are almost identical. The mirrors 1121, 1122 are the only optical elements of the second objective part, thus making this part a catoptic part. The maximum diameter of optical elements of the second objective part 1120 is smaller or almost equal to the maximum diameter of lenses in the third objective part. This facilitates implementation of the axial symmetric projection objective into a wafer stepper or a wafer scanner. Although the aperture stop A is provided in the third objective part, it may also be provided in the first objective part in the vicinity of the pupil surface 1111 thereof.

In FIG. 25 another embodiment of a projection objective 1200 is shown. FIG. 26 shows a detailed view of a section between the object plane 1201 and the second intermediate image 1204 which is the object of a purely refractive objective part 1230 for imaging the second intermediate image onto the image plane 1290 at a reduced scale of about 1:4.

The entire projection objective 1200 designed to image an object disposed in the object plane 1201 onto the image plane 1202 at a reduced scale consists of three objective parts 1210, 1220, 1230, each designed to image a field plane upstream of the objective part into field plane downstream of the objective part. The first objective part 1210 consists of four consecutive lenses 1211, 1212, 1213 and 1214 followed by the first concave mirror 1221 immediately upstream of the first intermediate image 1203. Therefore, the first objective part is catadioptric. The second objective part 1220 is also catadioptric, including the second concave mirror 1222 immediately downstream of the first intermediate image 1203 and positive lenses 1226, 1227, 1228, 1229, all effective for refocusing the first intermediate image 1203 into the second intermediate image 1204. The third objective part 1230 is purely refractive and includes the freely accessible aperture stop A of the system.

In contrast to the embodiments shown above, only the first intermediate image 1203 is positioned in the intermirror space defined by the concave mirrors 1221, 1222, whereas the second intermediate image 1204 lies outside of this intermirror space. The mirror group defined by the two concave mirrors 1221, 1222 facing each other has a mirror group entry and a mirror group exit. At the mirror group entry positioned geometrically next to the edge of the second mirror 1222 facing the optical axis 1205 radiation coming from the object side enters the intermirror space and at the mirror group exit positioned geometrically next to the edge of the first mirror 1221 facing the optical axis the radiation exits the intermirror space after the reflections on the concave mirrors. It is a characterizing feature of this embodiment that a first pupil surface PS1 of the projection objective lies in the vicinity of the mirror group entry and a second pupil surface PS2 lies in the vicinity of the mirror group exit. In contrast, in most other embodiments, for example those shown in FIGS. 1 to 4, 7 to 14, the entry of the mirror group and the exit of the mirror group are optically close to the intermediate images, which are field surfaces of the projection lens. Also, in the embodiments mentioned above the radiation reflected from the first concave mirror crosses the optical axis prior to impinging on the second concave mirror which effectively leaves the footprints of the radiation on the reflecting surfaces of the concave mirrors at opposite sides of the optical axis. In contrast, in the embodiment shown in FIGS. 25 and 26, first and second concave mirrors 1221, 1222 are disposed on the same side of the optical axis. Due to this difference the optical path within the space defined by the concave mirrors has almost point symmetry with respect to a symmetry point arranged midways between the vertices of the concave mirrors in the embodiments mentioned above, whereas the optical path is almost mirror-symmetric with respect to a mirror plane perpendicular to the optical axis and arranged midways between vertices of the concave mirrors in the embodiment of FIGS. 25, 26.

Optically, embodiments designed essentially according to the principles of the embodiment shown in FIGS. 25, 26 can be advantageous if it is desired to influence field aberrations by the action of lenses close to field planes since one of the field planes between object plane 1201 and image plane 1202, namely the field surface of the second intermediate image 1204 is arranged freely accessible at a distance outside the intermirror space defined by the concave mirrors 1221, 1222. As shown in FIG. 25, two field lenses 1229, 1235 are arranged close to the second intermediate image 1204 immediately upstream (1229) and immediately downstream (1235) of this intermediate image, thus forming a field lens group for aberration correction.

The first and second objective parts 1210, 1220 are effective to form an intermediate image 1204 at a distance from the mirror group defined by the concave mirrors 1221, 1222 geometrically behind this mirror group. Since a pupil surface PS2 is arranged in the vicinity of the exit of the mirror group, a group of lenses 1226 to 1228 acting in combination as a Fourier-transforming lens group can be used to position and define the characteristics of the intermediate image 1204, which then is reimaged on the image plane 1202 by the third objective part 1230. These properties make the sub-system formed by the first and second objective part 1210, 1220 useful as a relay system for linking light paths of optical systems ahead and downstream of the relay system together. Due to the action of the concave mirrors 1221, 1222 of the mirror group this relay system can be designed to have strong influence on the image curvature compensating at least partly the opposite influence of positive lenses upstream and downstream of the mirror group.

FIG. 27 shows a variant of a projection objective 1300 having a general construction similar to that of the embodiment shown in FIG. 4, i.e. having a second, catoptric objective part 1320 consisting of two concave mirrors 1321, 1322 and having no refractive optical element. Reference numerals for similar features/feature groups are similar as in FIG. 4, increased by 1100. The specification is given in tables 27, 27A.

The first, dioptric objective part 1310 for creating the first intermediate image 1303 has a first lens element 1312 immediately following the object surface 1301, where the entrance surface of this first lens element is aspheric and convex to the object surface and an aperture stop A is provided in the first objective part in between lens groups each having positive refractive power. The concave mirrors 1321, 1322 of the catoptric second objective part 1320 each have an aspheric mirror surface. It is a characterizing feature of this design that the aspheric mirror surfaces of mirrors 1321, 1322 have identical aspheric shape. This allows to use exactly the same optical testing device for measuring the aspheric shape of both concave mirrors in the manufacturing process. As it can be seen from tables 27, 27A the radii of the concave mirrors (describing the basic shape of the mirror surface) and the aspheric constants (describing the aspherical deviation from the basic shape of surfaces 25, 26) are identical. In other embodiments the basic shape and the aspheric constants may vary slightly between the two concave mirror. Even in that case significant improvements relating to costs of the manufacturing process can be obtained if the mirror surfaces are shaped similar such that the same measuring optics can be used for testing both mirror surfaces.

The projection objective 1400, a lens section of which is shown in FIG. 28, has a general construction similar to that on the embodiment shown in FIG. 4.

Therefore, reference numerals for similar features/feature groups are similar, increasing by 1200. The specification is given in tables 28 and 28A.

A first, dioptric objective part 1410 including an aperture stop A is designed for creating a first intermediate image 1403. The second, catoptric (purely reflective) objective part 1420 consists of a first concave mirror 1421 and a second concave mirror 1422 which, in combination, create the second intermediate image 1404 from the first intermediate image 1403. A dioptric third objective part 1430 is designed for imaging the second intermediate image 1404 onto the image plane 1402, whereby, during operation, a thin layer of immersion fluid I (water) is transited by the radiation. When optimizing the design, particular care was taken to facilitate optical testing of the aspheric mirror surfaces during mirror manufacturing. For this purpose, the mirror surface of the first concave mirror 1421 has a parabolic shape (compare table 28A, surface 23).

The following considerations are provided to facilitate understanding why a parabolic shape of a mirror surface facilitates testing. In a general case, optical testing of an aspherical mirror surface requires use of specifically adapted optical testing system designed to create testing radiation having a distorted wave front which is adapted to the desired aspheric shape of the mirror surface such that the local incidence angles of the test wave onto the aspheric surface are rectangular for each location of the aspheric surface. Optical testing devices using aplanatic optical systems, or compensation systems (K-systems) or computer generated holograms (CGH) or a combination thereof for shaping the distorted wave front are usually employed for this purpose. Since the construction of specifically designed testing optics for each aspherical shape is expensive, alternative methods are desired.

An aspheric mirror having a parabolic shape, in contrast, can be tested with simple testing equipment. For further explanation, it is considered that a purely conical, rotational symmetric surface shape can be described by the following equation:

$p = \frac{{ch}^{2}}{1 + {\sqrt{1 - {c\left( {k + 1} \right)}}h^{2}}}$

Here, p is the axial coordinate of a surface point, k is a conical constant, c is the curvature (i.e. the reciprocal (1/r) of radius r) of the surface at the vertex (where the optical axis intersects the mirror surface) and h is the height (measured perpendicular to the optical axis). Using this equation, different conical, rotational symmetric surface shapes can be generated depending on the value of the conical constant k. For example, a spherical shape corresponds to k=0, a value k=−1 describes a parabola, values k<−1 describe a hyperbola and values −1<k<0 describe an elliptic shape. All these shapes have in common that an object point arranged in a specific position (depending on the shape of the surface) will be imaged without aberrations (stigmatic imaging). At least one non-spherical conical mirror may therefore be useful in an embodiment of the invention or in other projection objectives having concave mirrors. Considering the requirements of mirror testing, a parabolic shape (k=−1) is particularly useful since the object point, which will be imaged without spherical aberrations, is positioned at infinity. With other words: light from a test beam or parallel light impinging parallel to the optical axis on a parabolic surface will be focused in one and only one focal point by the parabolic mirror. This is advantageous since no special arrangements for diverging or converging a beam bundle of a test wave are necessary. The test wave has a planar wave front.

A possible testing arrangement is schematically shown in FIG. 29. Here, the parabolic mirror surface 1421 is shown together with the optical axis OA defined by that mirror surface. The testing equipment includes a testing optical system 1460 designed for creating a parallel test light beam parallel to the optical axis OA and incident on the parabolic mirror surface. The testing arrangement further includes a spherical mirror 1470 shaped and arranged with respect to the desired shape of the parabolic mirror 1421 such that the center of curvature 1490 of the spherical mirror 1470 coincides with the focal point of the parabolic mirror. In this arrangement, a test wave 1495 having a plane wave front provided by the optics 1460 and incident on the parabolic mirror surface 1421 is first converged by the parabolic mirror into the focal point 1490 of the parabolic mirror prior to impinging on the spherical mirror 1470. The spherical mirror 1470 reflects the test wave back along the same path into the test optics 1460. Deviations in path length between a planar reference wave and the wave reflected back from the parabolic mirror can be used to characterize the parabolic shape of the parabolic mirror.

The projection objective 1400 is telecentric on the object side and on the image side. One feature contributing to telecentricity on the object side is the particular convex shape of the entrance side of the first lens element (positive meniscus 1412) immediately following the object plane. Aspheric surfaces on the first two lenses on the object side contribute to telecentricity. The telecentric beam is essentially free of field zone errors on the object and image side, i.e. there is virtually no variation of telecentricity across the object or image field.

In FIGS. 30 to 32 three further embodiments of projection objectives 1500, 1600 and 1700 having a general construction similar to that shown in FIG. 4 having a catoptric second objective part are shown. Reference numerals for similar features/feature groups are similar, increased by 1300, 1400, 1500 respectively. The specifications are given in tables 30, 30A, 31, 31A and 32, 32A. When designing these embodiments, special emphasis was placed on optimization of material consumption and installation space required for the first, dioptric objective part 1510, 1610, 1710 serving as a relay system for imaging the object field into the first intermediate image.

As a common feature to all embodiments of FIGS. 30, 31 and 32 the first objective part has only six lens elements, i.e. transparent optical elements having considerable refractive power. Only positive lenses are used, thereby creating first objective parts with strong converging power in an axially short objective part having relatively small maximum diameter. In all embodiments, a plane parallel plate 1519, 1619, 1719 is positioned immediately following the respective first pupil plane 1511, 1611, 1711 of the projection objective. One advantage of placing at least one essentially plane parallel plate near a pupil surface is that such plate can be aspherized to correct for aberrations introduced by manufacturing or other effects (correction asphere). Such plate can be ex-changeable. In the embodiment of FIG. 30, an aperture stop A is provided within the first objective part 1510 at the pupil position immediately ahead of the parallel plate 1519. In the embodiments of FIGS. 31 and 32 the aperture stop is arranged within the third objective part in the region of maximum beam diameter at the third pupil surface 1631, 1731 respectively. All embodiments mentioned here have only positive lenses between the image side pupil plane and the image plane, where the embodiment in FIG. 30 has five such positive lenses and the other embodiments (FIGS. 31, 32) have only four positive lenses between the image side pupil surface and the image plane.

A comparative view of the first objective parts of the embodiments in FIGS. 30 to 32 reveals certain relations between the use of aspheric surfaces and the curvature of the entrance surface of the first lens element immediately following the objective plane. In the embodiment of FIG. 30, first lens element 1512 is a biconvex positive lens having a aspheric entrance surface facing the object plane, where this entrance surface is only slightly curved, with the radius of curvature exceeding 300 mm. Six aspheric surfaces (indicated by dots) are used. As evident from the rays crossing in the region of the first intermediate image 1503, coma is one prominent imaging error in the first intermediate image 1503. This error is compensated by the design of the optical surfaces downstream of the first intermediate image. In contrast, in the embodiment shown in FIG. 31 the aspheric entrance surface of the first lens element (positive meniscus 1612) has a relatively strong convex curvature having a radius of curvature below 300 mm (R≈154 mm in this case). Only four aspheric surfaces are employed in the first objective part 1610. The aspheric surfaces are adapted to the optical effect of the curved entrance surface such that the first intermediate image 1603 is essentially free of coma. This indicates a trend that a strong convex curvature of the entrance side is useful for obtaining a good quality first intermediate image with a small number of aspherical surfaces. In the first objective part 1710 of the embodiment shown in FIG. 32 an intermediate number of five aspheric surfaces is used in combination with an entrance surface of the first element (biconvex lens 1712) having moderate curvature (radius of curvature >300 mm). Providing an entry surface of the projection objective having no curvature (planar surface) or weak curvature (e.g. value of radius of curvature >500 nm or more) renders the objective relatively insensitive against pressure fluctuations of ambient pressure. As the number of aspheric surfaces is equal or less than the number of positive lenses in the first objective part of all three embodiments it can be seen that compact designs can be obtained when only positive lens elements are used and if a ratio between the number of lenses having refractive power and the number of aspheric surfaces is smaller than 1.6.

The embodiments of FIGS. 30 to 32 show that in the framework of a preferred design having a straight optical axis common to all objective parts and a catoptric second objective part it is possible to design the relay system on the entrance side of the objective (first objective part) with an axial length considerably smaller than the axial length of the third objective part. The axial length (measured between the object surface and the first intermediate image) may be less than 90% or less than 80% of the axial length of the third objective part (measured between the second intermediate image and the image plane). This indicates that the design can be used with various different positions of the second (catoptric or catadioptric) objective part between the refractive objective parts.

In the embodiments of FIGS. 30 to 32 the plano-convex lens closest to the image plane, i.e. the last lens of the objective, is made of calcium fluoride. Since this material is less sensitive to radiation induced density variations (particularly compaction) the service life time of the objective maybe increased when compared to objectives having last lenses made of fused silica. However, in immersion objectives designed for operating with water based immersion liquids last lens elements of calcium fluoride are problematic since calcium fluoride is soluble in water. Therefore, the life time of the system may be reduced. Therefore, a protection layer protecting the last lens element from degradation caused by an aggressive immersion liquid may be useful. Suitable protection layers are described, for example, in U.S. provisional application 60/530,623 filed on Dec. 19, 2003 by the applicant, the disclosure of which is incorporated herein by reference. In the embodiments of FIGS. 30 to 32 a thin plane parallel plate of fused silica having a thickness of 0.3 mm is adhered to the planar exit surface of the plano-convex calcium fluoride lens by wringing. The plane parallel quartz glass plate providing the exit surface of the projection objective can be exchanged, if desired. Exchanging may be desired if the fused silica material is damaged due to high radiation load and/or if contamination and/or scratches on the fused silica protection plate occur.

Using the embodiment of FIG. 32 as an example further characteristic features of projection objectives according to the invention are explained. To this end, a chief ray CR running from an outermost field point (furthest away from the optical axis AX) essentially parallel to the optical axis and intersecting the optical axis at three consecutive pupil surface positions P1, P2, P3, each within one of the imaging objective parts 1710, 1720, 1730, is drawn in bold line to facilitate understanding. The angle included between the optical axis AX and the chief ray CR at each position along the chief ray is denoted “chief ray angle” in the following. The chief ray CR is divergent (chief ray height increasing in light propagation direction) at the position of the first intermediate image 1703. The increasing chief ray height after the first intermediate image corresponds to a negative chief ray intersection length of the first objective part 1710 downstream of the first intermediate image 1703. Here, the “chief ray intersection length” is defined as an axial length between the position of the intermediate image and the intersection point of a tangent to the chief ray CR at the intermediate image. The intersection point is positioned on the object side of the first intermediate image within the first objective part 1710. A negative chief ray intersection length relative to the first intermediate image corresponds to a negative (virtual) exit pupil of the first objective part. In contrast, a convergent chief ray exists at the second intermediate image 1704, corresponding to a positive chief ray intersection length downstream of the second intermediate image, which corresponds to a real exit pupil existing downstream of the second intermediate image. The real exit pupil of the second objective part 1720 relative to the second intermediate image 1704 is therefore positioned outside the third objective part 1730 (real exit pupil) beyond the image plane. The virtual exit pupil of the first objective part 1710 coincides with the real entrance pupil of the second objective part 1720. Given these conditions a projection objective is provided having at least two intermediate images, wherein one imaging objective part (here the catadioptric or catoptric second objective part disposed between a refractive first objective part and a refractive third objective part) performs a real image formation between the first and second intermediate images wherein, in addition, a real entrance pupil is imaged into a real exit pupil. Since there is an accessible pupil surface P1 within the refractive first objective part and another accessible pupil surface P3 within the third objective part projection objectives of this type have two potential positions for placing an aperture stop to effectively define the numerical aperture used in the imaging process. Here, the term “accessible” refers to a potential aperture stop position in a section of an objective part passed only once by the light running through the projection objective.

Further, projection objectives according to preferred embodiments discussed here, have three real pupil surfaces P1, P2, P3 between object plane and image plane, wherein the maximum chief ray angle in one of these pupil surfaces is smaller than the object side numerical aperture and wherein in addition at least one of the following conditions is fulfilled: (1) The maximum marginal ray height in two of the three pupil surfaces is at most 50% of the maximum marginal ray height in the third pupil surface (here the third pupil surface P3); (2) the maximum chief ray angle in two of the pupil surfaces is at least twice as large as a maximum chief ray angle in the third pupil surface; (3) a maximum chief ray angle in two of the pupil surfaces is at least twice as large as the object side numerical aperture.

In the following, a number of embodiments are shown which are optimized with respect to the aspect of manufacturing and testing the aspheric surfaces used therein. In order to demonstrate one of the problems arising during preparation of aspheric surfaces on lenses FIGS. 33A and 33B each show an enlarged partial view of a meridonal lens section through a conventional objective having a thin positive lens L having an aspheric entrance surface AS. In FIG. 33A a characteristic ray R1 running along the periphery of the transmitted beam bundle and a characteristic beam R2 running close to the optical axis of the optical system are shown to demonstrate the optical action of the aspherical lens L. In the conventional system CONV the aspheric surface AS is designed to act as a positive lens for rays passing close to the optical axis and as a negative lens for rays close to the periphery of the light beam (ray R1). In order to obtain this variation of refractive power in meridional direction the aspheric surface has a positive curvature (C>0) in the area around the optical axis and a negative curvature (C<0) in the peripheral region where ray R1 passes. An inflection point IP characterized by a local curvature C=0 is positioned between the convex section (around the optical axis) and the concave section (at the periphery). Although the local change of the sense of curvature obtained this way may be desirable from an optical point of view, inflection points are critical when the surface finishing is considered since a finishing tool (schematically shown as tool T in FIG. 33B) having a reasonable diameter for efficient surface polishing may have substantially non-uniform effect in the region around the inflection point. Therefore, sufficient optical quality of aspherical surfaces having inflection points is difficult to obtain.

These problems can be avoided if the aspherical surface has no inflection point. The projection objective 1800 shown in FIG. 34 (specification given in tables 34 and 34A) is designed such that none of the aspherical surfaces has an inflection point.

Another feature of aspheric surfaces identified by inventors as being critical from a manufacturing point of view is explained in connection with FIG. 35. The inventors have found that high optical quality of aspheric surfaces can be obtained if extremal points (minima or maxima) on the surface shape of an aspheric surface outside the optical axis are avoided or, if that is not possible, if extremal points are only used on aspheric surfaces having an essentially flat basic shape. In FIG. 35 the surface shapes of two aspheric surfaces AS1 and AS2 are shown schematically in terms of the function p(h), where p is measured parallel to the optical axis (z-direction) and h is the height of a surface point, where the height corresponds to the radial distance between a surface point and the optical axis. Parameter p, as used here, denotes the axial separation of a plane normal to the optical axis and intersecting the relevant surface point to a plane parallel thereto and touching the vertex V of the optical elements on the optical axis.

In that respect, an extremal point on an aspheric surface is characterized by the fact that the first derivative (characterizing the slope of the surface) given by

$\frac{d\mspace{14mu} p}{d\mspace{14mu} h} = 0$

and that the second derivative

$\frac{d^{2}p}{d\mspace{14mu} h^{2}} \neq 0$

(here the second derivative describes the surface curvature). Therefore, the first asphere AS1 in FIG. 35 has a first extremal point EX11 and a second extremal point EX12 having opposite signs of the second derivative, whereas the second asphere AS2 has only one extremal point EX21. In the definitions used here the vertex V of the optical surface (where h=0) is excluded from the considerations, since the vertex always is an extremal point of rotational symmetric aspheric surfaces considered here.

In FIG. 35, the surface shape is depicted schematically between the optical axis (h=0) and the outer periphery of an area of the surface, which is finished with a tool e.g. by polishing. This finishing area is characterized by a maximum height h_(max). The maximum area optically used in operation is generally smaller such that the optically utilized radius is characterized by a maximum value h_(opt)<h_(max). The area outside the optically used area between the edge of that area and the edge of the optical component is denoted overrun region OR. This area is normally used for mounting the optical elements. However, during manufacturing the overrun region has to be included into the consideration regarding an optimum surface shape.

In the following it will be explained why extremal points on aspheric surfaces may be critical if optimum surface quality is desired. To this end, a rotary polishing tool T having a reasonable sized diameter is operating in the region of the first extremal point EX11. Depending on the relative dimensions between the “valley” around the extremal point EX11 and the tool T the area at the bottom of the concave valley may not to be polished sufficiently enough since the tool “bridges” the critical bottom area most of the time. Therefore, the surface quality in the extremal point region may be different from the surface quality of regions farther a way from the critical extremal point. On the other hand, if the extremal point corresponds to a convex “hill” on the aspheric surface, this area may be polished stronger than the surrounding area, which may also lead to irregularities of the surface quality in the extremal point region. These problems can be avoided if the aspheric surface has no extremal points (with the exception of the necessary extremal point at the vertex). Since the tool T will generally extend beyond the maximum optically used area (at h_(opt)) when the peripheral region of the optically used area is treated, it is desirable that extremal points are avoided also in the edge region OR.

On the other hand, aspheric surfaces having extremal points may be desired to obtain certain variations of refractive power of an aspheric surface in meridonal direction. It has been found by the inventors that extremal points can be acceptable from a manufacturing point of view if the extremal point is present on an optical surface having an essentially flat basic shape. For example, the aspheric surface may be formed on a flat side of a plano convex or a plano concave lens or on a surface of a plane parallel plate. Preferably, the absolute value of the maximum z-variation (p_(max)) of such surfaces having an extremal point should not exceed 0.5 mm, more preferably should be smaller than 0.25 mm. The optical advantages of extremal points on aspheric surfaces can thus be obtained without significant irregularities in optical surface quality.

In FIG. 36 an embodiment of a projection objective 1900 is shown where all aspheric surfaces are free of extremal points outside the optical axis. The specification is given in tables 36 and 36A. If an aspherical surface with an extremal point should be desired, this should be formed on an optical surface having an essentially flat basic shape, typically having a long radius with |r|>2000 mm.

FIGS. 37 and 38 show embodiments of projection objectives 2000, 2100 designed according to the general construction given in FIG. 4, i.e. having a catoptric (purely reflective) second objective part 2020, 2120, respectively. Reference numerals for similar features/feature groups are similar, increased by 1800, 1900, respectively. The specifications are given in tables 37, 37A and 38, 38A. When designing these embodiments, special emphasis was placed on a balanced design having only few correcting means, such as aspheres, and a moderate number of lens elements. In addition, a balanced distribution of refractive power amongst different parts of the projection objective contributes to a harmonic beam deflection throughout the optical system. The harmonic general construction makes the designs less sensitive against maladjustment of single lens elements or lens groups and facilitates incorporation of manipulators for dynamically influencing the performance of the optical system, e.g. by moving of single lenses or lens groups in axial direction, perpendicular to the optical axis and/or by tilting.

In the embodiment of FIG. 37 only ten aspheric surfaces are used, which, according to the considerations given above, can be manufactured and tested in a relatively cost-effective way. The last optical element (plano-convex lens 2050 immediately ahead of the image plane 2002) is made of fused silica, having a thickness at the edge of the optical used area of about 23 mm. The overall wave front error is reduced to 1.6 mλ. All lenses are made of fused silica, about 60 kg blanc material of fused silica being necessary to make all lenses. In contrast, the plano-convex lens 2150 forming the last element of the embodiment of FIG. 38 is made of calcium fluoride, which material is less prone to radiation induced densitiy variations (compaction and rarefaction). Using 12 aspheric surfaces which can be manufactured with moderate effort it is possible to obtain a performance characterized by a wave front error of 2.1 mλ. An overall blanc mass of about 63 kg fused silica and 1.5 kg calcium fluoride is used for this embodiment.

In FIGS. 39 and 40 two embodiments are shown which are characterized, amongst other features, by the fact that the first objective part imaging the object field into the first intermediate image is a catadioptric objective part including one concave mirror and one additional mirror having a curved mirror surface, where the curved mirror surfaces of the concave mirror and the additional mirror are facing each other such that the first objective part can serve as a relay system in projection objectives of preferred embodiments having one straight common optical axis for all objective parts.

The specification of the projection objective 2200 shown in FIG. 39 is given in table 39 and 39A (aspheric constants). The system is designed for 193 nm for using water (n=1.436677) as an immersion fluid. All lenses except the last image side optical element (plano-convex lens 2260 made of calcium fluoride) are made of fused silica. An image side numerical aperture NA=1.2 is obtained at an image field size 26 mm-5.5 mm arranged 21.8 mm outside the optical axis. The track length (object image distance) is 1125 mm.

A first, catadioptric objective part 2210 is designed for creating a first intermediate image 2203. The second, catadioptric objective part 2220 designed for creating the second intermediate image 2204 from the first intermediate image includes a first concave mirror 2221 and a second concave mirror 2222 having concave mirror surfaces facing each other and defining an intermirror space, and a positive meniscus lens 2229 having an aspheric, concave entrance surface immediately downstream of the first intermediate image. A dioptric third objective part 2230 is designed for imaging the second intermediate image onto the image plane 2202, whereby a thin layer of water (immersion fluid I) is transited by the radiation. An aperture stop A is positioned in the third objective part.

The first objective part 2210 includes, in that optical sequence from the object field, a biconvex positive lens 2211 having a strongly aspheric entrance surface and an aspheric exit surface, a positive meniscus lens 2212 having an aspheric concave entrance surface and a spherical exit surface, and a concave mirror 2213 having an object side concave mirror surface and being arranged eccentrically to the optical axis, but intersecting the optical axis 2205. The radiation reflected back from the concave mirror transits the positive meniscus 2212 in the opposite direction and mostly on the opposite side of the optical axis compared to the radiation passing between object field and concave mirror 2213. An additional mirror 2214 with convex mirror surface is provided by an off-axis mirror coating on the image side surface of convex lens 2211. The radiation passes the positive meniscus 2212 a third time prior to formation of the first intermediate image. Therefore, the lens 2212 is used three times at laterally offset lens regions.

Whereas concave mirror 2213 is positioned optically near a pupil surface, convex mirror 2214 is arranged optically near to the intermediate image 2203. Therefore, field aberrations and pupil aberrations can be corrected separately by selecting according shapes of the concave and convex mirrors 2213, 2214. This allows to adjust the correction status of the first intermediate image 2203 such that residual imaging errors can be compensated by the two objective parts following downstream of the first intermediate image including the catadioptric second objective part 2220.

The first objective part is designed as an enlarging system having a significant magnification |β₁|>1. The first intermediate image 2203 is positioned geometrically near the closest edge of convave mirror 2213 outside the intermirror space defined between the concave mirrors 2221 and 2222 of the second objective part, whereby the optical distance between the first intermediate image and the first concave mirror 2221 becomes rather large, whereas the optical distance between the second concave mirror 2222 and the second intermediate image 2204 becomes rather small. Therefore, the sizes of the concave mirrors of the second objective part differ significantly, the optically used area of the first concave mirror being about twice as large as the corresponding area on the second concave mirror. Both concave mirrors 2221 and 2222 are positioned outside the optical axis such that the optical axis does not intersect the optically used mirror surfaces. Since the concave mirrors are positioned at different positions with regard to the ratio between the ray heights of principal ray and marginal ray, the correcting effects of the concave mirrors on different imaging errors can be distributed between the two catadioptric objective parts 2210 and 2220.

The projection objective 2300 shown in FIG. 40 is designed as a “solid immersion lens” having a finite image side working distance in the order of the design wavelength λ of the system (193 nm) or fractions thereof (e.g. λ/2 or λ/4 or below). Evanescent fields exiting from the exit surface of the last lens can be used for imaging. The system is adapted for optical near field lithography. Reference is made to German patent application DE 10332112.8 filed on Jul. 9, 2003 by the applicant, where preferred conditions for optical near field lithography are specified. No liquid immersion fluid is necessary in this case for obtaining an image side numerical aperture NA>1. In the embodiment NA=1.05 for a image field size 22 mm-4.5 mm, where the image field is arranged 39 mm off-axis. The overall reduction ratio is 1:4, the track length is 1294.4 mm. In this design, all lenses including the last, image side plano-convex lens 2360 are made of fused silica. The specification is given in tables 40 and 40A (aspheric constants).

The first, catadioptric objective part 2310 designed for creating the first intermediate image 2303 from the object field on an enlarged scale includes, in that sequence along the optical path, a biconvex positive lens 2311 having an aspheric entrance surface and a spherical exit surface, a concave mirror 2312, having an object side mirror surface, a convex mirror 2313 having slightly curved convex mirror surface facing the concave mirror and being formed by a mirror coating on an elevated section of the image side lens surface of lens 2311, a bispherical positive meniscus lens 2314 having a concave entry side, and a biconvex positive lens 2315 having a strongly aspheric exit surface positioned in the immediate vicinity of the first intermediate image 2303.

The second, catadioptric objective part 2320 picks up the first intermediate image 2303 and forms the second intermediate image 2304 located geometrically within an intermirror space defined by the first concave mirror 2321 and the second concave mirror 2322 of the second objective part. The second objective part further includes negative meniscus lenses 2325, 2326 each positioned immediately ahead of the mirror surface of an associated concave mirror 2321 and 2322, respectively. A strong correcting effect on longitudinal chromatic aberration (CHL) can be obtained this way. A biconvex positive lens 2328 having an object side aspheric surface and an image side spherical surface extents across the entire diameter of the projection objective between the first and second concave mirrors 2321, 2322 and is passed three times by the radiation, once between the first intermediate image and the first concave mirror, a second time between the first and the second concave mirrors 2321, 2322 and a third time between the second concave mirror 2322 and the second intermediate image 2304.

In this embodiment, all three concave mirrors 2312, 2321, 2322 are positioned optically remote from the pupil surface of the projection objective. Also, the almost flat convex mirror 2313 is positioned clearly outside the first pupil surface P1. The design allows to distribute the correcting effects of catadioptric objective parts between the first and the second objective part.

The invention allows to manufacture catadioptric projection objectives which, in many respects of practical implementation into a projection exposure apparatus, have similar properties to conventional refractive projection objectives, whereby a change over between refractive systems and catadioptric systems is greatly facilitated. Firstly, the invention allows to built catadioptric projection objectives having one straight (unfolded) optical axis. Further, an object field disposed on one side of the optical axis may be imaged into an image field disposed on the opposite side of the optical axis, i.e. the imaging is performed with “negative magnification”. Thirdly, the objectives can be designed to have isotropic magnification. Here, the term “isotropic magnification” refers to an image formation without “image flip”, i.e. without a change of chirality between object field and image field. With other words, features on the reticle described in a right handed coordinate system can be described in a similar right handed coordinate system in the image. The negative isotropic magnification is present in both x- and y-directions perpendicular to the optical axis. This allows to use the same type of reticles also used for imaging with refractive projection objectives. These features facilitate implementation of catadioptric projection objectives according to the invention in conventional exposure apparatus designed for refractive projection objectives since no major reconstructions are required, for example, at the reticle- and wafer-stages. Also, reticles designed for use with refractive projection objectives can in principle also be used with catadioptric projection objectives according to the invention. Considerable cost savings for the end user can be obtained this way.

As mentioned earlier, the invention allows to built catadioptric projection objectives with high numerical aperture, particularly allowing immersion lithography at numerical apertures NA>1, that can be built with relatively small amounts of optical material. The potential for small material consumption is demonstrated in the following considering parameters describing the fact that particularly compact projection objectives can be manufactured.

Generally, the dimensions of projection objectives tend to increase dramatically as the image side numerical aperture NA is increased. Empirically it has been found that the maximum lens diameter D_(max) tends to increase stronger than linear with increase of NA according to D_(max)˜NA^(k), where k>1. A value k=2 is an approximation used for the purpose of this application. Further, it has been found that the maximum lens diameter D_(max) increases in proportion to the image field size (represented by the image field height Y′). A linear dependency is assumed for the purpose of the application. Based on these considerations a first compactness parameter COMP1 is defined as:

COMP1=D _(max)/(Y′·NA²).

It is evident that, for given values of image field height and numerical aperture, the first compaction parameter COMP1 should be as small as possible if a compact design is desired.

Considering the overall material consumption necessary for providing a projection objective, the absolute number of lenses, N_(L) is also relevant.

Typically, systems with a smaller number of lenses are preferred to systems with larger numbers of lenses. Therefore, a second compactness parameter COMP2 is defined as follows:

COMP2=COMP1·N _(L).

Again, small values for COMP2 are indicative of compact optical systems.

Further, projection objectives according to the invention have at least three objective parts for imaging an entry side field plane into an optically conjugate exit side field plane, where the imaging objective parts are concatenated at intermediate images. Typically, the number of lenses and the overall material necessary to build an projection objective will increase the higher the number N_(OP) of imaging objective parts of the optical system is. It is desirable to keep the average number of lenses per objective part, N_(L)/N_(OP), as small as possible. Therefore, a third compactness parameter COMP3 is defined as follows:

COMP3=COMP1·N _(L) /N _(OP).

Again, projection objectives with low optical material consumption will be characterized by small values of COMP3.

Table 41 summarizes the values necessary to calculate the compactness parameters COMP1, COMP2, COMP3 and the respective values for these parameters for each of the systems presented with a specification table (the table number (corresponding to the same number of a figure) is given in column 1 of table 41). Therefore, in order to obtain a compact catadioptric projection objective having at least one concave mirror and at least three imaging objective parts (i.e. at least two intermediate images) at least one of the following conditions should be observed:

COMP1<11

Preferably COMP1<10.8, more preferably COMP1<10.4, even more preferably COMP1<10 should be observed.

COMP2<300

Preferably COMP2<280, more preferably COMP2<250, even more preferably COMP2<230 should be observed

COMP3<100

Preferably COMP3<90, more preferably COMP3<80, even more preferably COMP3<75 should be observed.

Table 41 shows that preferred embodiments according to the invention generally observe at least one of these conditions indicating that compact designs with moderate material consumption are obtained according to the design rules laid out in this specification.

If desired, various types of filling gases can be used to fill the empty spaces between the optical elements of the projection objectives. For example, air or nitrogen or helium can be used as filling gas depending or desired properties of the embodiment.

Favorable embodiments may be characterized by one or more of the following conditions. The first objective part is preferably designed as an enlarging system, preferably having a magnification β₁ in the range 1<|β₁|<2.5. This ensures low NA at the first intermediate image and helps to avoid vignetting problems. |β₁| may be 1:1 or may be slightly smaller, e.g. 0.8≦|β₁≦1. The second objective part is preferably designed as a system having near to unit magnification, i.e. almost no magnification or reduction. Particularly, the second objective part may be designed as a system having a magnification β₂ in the range 0.4<|β₂|<1.5, more preferably in the range 0.8<|β₂|<1.25 or in the range 0.9<|β₂|<1.1. The third objective part preferably has a reducing magnification |β₃|<1. The entire projection objective has a magnification β where β=β₁·β₂·β₃. The second intermediate image may have a size larger than the image size.

Preferably, both the first intermediate image and the second intermediate image are located geometrically within the intermirror space between the first concave mirror and the second concave mirror. They may be located geometrically in a middle region centered around the midpoint between the two concave mirrors within the intermirror space between the first concave mirror and the second concave mirror, wherein the middle region extends in a space having an axial extension 90% of an axial distance between the vertices of the curvature surfaces of the first and second concave mirror.

If d is the distance on the optical axis between the two concave mirrors, d1 is the distance on the optical axis between the first intermediate image and the first concave mirror and d2 is the distance on the optical axis between the second concave mirror and the second intermediate image, then the relations: 0.5 d/2<d1<1.5 d/2 and 0.5 d/2<d2<1.5 d/2 are preferably satisfied. The distances mentioned above are to be measured along the optical axis, which may be folded. Preferably, a chief ray of the most off axial field point intersects the optical axis in the same described region between d/4 and 3d/4 between the two concave mirrors in the vicinity of the location of the first intermediate image. Pupil positions are then remote from mirrors.

It has been found useful to design the optical system such that at least one intermediate image, preferably all intermediate images are positioned such that there exists a finite minimum distance between the intermediate image and the next optical surface, which is a mirror surface in most embodiments. If a finite minimum distance is maintained it can be avoided that contaminations or faults on or in the optical surface are imaged sharply into the image plane such that the desired imaging of a pattern is disturbed. Preferably, the finite distance is selected depending on the numerical aperture of the radiation at the intermediate image such that a sub-aperture (footprint of a particular field point) of the radiation on the optical surface next to the intermediate image has a minimum diameter of at least 3 mm or at least 5 mm or at least 10 mm or at least 15 mm. It is obvious from the figures and tables that these conditions are easily met by most or all embodiments in relation to the distance between an intermediate image within the intermirror space and the mirror surface arranged optically nearest to the intermediate image. Embodiments having intermediate images arranged in the middle region between the concave mirrors are particularly well-natured in this respect.

All transparent optical components of the embodiments described above, with a possible exception at the last image side lens, which may be of calcium fluoride, are fabricated from the same material, namely fused silica (SiO₂). However, other materials, in particular, crystalline alkaline earth metal fluoride materials, that are transparent at the working wavelength may also be used. At least one second material may also be employed in order to, for example, assist correction for chromatic aberration, if necessary. Of course, the benefits of the invention may also be utilized in the case of systems intended for use at other wavelengths, for example, at 248 nm or 157 nm.

Some or all conditions are met by some or all embodiments described above.

It is to be understood that all systems described above may be complete systems for forming a real image (e.g. on a wafer) from a real object. However, the systems may be used as partial systems of larger systems. For example, the “object” for a system mentioned above may be an image formed by an imaging system (relay system) upstream of the object plane. Likewise, the image formed by a system mentioned above may be used as the object for a system (relay system) downstream of the image plane.

The above description of the preferred embodiments has been given by way of example. From the disclosure given, those skilled in the art will not only understand the present invention and its attendant advantages, but will also find apparent various changes and modifications to the structures and methods disclosed. It is sought, therefore, to cover all changes and modifications as fall within the spirit and scope of the invention, as defined by the appended claims, and equivalents thereof.

The contents of all the claims is made part of this description by reference.

TABLE 4 J 205 Surface Radius Thickness Material ½ Diam. 1 151.647118 39.665046 SiO2 86.120 2 −1368.552447 69.197177 85.246 3 158.992783 15.145647 SiO2 75.907 4 206.923841 38.570349 73.675 5 97.678872 40.014335 SiO2 69.070 6 −5437.460665 6.811056 64.924 7 138.801509 16.000000 SiO2 53.028 8 573.226631 49.296968 47.448 9 −57.862177 14.263643 SiO2 47.630 10 −84.936107 112.509668 57.274 11 −413.250477 39.459821 SiO2 106.087 12 −160.648303 5.882304 109.942 13 797.277933 34.177152 SiO2 115.560 14 −430.752073 244.699332 115.661 15 −199.609067 −204.699112 REFL 134.925 16 157.344690 246.319295 REFL 109.289 17 862.084499 22.994398 SiO2 70.571 18 −419.719089 18.726730 69.767 19 −150.816336 15.000000 SiO2 67.991 20 131.971848 26.143914 70.182 21 −1567.196375 19.813697 SiO2 72.656 22 −217.593380 44.615314 76.740 23 −2829.863046 39.782748 SiO2 103.845 24 −203.824432 1.000000 107.411 25 524.684787 25.000000 SiO2 114.960 26 902.564365 1.000000 115.451 27 530.781146 38.825378 SiO2 116.178 28 −473.210631 1.000000 116.066 29 0.000000 0.000000 113.556 30 322.948582 29.038119 SiO2 113.791 31 −2580.799702 1.000000 113.022 32 512.569763 30.174661 SiO2 110.876 33 −677.235877 1.000000 109.014 34 106.347684 68.066974 SiO2 90.295 35 −1474.944139 0.999719 77.627 36 54.296611 42.467148 CAF2 45.513 37 0.000000 3.000000 H2O 20.998

TABLE 4A Aspherical Constants SRF 2 3 8 12 15 K 0 0 0 0 0 C1 3.477033e−08 −6.813990e−09 3.966411e−07 4.439638e−09 1.447452e−08 C2 −4.731536e−13 −8.621629e−12 −4.007014e−12 1.686758e−13 2.261476e−13 C3 2.796504e−17 −2.762099e−16 7.436146e−15 8.011815e−19 2.580774e−18 C4 −6.649516e−22 −9.615951e−21 1.520683e−18 9.201114e−22 1.377485e−22 C5 −2.829603e−25 −5.726076e−24 −9.949722e−22 −4.382820e−26 −3.426657e−27 C6 1.815473e−29 3.251913e−28 7.293926e−25 1.782591e−30 1.279942e−31 SRF 16 17 19 22 30 K 0 0 0 0 0 C1 4.549402e−08 1.523352e−07 1.162948e−07 −1.982157e−08 1.201912e−08 C2 −5.067161e−12 −5.763168e−12 −6.089203e−13 −5.382822e−13 −1.705175e−13 C3 2.777252e−16 7.475933e−17 −1.025185e−16 1.200748e−17 −8.926277e−17 C4 −3.138154e−20 6.617515e−20 2.192456e−20 −2.867314e−21 −4.435922e−21 C5 2.350745e−24 −2.264827e−24 −5.792211e−25 1.105789e−25 8.175482e−25 C6 −7.599030e−29 −1.064596e−28 5.642674e−28 −3.023003e−31 −2.371799e−29 SRF 33 35 K 0 0 C1 1.147736e−08 9.136462e−08 C2 4.202468e−13 −5.545932e−13 C3 −1.260714e−17 1.560631e−16 C4 −2.591704e−21 −3.601282e−20 C5 4.606100e−26 8.986671e−25 C6 9.707119e−30 3.847941e−29

TABLE 7 J 206 Surface Radius Thickness Material ½ Diam. 1 0.000000 0.000000 76.473 2 196.748623 27.263207 SiO2 81.548 3 1380.478547 27.173549 81.569 4 148.118896 29.558580 SiO2 83.220 5 985.952509 45.383760 81.731 6 587.017766 26.742601 SiO2 74.752 7 −268.687626 5.952675 73.075 8 121.069967 20.000000 SiO2 59.416 9 338.972294 15.471207 55.151 10 123.398576 16.000000 SiO2 42.222 11 493.239196 38.514952 36.268 12 −56.743953 79.995013 SiO2 40.070 13 −98.465204 60.825433 74.618 14 −3097.977653 27.304241 SiO2 102.327 15 −295.526762 3.782338 104.658 16 271.693311 37.763865 SiO2 112.015 17 −3936.289483 25.000000 112.208 18 162.629416 202.628857 112.852 19 −195.636303 −202.628857 REFL 119.680 20 162.629416 202.628857 REFL 104.093 21 −195.636303 44.391294 76.907 22 −1229.055417 33.250147 SiO2 83.109 23 −160.024467 37.552215 84.448 24 −246.047659 15.000000 SiO2 74.951 25 134.897718 28.252914 72.042 26 −768.808515 15.000000 SiO2 73.163 27 −355.461110 71.356200 76.177 28 −3425.435334 32.788842 SiO2 102.647 29 −255.172254 10.903212 105.332 30 695.872359 30.470261 SiO2 110.205 31 −625.346253 9.352817 110.381 32 0.000000 −8.352817 108.884 33 329.990101 40.669818 SiO2 110.434 34 −427.546014 1.000000 110.052 35 158.678466 45.978153 SiO2 102.564 36 378.976619 1.000000 95.391 37 108.606008 71.612816 SiO2 81.775 38 526.305326 1.000000 54.478 39 52.236898 36.413852 CAF2 39.598 40 0.000000 3.000000 H2O 19.842

TABLE 7A Aspherical Constants SRF 4 11 15 18 K 0 0 0 0 C1 −6.330577e−08 3.463909e−07 1.324809e−08 −7.037790e−09 C2 −3.872322e−12 −2.533709e−11 2.103578e−13 −2.219032e−13 C3 1.663761e−17 3.527218e−14 3.059213e−18 −7.410203e−18 C4 −2.340311e−20 −2.199769e−17 −5.028780e−23 −1.155705e−22 C5 1.375334e−24 −1.507925e−21 1.624941e−26 −8.984707e−27 C6 −1.682943e−29 5.496658e−24 −6.281302e−31 −1.590542e−31 SRF 19 22 24 27 K 0 0 0 0 C1 2.310646e−08 6.335247e−08 3.536885e−08 8.583557e−08 C2 3.623856e−13 −1.090600e−11 9.732363e−12 3.629209e−12 C3 5.711204e−18 2.432505e−16 −1.879646e−16 −8.012301e−17 C4 8.453421e−23 −1.490760e−21 1.841476e−20 5.223547e−20 C5 1.508061e−27 1.908731e−24 −2.885890e−24 −9.160836e−24 C6 1.239941e−31 −1.282225e−28 2.916860e−28 1.028273e−27 SRF 34 36 38 K 0 0 0 C1 2.169817e−08 −1.524001e−08 1.877887e−07 C2 −5.404878e−13 1.625696e−12 1.445239e−11 C3 5.551093e−17 −3.076521e−16 1.060456e−16 C4 −2.305595e−21 8.708326e−21 3.470869e−19 C5 4.260803e−26 4.665020e−25 −6.424228e−23 C6 −9.442220e−32 −2.136828e−29 1.397331e−26

TABLE 8 J 201 Surface Radius Thickness Material ½ Diam. 1 0.000000 0.000000 77.084 2 144.715774 34.413396 SiO2 85.539 3 1168.820838 42.714222 84.636 4 137.626538 26.913912 SiO2 78.160 5 231.768696 25.969904 74.133 6 −256.723584 9.491982 SiO2 73.679 7 −300.099619 24.637606 73.830 8 95.378233 35.795212 SiO2 66.319 9 2978.156744 6.137057 62.554 10 113.175934 18.340535 SiO2 50.838 11 791.566883 42.223464 45.085 12 −57.334745 47.676082 SiO2 42.772 13 −104.057645 85.668623 64.264 14 −747.828120 23.558823 SiO2 98.262 15 −237.780029 11.502675 100.729 16 466.711415 38.824036 SiO2 109.480 17 −377.473708 39.986102 109.791 18 160.832778 201.116223 111.102 19 −190.162844 −201.116223 REFL 125.335 20 160.832778 201.116223 REFL 106.939 21 −190.162844 40.087040 74.503 22 −429.676099 17.543012 SiO2 77.631 23 −222.069915 45.151970 78.588 24 −438.919401 16.685064 SiO2 75.545 25 125.893773 22.634903 73.362 26 706.231560 15.535140 SiO2 74.562 27 −483.323705 69.793709 76.473 28 −1219.864506 31.389217 SiO2 101.495 29 −226.588128 6.763552 104.174 30 443.080071 40.992305 SiO2 110.047 31 −556.882957 4.990520 109.849 32 0.000000 −3.144971 107.701 33 274.803577 29.023782 SiO2 108.934 34 −6968.358008 0.969032 108.499 35 213.748670 46.817088 SiO2 106.084 36 −8609.746220 0.945349 101.542 37 114.821261 64.641285 SiO2 84.961 38 −4598.248046 0.926317 66.788 39 53.647792 40.301900 CAF2 42.988 40 0.000000 3.000000 H2O 20.327

TABLE 8A Aspherical Constants SRF 4 11 15 18 K 0 0 0 0 C1 −5.141395e−08 4.483031e−07 1.313620e−08 −7.985633e−09 C2 −5.556822e−12 −9.959839e−12 3.644835e−13 −2.642498e−13 C3 −2.754499e−16 5.082134e−15 5.949608e−18 −6.856089e−18 C4 −1.253113e−20 2.578467e−18 5.732895e−22 −5.142965e−22 C5 −4.228497e−24 −3.461879e−21 −2.284813e−26 1.912150e−26 C6 2.490029e−28 1.628794e−24 8.340263e−31 −1.470786e−30 SRF 19 22 24 27 K 0 0 0 0 C1 2.017668e−08 4.549402e−08 1.523352e−07 1.162948e−07 C2 3.361249e−13 −5.067161e−12 −5.763168e−12 −6.089203e−13 C3 4.310554e−18 2.777252e−16 7.475933e−17 −1.025185e−16 C4 1.686493e−22 −3.138154e−20 6.617515e−20 2.192456e−20 C5 −3.551936e−27 2.350745e−24 −2.264827e−24 −5.792211e−25 C6 2.057764e−31 −7.599030e−29 −1.064596e−28 5.642674e−28 SRF 33 36 38 K 0 0 0 C1 −1.982157e−08 1.201912e−08 1.148008e−07 C2 −5.382822e−13 −1.705175e−13 −5.056506e−13 C3 1.200748e−17 −8.926277e−17 1.189381e−16 C4 −2.867314e−21 −4.435922e−21 −1.274117e−20 C5 1.105789e−25 8.175482e−25 −3.981271e−24 C6 −3.023003e−31 −2.371799e−29 3.798968e−28

TABLE 16 NA = 1.2, β = 0.25 a b c Field 26 5 4.75 WL 193.3 nm SILUV 1.56049116 CAFUV 1.50110592 H2OV 1.4368 Sur- ½ face Radius Thickness Material Diam. Type 0 0.000000000 31.999475127 AIR 65.000 1 133.894287787 14.995217082 SILUV 84.778 2 127.681095498 25.597460396 AIR 82.945 3 402.041163143 34.247197246 SILUV 84.808 4 −292.795248488 0.996612226 AIR 85.527 5 −865.792789804 19.686989978 SILUV 84.845 6 −194.300017249 0.997731584 AIR 84.746 7 166.499926718 34.205033740 SILUV 81.167 8 −3411.356708300 0.997606594 AIR 78.713 9 108.528463069 16.234112594 SILUV 67.657 10 101.654206518 13.668730583 AIR 60.671 11 161.992336120 14.997158671 SILUV 58.598 12 2789.766305580 83.396846659 AIR 54.555 13 −51.475183292 14.997760255 SILUV 49.489 14 −64.480378016 0.998543606 AIR 60.882 15 −523.449669764 57.729408261 SILUV 91.022 16 −124.018124564 0.995673329 AIR 97.756 17 213.269322132 24.422343766 SILUV 111.322 18 368.130596294 326.268973067 AIR 110.123 19 −161.615015336 14.998434538 SILUV 131.765 20 −312.345980956 31.430358591 AIR 153.714 21 −214.602996812 −31.430358591 AIR 155.986 REFL 22 −312.345980956 −14.998434538 SILUV 149.921 23 −161.615015336 −238.077915164 AIR 116.301 24 149.287132498 −14.998202246 SILUV 103.169 25 317.538289321 −33.202694396 AIR 133.495 26 186.422421298 33.202694396 AIR 137.843 REFL 27 317.538289321 14.998202246 SILUV 136.305 28 149.287132498 324.504871734 AIR 116.434 29 304.025895186 51.634530337 SILUV 102.695 30 −321.237280055 36.471806645 AIR 101.284 31 −141.718556476 14.999755253 SILUV 84.799 32 104.217593104 30.610688625 AIR 74.074 33 581.141203674 15.015591714 SILUV 75.850 34 −637.266899243 22.019923725 AIR 78.058 35 −222.755672262 20.582750922 SILUV 80.475 36 −149.492790226 0.999906680 AIR 84.782 37 260.619344057 25.604090348 SILUV 101.752 38 1033.029187190 30.684011762 AIR 102.212 39 181.295872049 62.489568781 SILUV 109.856 40 −319.175759184 1.032697080 AIR 108.616 41 0.000000000 24.649355928 AIR 99.183 42 241.322246262 26.360109939 SILUV 88.680 43 −555.614152728 2.010445644 AIR 85.697 44 77.526002487 41.372376482 SILUV 67.268 45 494.197664171 0.978420324 AIR 60.833 46 46.187199269 35.625423750 CAFUV 39.405 47 0.000000000 2.999559725 H2OV 20.942 48 0.000000000 0.000000000 AIR 16.250

TABLE 16A Aspherical Constants Surface K C1 C2 C3 3 0.00000000e+000 −8.36067621e−008 2.12798795e−011 −1.45207564e−015 6 0.00000000e+000 7.69835587e−008 2.07985891e−012 1.16482389e−016 7 0.00000000e+000 1.36850714e−007 −9.44752603e−012 −1.50977238e−016 12 0.00000000e+000 7.53715484e−007 −6.61209701e−011 4.22074183e−015 16 0.00000000e+000 −5.85261742e−008 7.70941737e−013 −1.40836094e−016 29 0.00000000e+000 9.56507182e−008 −2.16638529e−012 −1.23753850e−017 31 0.00000000e+000 1.85417093e−007 −2.24667567e−012 6.93769095e−017 34 0.00000000e+000 1.66095759e−007 2.43350203e−012 8.88822140e−017 39 0.00000000e+000 −3.25790615e−009 −2.00206347e−012 4.31870304e−017 42 0.00000000e+000 −5.33787564e−008 2.40117270e−012 3.20136118e−016 43 0.00000000e+000 1.13532739e−007 −5.93286761e−012 1.32296454e−015 45 0.00000000e+000 8.97031378e−008 2.47066509e−011 −2.77876411e−016 Surface C4 C5 C6  3 7.63154357e−020 2.95348560e−024 −3.46561258e−028  6 −4.80737790e−021 5.59439946e−024 −1.29197249e−028  7 −5.84681939e−020 7.86623559e−024 −7.24516725e−028 12 −8.02992365e−019 −7.38686026e−022 1.22771230e−025 16 6.45911985e−021 −3.82872278e−025 4.17640461e−031 29 2.58232933e−022 −6.80943505e−025 3.02935682e−029 31 6.79498891e−020 −6.82812342e−024 2.20970580e−028 34 2.60945386e−020 −3.60666201e−024 5.36227764e−028 39 −2.48544823e−021 5.50166118e−026 −3.31463292e−031 42 9.55299044e−021 −9.27935397e−024 8.13460411e−028 43 −1.88960302e−019 1.04299856e−023 1.69382125e−028 45 −7.08589002e−019 1.20774587e−022 −7.67132589e−027

TABLE 17 NA = 1.2, β = 0.25 a b c Field 26 5 4.75 WL 193.3 nm SILUV 1.56049116 CAFUV 1.50110592 H2OV 1.4368 Surface Radius Thickness Material ½ Diam. Type 0 0.000000000 31.997721704 AIR 65.000 1 579.464506139 20.317824521 SILUV 74.592 2 −577.479988552 0.999475036 AIR 75.821 3 2572.370914820 28.040565960 SILUV 76.612 4 243.390586919 11.985977074 AIR 79.119 5 500.676303821 43.989139515 SILUV 80.893 6 −155.064044118 21.184157632 AIR 82.707 7 1381.321630200 18.191562266 SILUV 75.159 8 −393.944847792 0.998449340 AIR 74.340 9 87.946501567 40.892320851 SILUV 65.550 10 99.239178252 25.553101192 AIR 52.382 11 209.138140913 15.063951314 SILUV 45.950 12 −601.200979555 66.005892131 AIR 42.845 13 −55.332841330 14.999477956 SILUV 50.547 14 −72.577526567 1.163693447 AIR 62.349 15 −346.873498438 34.446292165 SILUV 80.990 16 −150.420697383 2.645359711 AIR 86.680 17 611.326207207 44.474569849 SILUV 99.391 18 −228.818841769 265.128541011 AIR 100.925 19 −190.727371287 15.000448317 SILUV 108.586 20 −237.320724749 14.700965847 AIR 118.645 21 −194.872786703 −14.700965847 AIR 120.611 REFL 22 −237.320724749 −15.000448317 SILUV 116.199 23 −190.727371287 −195.428248584 AIR 100.830 24 190.727371287 −15.000448317 SILUV 104.448 25 237.320724749 −14.700965847 AIR 120.847 26 194.872786703 14.700965847 AIR 124.569 REFL 27 237.320724749 15.000448317 SILUV 122.685 28 190.727371287 266.167203345 AIR 111.392 29 315.808627637 45.375871773 SILUV 95.944 30 −367.849317765 64.350407265 AIR 94.229 31 −123.002265506 14.998717744 SILUV 70.954 32 113.714722161 32.318363032 AIR 68.389 33 −990.749351417 21.237444356 SILUV 71.838 34 −292.571717802 35.154029607 AIR 78.053 35 −18220.224013700 40.604404749 SILUV 103.420 36 −201.028020704 1.097799815 AIR 107.104 37 366.725287540 37.745092677 SILUV 119.548 38 −961.362776974 0.999856805 AIR 119.749 39 338.337923773 38.019811036 SILUV 118.590 40 −1026.771599840 −1.410077329 AIR 117.118 41 0.000000000 12.743520660 AIR 115.541 42 280.022380007 19.482737236 SILUV 110.210 43 1517.149279230 1.197846646 AIR 108.733 44 719.327066326 32.079810786 SILUV 107.695 45 −474.571764529 2.724748590 AIR 105.913 46 89.479992014 48.063302904 SILUV 75.467 47 364.001398221 2.359587817 AIR 64.121 48 52.126874613 39.040570663 CAFUV 42.333 49 0.000000000 2.999196815 H2OV 20.183 50 0.000000000 0.000000000 AIR 16.250

TABLE 17A Aspherical Constants Surface K C1 C2 C3 6 0.00000000e+000 −1.15035308e−009 6.18896918e−013 −4.28285081e−016 7 0.00000000e+000 −1.72652480e−008 −3.70258486e−014 −1.25882856e−015 12 0.00000000e+000 3.77928406e−007 1.46912216e−011 2.33469503e−015 16 0.00000000e+000 −6.96857458e−008 −2.84037647e−012 2.05085140e−017 19 0.00000000e+000 −2.08753341e−008 −3.76211193e−013 −1.18384407e−017 23 0.00000000e+000 −2.08753341e−008 −3.76211193e−013 −1.18384407e−017 24 0.00000000e+000 2.08753341e−008 3.76211193e−013 1.18384407e−017 28 0.00000000e+000 2.08753341e−008 3.76211193e−013 1.18384407e−017 29 0.00000000e+000 7.78624253e−008 −5.29798090e−013 3.91516327e−018 31 0.00000000e+000 4.28231334e−008 1.84180203e−011 2.69407820e−017 34 0.00000000e+000 1.06085944e−007 5.27851125e−012 1.44463148e−016 42 0.00000000e+000 −4.37269250e−008 −1.57509731e−012 8.65198568e−019 45 0.00000000e+000 −9.15770551e−009 −5.99358306e−014 −2.27293408e−016 47 0.00000000e+000 6.18789306e−008 2.40430885e−011 −5.44722370e−015 Surface C4 C5 C6  6 4.88391880e−021 3.14518856e−024 −2.05304958e−028  7 1.13451047e−019 −1.35997879e−023 1.27061565e−027 12 −6.54678942e−018 3.46881149e−021 −5.35085168e−025 16 −1.26467485e−020 4.46161412e−025 −4.85676248e−029 19 −1.88960591e−021 1.06203954e−025 −5.85068978e−030 23 −1.88960591e−021 1.06203954e−025 −5.85068978e−030 24 1.88960591e−021 −1.06203954e−025 5.85068978e−030 28 1.88960591e−021 −1.06203954e−025 5.85068978e−030 29 −1.04724068e−020 6.70919693e−025 −2.39519868e−029 31 9.37813713e−020 −2.33189316e−023 9.94588095e−028 34 1.26175655e−020 −1.49657869e−024 2.33032636e−028 42 −3.26636505e−021 2.73829199e−025 2.06805365e−030 45 2.70272716e−020 −1.30446854e−024 3.13007511e−029 47 7.58602437e−019 −6.94042849e−023 2.94089737e−027

TABLE 19 NA = 1.2, β = 0.25 a b c Field 26 4.5 4.75 WL 193.3 nm SILUV 1.56049116 CAFUV 1.50110592 H2OV 1.4368 Sur- ½ face Radius Thickness Material Diam. Type 0 0.000000000 31.999270282 AIR 65.000 1 161.244041962 14.998636035 SILUV 82.320 2 200.129661131 4.944776020 AIR 81.953 3 138.221863276 14.998396795 SILUV 85.474 4 156.496992798 50.903040817 AIR 83.945 5 −173.315527687 16.279875172 SILUV 84.438 6 −142.013268785 1.000634788 AIR 87.160 7 15501.649257700 32.544206280 SILUV 87.713 8 −158.845141838 0.999631849 AIR 89.436 9 91.597097363 67.410407247 SILUV 79.148 10 107.035143103 13.851994874 AIR 57.324 11 213.854334447 15.987143481 SILUV 54.995 12 −484.417010515 72.563101783 AIR 51.059 13 −54.334592127 14.997747797 SILUV 49.752 14 −68.072352503 0.998695446 AIR 60.236 15 −601.365655277 24.817582741 SILUV 80.082 16 −242.182339653 0.995504271 AIR 83.903 17 920.810751329 35.748197919 SILUV 91.860 18 −213.159366146 55.021374074 AIR 93.280 19 246.612722217 14.997702082 SILUV 89.716 20 222.836314969 195.136099792 AIR 86.935 21 −235.528678750 14.998801176 SILUV 123.772 22 −252.575360887 16.051090308 AIR 131.942 23 −208.057958857 −16.051090308 AIR 133.654 REFL 24 −252.575360887 −14.998801176 SILUV 128.868 25 −235.528678750 −195.136099792 AIR 114.227 26 222.836314969 −14.997702082 SILUV 106.191 27 246.612722217 −15.024807366 AIR 119.874 28 190.206428127 15.024807366 AIR 122.140 REFL 29 246.612722217 14.997702082 SILUV 120.950 30 222.836314969 195.136099792 AIR 111.677 31 −235.528678750 14.998801176 SILUV 83.094 32 −252.575360887 56.045936568 AIR 86.484 33 370.979663784 47.033021034 SILUV 99.224 34 −371.323272898 62.417517206 AIR 97.788 35 −121.118365852 14.999357361 SILUV 74.709 36 120.855315866 33.365820253 AIR 72.995 37 20779.359547400 24.110061836 SILUV 77.786 38 −269.244136428 16.073764059 AIR 83.845 39 −236.048531861 28.909364173 SILUV 86.677 40 −161.907128190 8.188854525 AIR 94.856 41 842.230350676 46.587674654 SILUV 117.052 42 −262.240874081 3.490322496 AIR 119.226 43 374.311200849 50.091253523 SILUV 123.021 44 −396.081152439 −8.144186891 AIR 122.235 45 0.000000000 9.143428258 AIR 118.495 46 290.815269675 69.706490303 SILUV 113.550 47 −465.439617778 0.998821533 AIR 106.611 48 84.362795313 48.231691787 SILUV 73.577 49 220.065022009 0.997153094 AIR 60.089 50 51.630320906 38.562324381 CAFUV 42.677 51 0.000000000 2.998760762 H2OV 20.925 52 0.000000000 0.000000000 AIR 16.250

TABLE 19A Aspherical Constants Surface K C1 C2 C3 6 0.00000000e+000 5.22123357e−008 8.58887551e−013 −4.54164064e−016 7 0.00000000e+000 −5.20183796e−008 −4.57191269e−012 −4.91479340e−016 12 0.00000000e+000 3.52517346e−007 2.85321977e−011 9.33189645e−017 16 0.00000000e+000 −1.19054499e−007 −6.17053971e−013 8.29918331e−017 20 0.00000000e+000 2.35880706e−008 1.10625664e−014 1.52718231e−017 21 0.00000000e+000 −1.93271271e−008 −1.21191457e−014 −9.08764375e−018 25 0.00000000e+000 −1.93271271e−008 −1.21191457e−014 −9.08764375e−018 26 0.00000000e+000 2.35880706e−008 1.10625664e−014 1.52718231e−017 30 0.00000000e+000 2.35880706e−008 1.10625664e−014 1.52718231e−017 31 0.00000000e+000 −1.93271271e−008 −1.21191457e−014 −9.08764375e−018 33 0.00000000e+000 1.34282593e−007 −1.85430392e−012 −4.26524890e−017 35 0.00000000e+000 −2.95757718e−009 1.59584067e−011 −3.65004253e−016 38 0.00000000e+000 1.44418264e−007 4.50598204e−012 −8.46201050e−019 46 0.00000000e+000 −1.03608598e−008 −1.39868032e−012 −2.06257372e−017 47 0.00000000e+000 −2.35449031e−008 6.28466297e−017 5.46615500e−020 49 0.00000000e+000 1.18378675e−007 2.25652288e−011 −6.89451988e−015 Surface C4 C5 C6  6 1.80084384e−021 −1.27939182e−025 9.21858288e−029  7 3.70354199e−020 −2.59625588e−024 −9.35416883e−031 12 1.46216022e−018 1.35490801e−022 −4.07118530e−026 16 −1.92366012e−020 1.44946211e−024 −4.85055808e−029 20 4.13946988e−022 −1.55058201e−026 1.20806176e−030 21 −5.34976868e−023 −1.13872365e−027 −9.05434146e−032 25 −5.34976868e−023 −1.13872365e−027 −9.05434146e−032 26 4.13946988e−022 −1.55058201e−026 1.20806176e−030 30 4.13946988e−022 −1.55058201e−026 1.20806176e−030 31 −5.34976868e−023 −1.13872365e−027 −9.05434146e−032 33 2.28325758e−022 −3.90557972e−026 −2.65242779e−030 35 2.40761278e−019 −3.76176852e−023 1.70246167e−027 38 −5.19608735e−021 −2.54791026e−025 1.06081720e−028 46 −1.69652628e−021 1.44074754e−025 2.91395857e−030 47 5.71824030e−021 −4.38179150e−025 1.61431061e−029 49 1.27155044e−018 −1.75366514e−022 1.10664062e−026

TABLE 20 NA = 1.2, β = 0.25 a b c Field 26 4.5 4.75 WL 193.3 nm SILUV 1.56049116 CAFUV 1.50110592 H2OV 1.4368 Sur- ½ face Radius Thickness Material Diam. Type 0 0.000000000 44.536474494 AIR 64.000 1 −145.614238159 20.028968251 SILUV 71.569 2 −106.712344272 3.165042254 AIR 75.720 3 −126.799930892 14.997327707 SILUV 77.371 4 −400.529009983 24.938975486 AIR 89.386 5 −153.978050679 32.035367034 SILUV 91.679 6 −113.485754514 3.962209737 AIR 96.767 7 481.661051100 51.626847869 SILUV 109.810 8 −218.069217303 0.986417498 AIR 110.501 9 95.461306806 78.518887093 SILUV 88.224 10 197.024903934 20.433893299 AIR 65.510 11 245.480984290 15.389927680 SILUV 50.234 12 208.931069399 52.005350380 AIR 39.571 13 −51.537539329 25.208829578 SILUV 43.896 14 −67.256773583 31.133045864 AIR 59.014 15 −353.059395237 33.742142302 SILUV 97.721 16 −152.100516860 1.776048462 AIR 102.828 17 −246.044785191 45.384512544 SILUV 109.125 18 −136.487212093 39.988466465 AIR 113.661 19 0.000000000 201.398483236 AIR 114.931 20 −233.811577421 14.982820253 SILUV 137.713 21 −370.567496646 37.810813405 AIR 153.233 22 −216.552824900 −37.810813405 AIR 155.425 REFL 23 −370.567496646 −14.982820253 SILUV 147.967 24 −233.811577421 −201.398483236 AIR 120.238 25 168.695670563 201.398483236 AIR 106.748 REFL 26 −233.811577421 14.982820253 SILUV 76.924 27 −370.567496646 37.810813405 AIR 81.451 28 0.000000000 40.022296005 AIR 92.209 29 241.209000864 59.448832101 SILUV 108.950 30 −367.385238353 16.411120649 AIR 108.057 31 357.895873274 15.315252659 SILUV 93.192 32 94.401040596 38.563342544 AIR 77.588 33 442.579628511 14.989394891 SILUV 78.610 34 12021.837327700 28.864129981 AIR 79.433 35 −191.074651244 21.063184315 SILUV 81.221 36 −155.506376055 9.229041305 AIR 86.157 37 185.464309512 44.606063412 SILUV 101.263 38 −1150.340708410 31.620758000 AIR 100.270 39 0.000000000 −0.000000330 AIR 92.899 40 134.597113443 29.097516432 SILUV 92.514 41 296.937234549 3.458534424 AIR 90.494 42 150.878027709 36.379168022 SILUV 87.171 43 −494.554249982 0.979230496 AIR 84.334 44 65.631220570 30.011852752 SILUV 57.267 45 126.706468270 0.934188028 AIR 49.586 46 43.426322889 31.956384174 CAFUV 36.843 47 0.000000000 2.999915964 H2OV 20.807 48 0.000000000 0.000000000 AIR 16.001

TABLE 20A Aspherical Constants Surface K C1 C2 C3 1 0.00000000e+000 −1.87990337e−008 −7.06178066e−012 −1.25139326e−015 6 0.00000000e+000 2.08430698e−009 3.65727833e−013 1.43149385e−018 7 0.00000000e+000 1.33126997e−008 −2.47997131e−012 3.62223701e−017 12 0.00000000e+000 6.92559246e−007 1.01811160e−010 4.16533262e−015 16 0.00000000e+000 1.26266812e−008 −7.60497043e−013 5.26322462e−017 20 0.00000000e+000 −2.84981575e−008 5.16388350e−013 −2.39579817e−017 24 0.00000000e+000 −2.84981575e−008 5.16388350e−013 −2.39579817e−017 26 0.00000000e+000 −2.84981575e−008 5.16388350e−013 −2.39579817e−017 29 0.00000000e+000 1.10496506e−007 −6.42644915e−012 2.43910073e−016 31 0.00000000e+000 −8.94334736e−008 5.51621746e−012 2.64317734e−016 34 0.00000000e+000 7.27650226e−008 5.05452869e−012 2.12206759e−016 42 0.00000000e+000 −5.69019750e−008 −3.78079018e−012 −3.58536429e−016 43 0.00000000e+000 3.85631053e−008 −1.96032685e−012 −4.18174469e−016 45 0.00000000e+000 1.32980535e−007 6.98357216e−011 −9.96688046e−015 Surface C4 C5 C6 1 1.04002349e−019 1.61613724e−024 −2.08243603e−028 6 3.84125705e−021 −4.35918853e−025 5.89812982e−029 7 −3.52780013e−022 1.86263171e−025 −7.15398794e−030 12 2.76714831e−017 −1.56122873e−020 5.24368076e−024 16 1.50861183e−021 2.14471673e−025 2.66224210e−030 20 3.35275866e−022 −8.50016423e−028 −1.97442790e−031 24 3.35275866e−022 −8.50016423e−028 −1.97442790e−031 26 3.35275866e−022 −8.50016423e−028 −1.97442790e−031 29 −1.98759724e−020 8.00452148e−025 −9.31628471e−030 31 3.20019743e−020 −4.26422117e−024 1.50940276e−028 34 5.08829476e−020 −5.03622460e−024 7.39342220e−028 42 −4.25536201e−020 2.42006208e−024 1.84293028e−028 43 9.23637376e−020 −8.60875665e−024 4.05098414e−028 45 −3.10084571e−019 1.88265675e−022 −4.40640742e−026

TABLE 21 NA = 1.2, β = 0.25 a b c Field 26 4.5 4.75 WL 193.3 nm SILUV 1.56049116 CAFUV 1.50110592 H2OV 1.4368 Surface Radius Thickness Material ½ Diam. Type 0 0.000000000 31.999392757 AIR 64.675 1 149.202932404 20.120662646 SILUV 82.837 2 233.357095260 1.010428853 AIR 82.195 3 172.529012606 14.999455624 SILUV 83.021 4 153.116811658 37.462782355 AIR 80.924 5 −385.292133909 24.003915576 SILUV 81.802 6 −189.041850576 1.014246919 AIR 84.223 7 −1521.447544300 27.529894754 SILUV 83.808 8 −150.691487200 0.999361796 AIR 85.384 9 89.238407847 56.953687562 SILUV 75.993 10 101.329520927 13.713067990 AIR 58.085 11 176.794820361 18.039991299 SILUV 55.978 12 −447.950790449 73.129977874 AIR 52.127 13 −57.595257960 16.299538518 SILUV 50.436 14 −83.036630542 0.999811850 AIR 64.360 15 −2287.430407510 44.210083628 SILUV 86.772 16 −147.632600397 0.998596167 AIR 92.132 17 −352.966686998 32.886671205 SILUV 97.464 18 −153.824954969 271.807415024 AIR 100.038 19 −238.525982305 14.998824247 SILUV 122.669 20 −315.714610405 19.998064817 AIR 131.899 21 −202.650261219 −19.998064817 AIR 131.917 REFL 22 −315.714610405 −14.998824247 SILUV 131.852 23 −238.525982305 −196.811186275 AIR 112.411 24 207.441141965 −14.998504935 SILUV 107.771 25 268.178120713 −19.998469851 AIR 124.363 26 193.196124575 19.998469851 AIR 127.679 REFL 27 268.178120713 14.998504935 SILUV 125.948 28 207.441141965 271.807924190 AIR 114.576 29 325.701461380 38.709870586 SILUV 92.964 30 −885.381927410 59.476563453 AIR 90.975 31 −123.867242183 18.110373017 SILUV 74.226 32 126.359054159 30.087671186 AIR 73.733 33 −16392.865249200 31.626040348 SILUV 77.090 34 −299.592698534 15.292623049 AIR 86.158 35 −296.842399050 24.895495087 SILUV 89.777 36 −163.748333285 8.131594074 AIR 94.529 37 675.259743609 47.908987883 SILUV 116.712 38 −263.915255162 1.054743285 AIR 118.641 39 356.010681144 47.536295502 SILUV 120.712 40 −435.299476405 3.543672029 AIR 119.727 41 0.000000000 10.346485925 AIR 112.597 42 256.262375445 67.382487780 SILUV 107.047 43 −454.037284452 0.998990981 AIR 99.451 44 84.434680547 36.424585989 SILUV 70.101 45 207.490725651 0.997139930 AIR 62.005 46 50.112836179 41.301883710 CAFUV 43.313 47 0.000000000 2.999011124 H2OV 20.878 48 0.000000000 0.000000000 AIR 16.169

TABLE 21A Aspherical Constants Surface K C1 C2 C3 6 0.00000000e+000 5.47357338e−008 1.50925239e−012 −1.14128005e−015 7 0.00000000e+000 −5.65236098e−008 −4.45251739e−012 −1.12368170e−015 12 0.00000000e+000 3.75669258e−007 2.00493160e−011 −1.57617930e−015 16 0.00000000e+000 −2.97247128e−008 −1.16246607e−013 1.91525676e−016 19 0.00000000e+000 −1.79930163e−008 −1.81456294e−014 −6.42956161e−018 23 0.00000000e+000 −1.79930163e−008 −1.81456294e−014 −6.42956161e−018 24 0.00000000e+000 1.41712563e−008 1.42766536e−013 5.35849443e−018 28 0.00000000e+000 1.41712563e−008 1.42766536e−013 5.35849443e−018 29 0.00000000e+000 1.42833387e−007 3.55808937e−014 −1.23227147e−017 31 0.00000000e+000 −1.51349602e−008 1.62092054e−011 −4.43234287e−016 34 0.00000000e+000 1.39181850e−007 3.36145772e−012 −4.99179521e−017 42 0.00000000e+000 −4.24593271e−009 −1.84016360e−012 −2.09008867e−017 43 0.00000000e+000 −1.75350671e−008 1.70435017e−014 1.85876255e−020 45 0.00000000e+000 4.03560215e−008 2.57831806e−011 −6.32742355e−015 Surface C4 C5 C6 6 2.03745939e−022 −1.46491288e−024 3.18476009e−028 7 7.05334891e−020 −6.42608755e−024 4.64154513e−029 12 2.00775938e−018 −1.81218495e−022 1.59512857e−028 16 −5.42330199e−021 4.84113906e−025 −1.50564943e−030 19 −1.72138657e−022 4.34933124e−027 −2.46030547e−031 23 −1.72138657e−022 4.34933124e−027 −2.46030547e−031 24 5.30493751e−022 −2.04437497e−026 1.09297996e−030 28 5.30493751e−022 −2.04437497e−026 1.09297996e−030 29 1.26320560e−021 1.99476309e−025 −1.46884711e−029 31 2.01248512e−019 −3.73070267e−023 1.98749982e−027 34 −8.18195448e−021 4.05698527e−025 4.11589492e−029 42 −2.89704097e−021 1.96863338e−025 6.53807102e−030 43 6.37197338e−021 −5.19573140e−025 2.34597624e−029 45 9.55984243e−019 −1.13622236e−022 6.56644929e−027

TABLE 22 Surface Radius Thickness Material ½ Diam. Type 0 0.000000000 31.993696817 AIR 65.000 1 0.000000000 −0.006216437 AIR 75.178 2 173.245898492 28.849219645 SILUV 80.701 3 −1901.645842520 1.159056366 AIR 81.186 4 139.958280577 17.383993593 SILUV 82.800 5 114.690720801 65.798932682 AIR 78.012 6 177.803002075 54.744184912 SILUV 88.979 7 −204.801382425 0.997356478 AIR 88.078 8 89.450127459 21.884550473 SILUV 62.734 9 143.066432170 15.678153833 AIR 57.180 10 −13433.891703300 15.000276693 SILUV 54.058 11 −8853.549440170 13.872934681 AIR 46.493 12 0.000000000 0.000000000 AIR 37.955 13 0.000000000 61.755398574 AIR 38.009 14 −66.760883146 14.994014816 SILUV 54.182 15 −72.012316741 23.617101147 AIR 60.909 16 −63.807677134 21.572901785 SILUV 62.830 17 −76.257505928 1.720678480 AIR 75.095 18 1299.192911670 55.482510512 SILUV 104.240 19 −148.321651349 39.989348698 AIR 106.312 20 0.000000000 232.380264110 AIR 95.929 21 −201.575622280 −232.380264110 AIR 121.585 REFL 22 199.702239038 232.380264110 AIR 118.875 REFL 23 0.000000000 39.986853275 AIR 91.439 24 162.499205332 44.748459237 SILUV 93.810 25 −2036.857320830 1.012661476 AIR 91.212 26 141.444403824 15.471017813 SILUV 77.784 27 167.499214725 41.441314042 AIR 72.833 28 −106.505215697 14.992253348 SILUV 70.530 29 98.946616742 44.625025386 AIR 64.458 30 −139.301063148 14.998444853 SILUV 66.132 31 −339.669887909 0.997145626 AIR 79.298 32 1356.020956420 23.905236106 SILUV 86.623 33 −340.109054698 5.477848077 AIR 90.957 34 472.296115575 52.138063579 SILUV 108.763 35 −222.876812950 8.808100307 AIR 112.258 36 2053.528638090 24.342755161 SILUV 119.824 37 −621.581254067 1.014456714 AIR 120.910 38 210.455448779 43.312493694 SILUV 124.650 39 −1489.901649750 5.393215295 AIR 124.077 40 210.646045010 47.972124824 SILUV 119.142 41 −627.180734089 0.998977914 AIR 117.607 42 97.515291800 53.409662718 SILUV 82.565 43 469.577208920 0.998603706 AIR 69.163 44 58.393704585 42.102914517 CAFUV 46.689 45 0.000000000 3.001333990 H2OV 20.956

TABLE 22A Aspherical Constants Surface 2 Surface 5 Surface 6 K 0.0000 K 0.0000 K 0.0000 C1 −4.85507054e−008 C1 4.63982284e−008 C1 7.93368538e−008 C2 8.30450606e−013 C2 −4.36308368e−016 C2 −3.49340213e−012 C3 −6.55835562e−016 C3 −4.56700150e−016 C3 −3.72450023e−016 C4 6.07754089e−020 C4 1.41944231e−020 C4 −1.50853577e−020 C5 −4.30736726e−024 C5 −2.58792066e−024 C5 4.35840155e−024 C6 9.97068342e−029 C6 2.91613493e−032 C6 −1.74914218e−028 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 11 Surface 19 Surface 21 K 0.0000 K 0.0000 K 0.0000 C1 3.21277393e−007 C1 1.27016347e−008 C1 1.00526801e−008 C2 2.34047891e−012 C2 4.09192710e−013 C2 1.78849410e−013 C3 1.48915392e−014 C3 2.48214285e−017 C3 2.48862104e−018 C4 −1.12960188e−017 C4 9.66053244e−022 C4 9.77481750e−023 C5 3.70333100e−021 C5 1.60329104e−027 C5 −3.23740664e−028 C6 −4.63366043e−025 C6 2.07652380e−030 C6 6.28188299e−032 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 22 Surface 24 Surface 28 K 0.0000 K 0.0000 K 0.0000 C1 −8.36189868e−009 C1 3.26436925e−008 C1 1.73452145e−007 C2 −1.86708153e−013 C2 9.95492740e−013 C2 9.62198511e−012 C3 −3.35782535e−018 C3 3.47886760e−017 C3 8.33010916e−016 C4 −6.14811355e−023 C4 6.60667009e−021 C4 −4.89738667e−020 C5 −6.72093224e−028 C5 −3.90366799e−025 C5 −2.08149618e−023 C6 −5.98449275e−032 C6 4.03156525e−029 C6 2.57941116e−027 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 31 Surface 34 Surface 38 K 0.0000 K 0.0000 K 0.0000 C1 1.28849399e−007 C1 −2.57944586e−008 C1 −1.91471943e−008 C2 4.99181087e−012 C2 7.33527637e−013 C2 −1.34589512e−012 C3 5.65181638e−017 C3 −5.33079171e−018 C3 3.11852582e−017 C4 2.64289484e−020 C4 −8.21688122e−022 C4 −2.35897615e−021 C5 −3.15869403e−024 C5 −2.94478649e−026 C5 6.73415544e−026 C6 −3.04781776e−029 C6 2.23217522e−030 C6 1.62707757e−030 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 40 Surface 41 Surface 43 K 0.0000 K 0.0000 K 0.0000 C1 −6.30346424e−008 C1 −2.41682461e−008 C1 1.25460964e−007 C2 −4.64729134e−013 C2 1.18102559e−013 C2 7.10922055e−012 C3 3.22359222e−017 C3 −1.34037856e−016 C3 −1.61078694e−015 C4 2.89305419e−023 C4 1.79602212e−020 C4 1.49634597e−019 C5 −2.15332629e−026 C5 −8.86179442e−025 C5 −1.71885653e−023 C6 8.39177392e−031 C6 1.89592509e−029 C6 1.04621563e−027 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000

TABLE 23 WL 193.3 nm 193.4 nm 193.2 nm SILUV 1.560491 1.560332 1.560650 CAFUV 1.501106 1.501010 1.501202 H2OV 1.436800 1.436800 1.436800 Ymax = 64.675 mm; NA = 1.2 Sur- ½ face Radius Thickness Material Diam. Type 0 0.000000000 32.343320391 AIR 64.675 1 0.000000000 0.319194773 AIR 74.840 2 165.502154849 22.393605178 SILUV 81.725 3 427.564472229 78.042155049 AIR 81.442 4 362.770694637 28.092832019 SILUV 88.424 5 −418.998032701 0.953143564 AIR 88.789 6 108.458706796 42.211528711 SILUV 85.410 7 309.813567338 43.976162585 AIR 80.542 8 440.563406352 17.425727560 SILUV 60.495 9 −278.343745406 54.725816031 AIR 56.963 10 −65.973394609 15.012675322 SILUV 50.057 11 −89.483928231 44.616098218 AIR 59.618 12 −164.547135387 29.271100213 SILUV 82.247 13 −110.100956635 0.995307980 AIR 86.942 14 −467.051029385 33.374516855 SILUV 94.291 15 −156.421752282 39.987151223 AIR 96.378 16 0.000000000 229.883694545 AIR 89.855 17 −196.922423263 −229.883694545 AIR 115.021 REFL 18 196.894790764 229.883694545 AIR 115.024 REFL 19 0.000000000 40.005209742 AIR 89.120 20 158.312187294 42.217660752 SILUV 95.332 21 2467.131056460 70.144222480 AIR 92.913 22 −160.335654972 14.992560808 SILUV 73.410 23 116.412074936 38.531709122 AIR 69.984 24 −250.712291671 18.369318291 SILUV 71.881 25 −300.079780156 31.051013458 AIR 80.817 26 5705.510103480 24.334610155 SILUV 107.710 27 −458.981124329 14.563800138 AIR 111.524 28 946.448274166 62.249192106 SILUV 126.621 29 −192.486608755 1.015402218 AIR 129.650 30 −4079.043797180 15.732935333 SILUV 130.993 31 −1100.089935780 14.595769901 AIR 131.283 32 0.000000000 0.000000000 AIR 130.790 33 0.000000000 −13.603116119 AIR 131.340 34 220.445900864 51.281950308 SILUV 133.878 35 −1597.683074300 5.271684397 AIR 133.124 36 215.527385603 15.522171709 SILUV 124.678 37 314.221642044 4.657196014 AIR 121.589 38 305.812344416 42.963421749 SILUV 120.269 39 −771.778612980 0.996840378 AIR 117.157 40 109.741348234 43.192990855 SILUV 84.698 41 708.633799886 6.161060319 AIR 76.900 42 66.404779509 39.130193750 CAFUV 46.929 43 0.000000000 2.999814914 H2OV 20.723 44 0.000000000 0.000000000 AIR 16.171

TABLE 23A Aspherical Constants Surface 3 Surface 4 Surface 9 K 0.0000 K 0.0000 K 0.0000 C1 5.16435696e−008 C1 9.50247881e−010 C1 1.24922845e−007 C2 −3.34181067e−012 C2 −3.73319015e−012 C2 1.54187542e−011 C3 3.14093710e−017 C3 −6.51837734e−017 C3 −3.69685941e−016 C4 −3.87421162e−022 C4 −7.93160821e−021 C4 1.37785719e−018 C5 −8.61200118e−027 C5 9.00091591e−025 C5 −3.60351270e−022 C6 −1.47089082e−029 C6 −1.92340271e−028 C6 2.85480659e−026 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 13 Surface 17 Surface 18 K 0.0000 K 0.0000 K 0.0000 C1 1.45134700e−009 C1 9.25585261e−009 C1 −8.29620456e−009 C2 1.24926632e−014 C2 1.67052938e−013 C2 −1.78159419e−013 C3 8.37553299e−018 C3 2.68611580e−018 C3 −3.07128696e−018 C4 2.49716672e−021 C4 1.04166910e−022 C4 −8.08505340e−023 C5 −2.66380030e−025 C5 −1.70724722e−027 C5 2.33488811e−028 C6 2.61815898e−029 C6 1.10260829e−031 C6 −8.31087015e−032 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 20 Surface 22 Surface 25 K 0.0000 K 0.0000 K 0.0000 C1 1.71573479e−008 C1 −9.04880266e−009 C1 1.11732794e−007 C2 5.87191967e−013 C2 3.31829223e−012 C2 5.01044308e−012 C3 3.53602344e−017 C3 −7.82564703e−017 C3 1.82247821e−016 C4 3.89188764e−021 C4 7.87650776e−020 C4 2.99282347e−021 C5 −2.56256746e−025 C5 −7.94502597e−024 C5 −2.06723334e−024 C6 2.81528130e−029 C6 2.40943558e−027 C6 2.32093750e−029 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 28 Surface 34 Surface 36 K 0.0000 K 0.0000 K 0.0000 C1 −2.42933057e−008 C1 −8.91439687e−009 C1 −5.63334250e−008 C2 3.07041360e−014 C2 −7.33160527e−013 C2 −3.26907281e−013 C3 7.41003764e−018 C3 −4.83885006e−018 C3 9.72642980e−017 C4 −5.26534391e−022 C4 −2.37515306e−022 C4 4.30118073e−021 C5 1.17630052e−026 C5 2.33792040e−026 C5 −5.03894259e−025 C6 −1.17982545e−031 C6 −2.27854885e−032 C6 1.42974281e−029 C7 0.00000000e+000 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000 Surface 39 Surface 41 K 0.0000 K 0.0000 C1 −1.21454753e−008 C1 4.06678857e−008 C2 1.19750305e−012 C2 3.94505025e−012 C3 −6.39990660e−017 C3 −2.03790398e−016 C4 4.10753453e−021 C4 2.07246865e−020 C5 −1.17680773e−025 C5 −3.19577553e−024 C6 4.05203512e−030 C6 2.12601962e−028 C7 0.00000000e+000 C7 0.00000000e+000 C8 0.00000000e+000 C8 0.00000000e+000 C9 0.00000000e+000 C9 0.00000000e+000

TABLE 27 (EM28) Sur- ½ face Radius Asphere Thickness Material Diameter 1 0.000000 −0.028411 LUFTV193 76.078 2 148.374584 AS 30.141343 SIO2V 82.524 3 2980.684122 2.731918 N2VP950 82.907 4 177.363525 46.196958 SIO2V 84.542 5 765.980001 AS 27.096346 N2VP950 80.837 6 2666.335118 22.841301 SIO2V 73.658 7 −291.755432 AS 0.990907 N2VP950 70.887 8 230.707988 26.508915 SIO2V 65.013 9 −298.406132 21.906961 N2VP950 61.389 10 −112.314548 10.039397 SIO2V 45.510 11 −118.846218 2.540087 N2VP950 43.187 12 0.000000 0.000000 N2VP950 35.411 13 0.000000 18.000000 N2VP950 35.411 14 0.000000 10.013160 SIO2V 46.508 15 0.000000 0.991399 N2VP950 50.085 16 237.566392 20.385633 SIO2V 54.619 17 −476.646043 28.746587 N2VP950 57.184 18 −81.332740 10.129443 SIO2V 59.250 19 −86.414601 0.995700 N2VP950 63.535 20 −2069.485733 AS 30.115541 SIO2V 71.732 21 −141.210644 0.983397 N2VP950 74.255 22 962.252932 AS 9.980083 SIO2V 74.793 23 819.084531 36.977869 N2VP950 75.040 24 0.000000 198.944441 N2VP950 77.850 25 −167.595461 AS −198.944441 REFL 139.680 26 167.595461 AS 198.944441 REFL 111.811 27 0.000000 36.992449 N2VP950 110.123 28 268.305681 49.624605 SIO2V 123.343 29 −828.322347 AS 47.027120 N2VP950 122.544 30 327.800199 39.684648 SIO2V 108.912 31 −1269.440044 AS 0.995014 N2VP950 106.029 32 331.950903 9.989996 SIO2V 93.089 33 95.290319 49.810064 N2VP950 76.973 34 −442.703787 9.991655 SIO2V 76.737 35 143.501616 20.229593 N2VP950 77.748 36 483.451705 9.993273 SIO2V 79.933 37 241.810075 15.546146 N2VP950 84.505 38 928.401379 29.795388 SIO2V 88.441 39 −298.259102 AS 8.829909 N2VP950 94.008 40 −1812.559641 AS 29.628322 SIO2V 101.744 41 −270.502936 7.417032 N2VP950 107.779 42 −7682.999744 AS 45.892645 SIO2V 118.999 43 −231.286706 27.404554 N2VP950 122.729 44 449.487156 46.556603 SIO2V 134.549 45 −668.069375 1.250913 N2VP950 134.857 46 886.959900 AS 43.269922 SIO2V 133.822 47 −295.612418 0.987420 N2VP950 133.749 48 230.112826 44.287713 SIO2V 112.987 49 −2356.132765 AS 0.978312 N2VP950 108.183 50 92.104165 41.465221 SIO2V 76.439 51 253.332614 1.131452 N2VP950 67.260 52 84.180015 39.033045 CAF2V193 50.611 53 0.000000 3.000000 H2OV193 21.082 54 0.000000 0.000000 AIR 16.500

TABLE 27A Aspherical Constants Surface 2 5 7 20 22 K 0 0 0 0 0 C1 −7.058653e−08 −1.114728e−07 1.398385e−07 −1.149358e−08 −5.629065e−08 C2 −2.984480e−12 4.526601e−12 −6.219606e−12 −6.065516e−12 1.905377e−12 C3 −1.303901e−16 1.421882e−16 3.410808e−16 6.763250e−16 −2.554160e−16 C4 −5.960748e−21 −1.154537e−19 3.575265e−20 −7.651964e−20 6.886775e−21 C5 −6.187687e−25 1.628794e−23 −2.900443e−23 5.689563e−24 −6.938594e−25 C6 8.668981e−29 −6.255900e−28 2.343745e−27 −2.312648e−28 −2.420574e−29 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 Surface 25 26 29 31 39 K −2.31378 −2.31378 0 0 0 C1 −4.828221e−08 4.828221e−08 1.342570e−08 −9.018801e−08 3.278431e−08 C2 7.051572e−13 −7.051572e−13 −3.644532e−13 6.045342e−12 1.370822e−17 C3 −2.377185e−17 2.377185e−17 −2.375681e−18 −1.273791e−16 1.643036e−16 C4 6.284480e−22 −6.284480e−22 −3.970849e−22 −2.702171e−21 −2.021350e−20 C5 −1.385194e−26 1.385194e−26 −4.372813e−27 3.262226e−25 2.670722e−24 C6 1.514567e−31 −1.514567e−31 6.283103e−31 −6.948598e−30 −1.187217e−28 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 Surface 40 42 46 49 K 0 0 0 0 C1 −5.316551e−08 −1.954895e−09 −4.282391e−08 −3.095959e−08 C2 −7.707570e−14 5.606761e−14 −1.948121e−13 3.451241e−12 C3 2.146900e−16 −6.199304e−17 7.664802e−17 −1.219768e−16 C4 −2.184878e−20 3.478339e−21 −2.354982e−21 4.060098e−21 C5 2.255720e−24 −1.558932e−25 1.361973e−26 −9.053687e−26 C6 −9.545251e−29 4.899450e−30 2.019923e−31 1.610152e−30 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00

TABLE 28 (EM25) WL 193.368 nm 193.468 nm 193.268 nm SIO2V′ 1.5607857 1.56062813 1.56094365 CAF2V193′ 1.50175423 1.50185255 1.50195109 H2OV193′ 1.4364632 1.43667693 1.43689123 NA 1.2; Fmin = 18.63 mm; Fmax = 66 mm Surface Radius Thickness Material ½ Diam. Type 0 0.000000000 31.974939715 AIR 66.000 1 0.000000000 −0.024765663 AIR 76.143 2 148.940822391 31.463360093 SIO2V 83.171 3 6331.489300420 40.453855135 AIR 83.210 4 928.302406310 14.994423747 SIO2V 83.796 5 251.967918823 13.753137508 AIR 83.372 6 172.912005335 50.243372901 SIO2V 87.569 7 −197.856766081 1.000964332 AIR 86.631 8 81.522536296 17.681593406 SIO2V 65.574 9 88.327907526 30.256558951 AIR 60.047 10 117.551427452 18.843304175 SIO2V 50.042 11 855.507852453 8.921765220 AIR 45.493 12 0.000000000 0.000000000 AIR 37.552 13 0.000000000 49.799403498 AIR 37.641 14 −56.887108985 19.216557050 SIO2V 46.868 15 −153.952881762 0.978745522 AIR 66.363 16 −10783.364868000 53.980836551 SIO2V 79.120 17 −370.423261824 5.444267505 AIR 97.662 18 −1928.185768980 46.883883025 SIO2V 104.839 19 −156.534475362 0.983619441 AIR 108.499 20 −2025.935551520 37.434974978 SIO2V 114.116 21 −206.572644709 34.979106092 AIR 115.758 22 0.000000000 220.766423587 AIR 108.107 23 −187.624624543 −220.766423587 AIR 140.612 REFL 24 185.347836932 220.766423587 AIR 130.980 REFL 25 0.000000000 38.094302401 AIR 87.940 26 572.857393641 19.003060435 SIO2V 84.526 27 −2621.148115610 0.995124659 AIR 83.267 28 286.158521436 14.994640836 SIO2V 80.188 29 106.165691183 42.739053946 AIR 72.275 30 −269.972769063 14.994253287 SIO2V 72.751 31 217.103611286 19.468009312 AIR 79.551 32 49574.268497900 15.072135262 SIO2V 82.355 33 −1724.117745890 7.993795407 AIR 87.009 34 −681.152171807 39.742301517 SIO2V 89.501 35 −135.848489522 0.995182990 AIR 93.025 36 729.076676327 18.240313704 SIO2V 99.335 37 −1221.183105010 8.112527507 AIR 100.052 38 470.281491581 33.610782817 SIO2V 101.641 39 −393.774605114 34.640728842 AIR 101.306 40 −135.515968276 14.997016204 SIO2V 100.625 41 −242.973369762 0.998166637 AIR 109.176 42 629.218885691 33.238719341 SIO2V 114.327 43 −476.667589984 1.000069241 AIR 114.673 44 609.210504505 31.634185939 SIO2V 112.966 45 −463.558570174 0.991784251 AIR 112.249 46 181.331821629 26.489265851 SIO2V 99.538 47 478.467068575 0.985154964 AIR 96.400 48 166.964883598 32.619952496 SIO2V 90.254 49 34746.976265700 0.961982243 AIR 86.267 50 65.547601143 30.975153472 SIO2V 58.849 51 118.066733717 1.052010322 AIR 51.946 52 68.706870791 32.347686260 CAF2V193 43.646 53 0.000000000 3.000000148 H2OV193 21.134 54 0.000000000 0.000000000 AIR 16.501

TABLE 28A Aspherical Constants Surface K C1 C2 C3 C4 2 0.00000000e+000 −5.25595959e−008 −5.05125696e−014 −3.39834764e−016 1.43455947e−022 4 0.00000000e+000 −9.82547285e−009 −3.46617126e−012 4.26908111e−016 8.30046581e−021 7 0.00000000e+000 4.35702944e−008 3.07328355e−012 −6.64471080e−016 8.46058187e−020 11 0.00000000e+000 1.78059855e−008 −4.49918001e−011 −1.45873634e−015 −5.93868926e−020 15 0.00000000e+000 9.71039823e−009 −5.80809116e−012 1.66373755e−015 −6.79295769e−020 18 0.00000000e+000 −9.90188358e−009 −3.63667799e−012 4.39791888e−016 −4.05829074e−020 20 0.00000000e+000 −3.56668353e−008 1.04282881e−012 −3.79146258e−017 1.77203987e−021 23 −1.00000000e+000 0.00000000e+000 0.00000000e+000 0.00000000e+000 0.00000000e+000 24 0.00000000e+000 −4.12889632e−009 −9.85960529e−014 −2.94691200e−018 −3.56770055e−025 26 0.00000000e+000 2.84735678e−008 8.22076690e−013 8.98622393e−019 1.63369077e−020 36 0.00000000e+000 −3.45458233e−008 7.01690612e−013 2.53558597e−017 −2.32833922e−023 42 0.00000000e+000 6.80041144e−009 −3.73953529e−014 −4.59353922e−017 3.53253945e−021 47 0.00000000e+000 3.44340794e−008 8.40449554e−013 −3.72972761e−016 3.22089615e−020 49 0.00000000e+000 1.97298275e−008 2.76921584e−012 1.03703892e−016 −5.16050166e−020 Surface C5 C6 C7 C8 2 5.23175535e−024 −1.25244222e−027 1.21805557e−031 −4.43910196e−036 4 −4.64399579e−024 1.19810111e−027 −1.78448775e−031 9.48653785e−036 7 −6.78485826e−024 2.18615691e−028 1.27733528e−032 −7.77343429e−037 11 2.10051516e−021 −2.86208035e−027 −1.14692199e−028 −9.07436019e−033 15 4.67315167e−024 1.33956477e−027 −1.86319592e−031 1.80116188e−036 18 3.14215669e−024 −1.78747424e−028 6.25454799e−033 −9.94933562e−038 20 −1.02830257e−025 1.63016234e−030 9.47579264e−035 −3.37443982e−039 23 0.00000000e+000 0.00000000e+000 0.00000000e+000 0.00000000e+000 24 −4.97425291e−027 1.63379520e−032 3.42393048e−036 −1.99876678e−040 26 −7.11352194e−024 7.18534327e−028 −1.59298542e−032 −4.89537949e−037 36 2.60044530e−026 −1.74079904e−030 −4.85763706e−034 2.78340967e−038 42 −9.74225973e−026 9.00308701e−031 0.00000000e+000 0.00000000e+000 47 −2.63108130e−024 2.07908763e−028 −7.57742152e−033 9.89130621e−038 49 8.50503256e−024 −9.50392825e−028 5.47302796e−032 −1.31141198e−036

TABLE 30 (EM29) Sur- ½ face Radius Asphere Thickness Material Diameter 1 0.000000 −0.000674 LV193975 75.450 2 501.388885 AS 15.700263 SIO2V 76.793 3 −2140.989756 1.030768 HEV19397 78.495 4 142.094518 41.139801 SIO2V 86.380 5 4509.859821 AS 48.031590 HEV19397 84.694 6 294.047825 42.018849 SIO2V 75.299 7 −284.632088 AS 0.899132 HEV19397 70.073 8 196.950986 32.325473 SIO2V 62.732 9 −427.997978 AS 24.031073 HEV19397 55.024 10 0.000000 0.000000 HEV19397 35.604 11 0.000000 17.973629 HEV19397 35.604 12 0.000000 9.999076 SIO2V 45.185 13 0.000000 34.757744 HEV19397 48.346 14 997.955935 AS 34.646365 SIO2V 67.618 15 −300.927832 15.875609 HEV19397 75.070 16 −346.766852 AS 31.454835 SIO2V 80.051 17 −123.279874 36.439684 HEV19397 83.364 18 0.000000 205.977742 HEV19397 86.638 19 −174.397052 AS −205.977742 REFL 131.209 20 170.274411 AS 205.977742 REFL 116.516 21 0.000000 37.095745 HEV19397 97.388 22 437.401009 36.383480 SIO2V 104.301 23 −468.489757 45.906894 HEV19397 104.284 4 −1223.579996 21.742866 SIO2V 97.101 5 −511.114441 AS 8.072398 HEV19397 96.542 26 432.469418 10.004999 SIO2V 85.308 27 102.889104 42.520104 HEV19397 75.234 28 −594.379481 9.996510 SIO2V 75.720 29 174.356867 19.418323 HEV19397 79.411 30 715.897359 10.937733 SIO2V 82.556 31 324.211087 13.818484 HEV19397 88.129 32 1110.064311 30.443596 SIO2V 93.022 33 −264.206409 AS 7.862028 HEV19397 97.550 34 −1190.503106 AS 29.935994 SIO2V 104.823 35 −237.772522 11.246604 HEV19397 110.038 36 10331.864054 AS 39.860150 SIO2V 122.900 37 −277.281811 10.852741 HEV19397 125.931 38 214450.764260 31.052526 SIO2V 131.630 9 −428.573007 13.316274 HEV19397 132.643 40 751.599719 33.094141 SIO2V 133.007 41 −805.999226 1.057548 HEV19397 132.758 42 914.688148 AS 40.568688 SIO2V 130.742 43 −348.277386 0.878766 HEV19397 129.732 44 219.106958 38.836424 SIO2V 108.095 45 2357.913334 AS 1.971079 HEV19397 102.766 46 85.554437 39.388562 SIO2V 72.129 47 193.092045 0.892017 HEV19397 62.113 48 83.536468 37.250760 CAF2V193 49.390 49 0.000000 0.300000 SIO2V 21.410 50 0.000000 0.000000 SIO2V 21.050 51 0.000000 3.000000 H2OV193B 21.050 52 0.000000 0.000000 AIR 16.500

TABLE 30A Aspherical Constants Surface 2 5 7 9 14 K 0 0 0 1.84398 0 C1 −4.426813e−08 −2.968289e−08 1.574555e−07 1.174665e−07 −3.306265e−08 C2 −6.238723e−13 5.914537e−12 −1.371133e−11 5.249946e−12 −1.008549e−12 C3 5.373027e−21 −2.636410e−17 7.979944e−16 0.000000e+00 −2.352647e−16 C4 5.520432e−21 −2.348783e−20 −1.733518e−21 0.000000e+00 2.617179e−25 C5 −4.165047e−25 1.589258e−24 −1.045941e−23 0.000000e+00 −1.275061e−24 C6 −2.539882e−29 −3.710160e−29 1.048551e−27 0.000000e+00 7.076571e−29 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 Surface 16 19 20 25 33 K 0 −2.01302 −2.06565 0 0 C1 −4.975918e−08 −3.276866e−08 4.322230e−08 −1.196195e−07 2.211028e−08 C2 1.193440e−12 3.671721e−13 −3.203678e−13 6.474093e−12 7.931065e−13 C3 −3.326252e−18 −8.127219e−18 1.331133e−17 −2.172807e−16 2.746964e−17 C4 5.194442e−21 1.823894e−22 −2.254203e−22 5.562468e−21 −3.773718e−21 C5 7.844572e−25 −2.990635e−27 4.731338e−27 4.566785e−26 8.556577e−25 C6 −3.910445e−29 4.402752e−32 −3.185999e−32 −6.729599e−30 −5.193468e−29 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 Surface 34 36 42 45 K 0 0 0 0 C1 −6.109386e−08 −2.940384e−09 −3.072861e−08 −4.317432e−08 C2 1.186926e−12 −1.302883e−13 1.225198e−13 5.093533e−12 C3 9.338913e−17 −7.457684e−17 6.438064e−17 −2.542515e−16 C4 −8.049754e−21 4.922730e−21 −2.717739e−21 1.185033e−20 C5 7.964565e−25 −1.822077e−25 3.936453e−26 −3.870604e−25 C6 −3.877045e−29 3.491116e−30 −1.518766e−31 7.346646e−30 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00

TABLE 31 (EM29) Sur- ½ face Radius Asphere Thickness Material Diameter 1 0.000000 −0.012399 LV193975 75.472 2 154.966472 AS 24.304901 SIO2V 82.008 3 529.820026 2.090993 HEV19397 82.074 4 150.769271 40.595812 SIO2V 84.201 5 5646.002857 29.581615 HEV19397 81.519 6 −1210.857565 22.741810 SIO2V 74.381 7 −182.994045 AS 34.025994 HEV19397 72.364 8 173.187773 25.484337 SIO2V 52.132 9 −296.185557 22.382287 HEV19397 47.253 10 0.000000 10.110510 SIO2V 44.035 11 0.000000 17.152556 HEV19397 46.863 12 51884.400557 AS 16.631540 SIO2V 54.537 13 −361.923018 63.995754 HEV19397 58.291 14 −878.387785 AS 34.625490 SIO2V 82.453 15 −136.078636 36.436642 HEV19397 85.494 16 0.000000 196.253966 HEV19397 89.191 17 −182.153238 AS −196.253966 REFL 149.252 18 150.956725 AS 196.253966 REFL 101.676 19 0.000000 36.446112 HEV19397 104.396 20 333.439228 55.820683 SIO2V 116.602 21 −309.405465 37.869545 HEV19397 116.527 22 −424.165104 20.518575 SIO2V 104.186 23 −285.104268 AS 0.896321 HEV19397 103.405 24 635.351851 9.997637 SIO2V 92.108 25 107.969149 40.308038 HEV19397 80.454 26 389.814743 9.996225 SIO2V 82.006 27 152.951561 26.349381 HEV19397 81.938 28 1310.914891 9.999638 SIO2V 84.278 29 275.521100 17.511021 HEV19397 89.677 30 1763.795762 26.773314 SIO2V 93.617 31 −289.165601 AS 9.639413 HEV19397 97.853 32 −1578.752955 AS 27.680692 SIO2V 106.237 33 −272.338400 9.732573 HEV19397 110.951 34 −3842.769867 AS 35.516033 SIO2V 122.549 35 −314.937511 28.595034 HEV19397 125.359 36 889.868029 47.614171 SIO2V 135.827 37 −355.067891 −12.204373 HEV19397 136.279 38 0.000000 0.000000 HEV19397 133.729 39 0.000000 28.717983 HEV19397 133.729 40 574.174423 AS 45.539693 SIO2V 132.500 41 −344.516223 0.852315 HEV19397 132.025 42 204.978326 45.863613 SIO2V 111.958 43 −6283.361425 AS 0.828469 HEV19397 106.831 44 87.555579 40.313564 SIO2V 74.022 45 201.419511 0.722913 HEV19397 64.044 46 86.647656 38.420734 CAF2V193 50.908 47 0.000000 0.300000 SIO2V 21.485 48 0.000000 0.000000 SIO2V 21.121 49 0.000000 3.000000 H2OV193B 21.121 50 0.000000 0.000000 AIR 16.500

TABLE 31A Aspherical Constants Surface 2 7 12 14 17 K 0 0 0 0 −205.145 C1 −5.06E−02 1.55E−01    −6.58E−02 −3.99E−02    −3.00E−02 C2 −1.36E−06 −4.50E−06    6.94E−07  7.46E−07   3.06E−07 C3 −1.39E−10 2.86E−10    −8.42E−10 −4.18E−11    −7.06E−12 C4  2.02E−14 3.18E−14   3.01E−14 −4.94E−18   1.35E−16 C5 −1.21E−18 −4.70E−18    9.27E−20  2.51E−19    −2.46E−21 C6  7.59E−23 2.24E−22    −5.52E−22 −2.26E−23   2.42E−26 C7 0.000000e+00    0.000000e+00   0.000000e+00 0.000000e+00    0.000000e+00 C8 0.000000e+00    0.000000e+00   0.000000e+00 0.000000e+00    0.000000e+00 C9 0.000000e+00    0.000000e+00   0.000000e+00 0.000000e+00    0.000000e+00 Surface 18 23 31 32 34 K −19.986 0 0 0 0 C1   5.81E−02    −5.44E−02 2.45E−02    −6.17E−02   2.25E−02 C2    −5.04E−07   5.13E−06 5.17E−07   1.84E−06    −1.23E−06 C3   2.61E−11    −2.58E−10 4.76E−11   9.77E−11    −5.97E−11 C4    −5.07E−16   1.19E−14 −1.55E−15     −8.36E−15   6.09E−15 C5   1.40E−20    −3.68E−19 8.15E−19   8.28E−19    −2.59E−19 C6    −4.71E−26   5.92E−24 −4.46E−23     −3.91E−23   5.18E−24 C7 0.000000e+00 0.000000e+00 0.000000e+00   0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00   0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00   0.000000e+00 0.000000e+00 Surface 40 43 K 0 0 C1 −3.76E−02     −2.60E−02 C2 7.18E−08   3.27E−06 C3 5.92E−11    −1.25E−10 C4 −1.80E−15    4.09E−15 C5 7.98E−21    −8.18E−20 C6 1.92E−25   8.62E−25 C7 0.000000e+00   0.000000e+00 C8 0.000000e+00   0.000000e+00 C9 0.000000e+00   0.000000e+00

TABLE 32 (EM29) Surface Radius Asphere Thickness Material ½ Diameter 1 0.000000 −0.011620 LV193975 75.462 2 585.070331 AS 17.118596 SIO2V 76.447 3 −766.901651 0.890161 HEV19397 78.252 4 145.560665 45.675278 SIO2V 85.645 5 2818.543789 AS 40.269525 HEV19397 83.237 6 469.396236 29.972759 SIO2V 75.894 7 −193.297708 AS 21.997025 HEV19397 73.717 8 222.509238 27.666963 SIO2V 57.818 9 −274.231957 31.483375 HEV19397 52.595 10 0.000000 10.117766 SIO2V 44.115 11 0.000000 15.361487 HEV19397 47.050 12 26971.109897 AS 14.803554 SIO2V 54.127 13 −562.070426 45.416373 HEV19397 58.058 14 −510.104298 AS 35.926312 SIO2V 76.585 15 −118.683707 36.432152 HEV19397 80.636 16 0.000000 199.241665 HEV19397 86.561 17 −181.080772 AS −199.241665 REFL 147.684 18 153.434246 AS 199.241665 REFL 102.596 19 0.000000 36.432584 HEV19397 105.850 20 408.244008 54.279598 SIO2V 118.053 21 −296.362521 34.669451 HEV19397 118.398 22 −1378.452784 22.782283 SIO2V 106.566 23 −533.252331 AS 0.892985 HEV19397 105.292 24 247.380841 9.992727 SIO2V 92.481 25 103.088603 45.957039 HEV19397 80.536 26 −1832.351074 9.992069 SIO2V 80.563 27 151.452362 28.883857 HEV19397 81.238 28 693.739003 11.559320 SIO2V 86.714 29 303.301679 15.104783 HEV19397 91.779 30 1016.426625 30.905849 SIO2V 95.900 31 −258.080954 AS 10.647394 HEV19397 99.790 32 −1386.614747 AS 24.903261 SIO2V 108.140 33 −305.810572 14.249112 HEV19397 112.465 34 −11755.656826 AS 32.472684 SIO2V 124.075 35 −359.229865 16.650084 HEV19397 126.831 36 1581.896158 51.095339 SIO2V 135.151 37 −290.829022 −5.686977 HEV19397 136.116 38 0.000000 0.000000 HEV19397 131.224 39 0.000000 28.354383 HEV19397 131.224 40 524.037274 AS 45.835992 SIO2V 130.144 41 −348.286331 0.878010 HEV19397 129.553 42 184.730622 45.614622 SIO2V 108.838 43 2501.302312 AS 0.854125 HEV19397 103.388 44 89.832394 38.416586 SIO2V 73.676 45 209.429378 0.697559 HEV19397 63.921 46 83.525032 37.916651 CAF2V193 50.040 47 0.000000 0.300000 SIO2V 21.480 48 0.000000 0.000000 SIO2V 21.116 49 0.000000 3.000000 H2OV193B 21.116 50 0.000000 0.000000 AIR 16.500

TABLE 32A Aspherical Constants Surface 2 5 7 12 14 K 0 0 0 0 0 C1 −5.72E−02    −4.71E−02   1.75E−01 −8.29E−02 −4.35E−02 C2 −2.97E−07   7.04E−06    −1.17E−05 −1.87E−07  1.59E−06 C3  1.03E−12   1.09E−10   1.34E−09 −7.04E−10 −6.81E−11 C4  2.76E−14    −2.90E−14    −5.44E−14  6.65E−14  5.03E−15 C5 −1.51E−18    −1.55E−21    −1.82E−18 −1.33E−17 −1.68E−23 C6 −1.04E−24   5.61E−23   2.56E−22  2.46E−21 −2.36E−23 C7 0.000000e+00    0.000000e+00 0.000000e+00 0.000000e+00    0.000000e+00    C8 0.000000e+00    0.000000e+00 0.000000e+00 0.000000e+00    0.000000e+00    C9 0.000000e+00    0.000000e+00 0.000000e+00 0.000000e+00    0.000000e+00    Surface 17 18 23 31 32 K −197.849 −204.054 0 0 0 C1    −2.94E−02   5.77E−02    −7.06E−02 3.41E−02    −4.85E−02 C2   2.63E−07    −5.00E−07   4.11E−06 4.07E−08   9.88E−07 C3    −6.11E−12   2.67E−11    −1.18E−10 8.10E−11   7.37E−11 C4   1.11E−16    −5.69E−16   2.92E−15 −4.34E−15     −6.56E−15 C5    −2.01E−21   1.89E−20    −3.23E−20 7.59E−19   6.53E−19 C6   2.08E−26    −1.49E−25   2.18E−25 −3.41E−23     −2.88E−23 C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00   0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00   0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00   0.000000e+00 Surface 34 40 43 K 0 0 0 C1 1.59E−02    −4.10E−02    −3.89E−02 C2 −1.51E−06    3.04E−07   4.76E−06 C3 6.62E−13   5.71E−11    −2.23E−10 C4 1.72E−15    −1.72E−15   8.89E−15 C5 −9.36E−20     −9.60E−22    −2.41E−19 C6 2.36E−24   3.81E−25   3.43E−24 C7 0.000000e+00   0.000000e+00 0.000000e+00 C8 0.000000e+00   0.000000e+00 0.000000e+00 C9 0.000000e+00   0.000000e+00 0.000000e+00

TABLE 34 (EM26) WL 193.368 nm 193.468 nm 193.268 nm SIO2V′ 1.5607857 1.56062813 1.56094365 CAF2V193′  1.50175423 1.50185255 1.50195109 H2OV193′ 1.4364632 1.43667693 1.43689123 NA 1.2; Fmin = 18.63 mm; Fmax = 66 mm Surface Radius Thickness Material ½Diam. Type 0 0.000000000 31.982585487 AIR 66.000 1 0.000000000 −0.017071913 AIR 76.172 2 147.976296433 25.157601132 SIO2V 83.329 3 483.267348199 66.318217434 AIR 83.329 4 6843.187124890 14.990603080 SIO2V 89.462 5 −10922.857227200 0.990910304 AIR 89.696 6 185.444884732 43.423576628 SIO2V 90.336 7 −291.453552095 0.988388071 AIR 88.691 8 75.552245567 18.214694705 SIO2V 66.883 9 76.794787833 36.638500036 AIR 60.819 10 119.890093734 18.824651829 SIO2V 50.527 11 1688.559592410 8.584817314 AIR 45.933 12 0.000000000 0.000000000 AIR 38.451 13 0.000000000 52.042672045 AIR 38.545 14 −59.826650342 14.981853380 SIO2V 48.449 15 −143.442731652 0.981820223 AIR 65.183 16 −809.267677971 22.623991877 SIO2V 74.792 17 −189.427877067 23.734179117 AIR 79.164 18 −404.048228936 40.321323389 SIO2V 94.462 19 −133.255827443 0.996126038 AIR 98.239 20 −532.626067795 25.229572964 SIO2V 102.508 21 −218.631437997 34.992902498 AIR 104.152 22 0.000000000 232.569743258 AIR 102.146 23 −203.850853866 −232.569743258 AIR 154.862 REFL 24 180.897913619 232.569743258 AIR 125.795 REFL 25 0.000000000 35.093353727 AIR 89.945 26 −2097.871590640 18.902530877 SIO2V 88.318 27 −311.592066935 1.000926290 AIR 88.349 28 197.040247642 14.994864591 SIO2V 82.980 29 123.794489384 39.397144698 AIR 76.695 30 −351.625590566 14.996140251 SIO2V 76.667 31 194.519969585 25.840876165 AIR 79.734 32 −783.090311926 14.999335864 SIO2V 81.725 33 602.209892650 15.636785753 AIR 89.884 34 −860.877333066 40.308090334 SIO2V 92.572 35 −144.751331394 0.995503627 AIR 96.367 36 489.496864563 22.261422840 SIO2V 107.265 37 −1492.086252490 0.998123009 AIR 108.225 38 542.517785037 42.667711177 SIO2V 110.092 39 −278.956019182 30.784648856 AIR 110.074 40 −143.206504187 16.457194925 SIO2V 109.358 41 −245.275186574 0.991006459 AIR 118.513 42 450.076146500 56.637715430 SIO2V 124.493 43 −281.238265383 0.994417156 AIR 124.569 44 173.286659802 30.025805518 SIO2V 105.228 45 405.488019133 4.969943131 AIR 101.974 46 170.349078374 38.966672867 SIO2V 93.740 47 78634.784391100 0.980473718 AIR 86.875 48 65.899645851 30.022369482 SIO2V 58.766 49 115.328388498 0.871701885 AIR 51.820 50 70.957276330 32.640666401 CAF2V193 44.305 51 0.000000000 3.000000148 H2OV193 21.157 52 0.000000000 0.000000000 AIR 16.500

TABLE 34A Aspherical Constants Surface K C1 C2 C3 C4 2 0.00000000e+000 −4.78882631e−008 −1.07874702e−012 −3.02679637e−016 1.88733824e−020 4 0.00000000e+000  6.93936013e−009  4.14547565e−012 −2.44188432e−016 3.37511708e−020 7 0.00000000e+000  2.35987002e−008  8.31924580e−012 −7.77774842e−016 6.50303307e−021 11 0.00000000e+000  1.26922184e−007 −4.36848744e−011  4.57206313e−015 1.74083492e−018 15 0.00000000e+000  7.93042774e−008 −2.07633723e−013  3.76353009e−016 7.36365299e−020 18 0.00000000e+000 −1.97913247e−009 −8.66959877e−013  6.04641277e−017 −4.73473989e−021  20 0.00000000e+000 −5.08811298e−009 −3.02758381e−013 −6.93452917e−018 3.42662757e−022 23 0.00000000e+000  9.00942854e−009  1.77368463e−013  2.86086903e−018 5.71387977e−023 24 0.00000000e+000 −6.79867230e−009 −1.66279668e−013 −3.17226607e−018 −2.14919508e−022  26 0.00000000e+000 −5.37053896e−008  1.67618239e−012  4.07995560e−016 −3.53050500e−020  36 0.00000000e+000 −3.31965207e−008  6.14833787e−013  2.40373774e−017 1.18984531e−022 41 0.00000000e+000 −1.38336514e−008  8.93474375e−013 −2.71551009e−017 1.74375713e−021 45 0.00000000e+000  1.44983141e−008 −1.95881989e−014 −1.05859436e−016 5.32744894e−021 47 0.00000000e+000  3.11232761e−008  2.84716248e−012 −1.11706969e−016 −2.66038924e−021  Surface C5 C6 C7 C8 2 −4.39149695e−025 −1.09132516e−028  −1.04998811e−035 7.96689244e−037 4 −5.06638092e−024 5.32303197e−028 −2.85457308e−032 3.58175757e−038 7  3.23059366e−024 −1.16477659e−030  −4.43574135e−032 2.44981381e−036 11 −1.38306535e−022 2.43454067e−025 −8.52163913e−029 1.77790237e−034 15 −4.68407947e−024 8.91865260e−029  8.87815151e−032 −8.32251546e−036  18  1.77442213e−025 4.52110292e−031 −2.53815340e−035 −4.30166930e−039  20 −9.21678831e−028 −3.68127185e−033   1.89749139e−038 −4.16625182e−039  23 −4.46902171e−028 1.13482418e−031 −3.89411163e−036 7.97497644e−041 24  1.19742697e−026 −1.09727605e−030   4.00797914e−035 −7.95846450e−040  26  9.00535444e−025 −3.46673523e−029  −6.86798043e−033 5.92310794e−037 36 −9.53667910e−026 4.93885674e−030 −2.90808572e−034 1.22198832e−039 41 −1.26665751e−025 5.84505761e−030 −2.30469572e−034 6.06339556e−039 45 −5.94726685e−026 2.48643254e−029 −1.88792088e−033 5.60469477e−038 47  2.43106684e−025 −3.95551801e−029  −7.28245783e−037 4.70291791e−038

TABLE 36 (EM27) WL 193.368 nm 193.468 nm 193.268 nm SIO2V′ 1.5607857 1.56062813 1.56094365 CAF2V193′  1.50175423 1.50185255 1.50195109 H2OV193′ 1.4364632 1.43667693 1.43689123 NA 1.2; Fmin = 18.63 mm; Fmax = 66 mm Surface Radius Asphere Thickness Material ½ Diameter 1 0.000000 −0.004216 LUFTV193 75.440 2 341.127979 AS 22.791928 SIO2V 77.399 3 −547.910038 0.998331 N2VP950 79.138 4 127.727169 41.232021 SIO2V 85.886 5 423.981317 AS 37.538965 N2VP950 83.125 6 1837.865411 20.893107 SIO2V 73.497 7 −224.309944 AS 1.002068 N2VP950 71.189 8 162.793881 28.373758 SIO2V 63.095 9 −357.404285 20.328095 N2VP950 58.827 10 −130.668159 9.997405 SIO2V 40.623 11 −153.854050 6.572008 N2VP950 37.125 12 0.000000 9.999712 SIO2V 37.199 13 0.000000 1.062092 N2VP950 40.839 14 743.447647 18.547401 SIO2V 42.269 15 −194.707721 22.944701 N2VP950 46.232 16 −91.226681 9.997232 SIO2V 51.224 17 −149.640287 18.143695 N2VP950 58.055 18 −523.085587 AS 23.764093 SIO2V 70.561 19 −159.366370 0.999029 N2VP950 75.025 20 −418.047917 AS 30.390060 SIO2V 78.905 21 −139.497541 36.995337 N2VP950 82.309 22 0.000000 202.057337 N2VP950 86.976 23 −179.767561 AS −202.057337 REFL 144.017 24 157.031815 AS 202.057337 REFL 107.178 25 0.000000 36.997499 N2VP950 101.742 26 440.441126 47.272805 SIO2V 111.232 27 −305.204169 41.252868 N2VP950 111.473 28 −462.717592 18.096500 SIO2V 101.263 29 −434.773502 AS 1.272365 N2VP950 100.762 30 323.034266 9.997203 SIO2V 90.351 31 107.871517 41.101537 N2VP950 80.055 32 −2104.261715 9.996146 SIO2V 80.354 33 162.693545 24.114798 N2VP950 82.448 34 461.867528 11.590831 SIO2V 88.405 35 292.431899 14.861810 N2VP950 92.938 36 1076.736610 38.645047 SIO2V 96.114 37 −233.326361 AS 4.528881 N2VP950 101.701 38 −818.919435 AS 26.752850 SIO2V 107.052 39 −301.917563 18.307802 N2VP950 113.375 40 −2069.863617 AS 54.519854 SIO2V 125.923 41 −240.586609 40.043329 N2VP950 131.701 42 0.000000 0.000000 N2VP950 138.484 43 0.000000 −20.273619 N2VP950 138.484 44 442.810512 63.820483 SIO2V 138.949 45 −533.873885 2.798052 N2VP950 139.304 46 662.397337 AS 40.282382 SIO2V 135.640 47 −428.200815 0.994361 N2VP950 134.489 48 213.024607 43.377768 SIO2V 113.450 49 3009.037627 AS 0.987971 N2VP950 107.741 50 95.712001 40.028327 SIO2V 77.581 51 241.528599 2.069796 N2VP950 67.915 52 85.826880 38.946996 CAF2V193 50.851 53 0.000000 3.000000 H2OV193 21.090 54 0.000000 0.000000 AIR 16.500

TABLE 36A Aspherical Constants Surface 2 5 7 18 20 K 0 0 0 0 0 C1 −6.825898e−08 −1.139291e−07  1.715001e−07 −5.525454e−08  −1.928670e−08  C2 −5.820149e−13 6.229489e−12 −3.362340e−12  −1.835201e−13  1.369964e−12 C3 −1.764721e−16 2.070760e−16 2.245144e−16 1.097082e−16 −1.178098e−16  C4  1.898479e−20 −3.072912e−20  6.731621e−20 2.983525e−22 −5.533661e−22  C5 −2.878598e−26 5.780651e−25 −1.102455e−23  −7.073376e−25  4.333159e−25 C6 −4.377548e−29 7.588531e−29 1.662149e−28 2.028418e−28 −5.576742e−29  C7  0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8  0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9  0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 Surface 23 24 29 37 38 K −1.94543 −2.30892 0 0 0 C1 −2.949816e−08  6.225716e−08 −9.081623e−08  1.700564e−08 −5.539058e−08  C2 2.672898e−13 −8.664624e−13  4.328932e−12 7.578402e−13 7.069194e−13 C3 −5.319153e−18  3.983466e−17 −9.663515e−17  6.487979e−17 7.954509e−17 C4 1.038342e−22 −1.106567e−21  1.861873e−21 −4.481439e−21  −5.116182e−21  C5 −1.448694e−27  3.014885e−26 −2.365064e−26  9.785695e−25 7.622924e−25 C6 1.457411e−32 −3.386885e−31  4.413420e−31 −4.763684e−29  −3.862189e−29  C7 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 0.000000e+00 Surface 40 46 49 K 0 0 0 C1 −6.320049e−10  −2.772679e−08  −2.949915e−08  C2 −1.306440e−13  −1.390524e−13  3.478719e−12 C3 −3.923481e−17  4.871921e−17 −1.481636e−16  C4 2.072577e−21 −1.427007e−21  6.052349e−21 C5 −6.511387e−26  7.907911e−27 −1.731162e−25  C6 1.538497e−30 1.183697e−31 2.820274e−30 C7 0.000000e+00 0.000000e+00 0.000000e+00 C8 0.000000e+00 0.000000e+00 0.000000e+00 C9 0.000000e+00 0.000000e+00 0.000000e+00

TABLE 37 (j342p) Surface Radius Asphere Thickness Material ½ Diameter 0 0.000000 32.000671 66.0 1 153.319623 25.301467 SILUV 83.9 2 362.312706 1.846656 83.3 3 249.932462 10.039369 SILUV 83.5 4 296.617151 16.156206 82.9 5 129.380687 32.591808 SILUV 85.8 6 353.939024 25.413158 83.3 7 441.659706 33.067185 SILUV 77.6 8 −249.821483 0.999731 73.0 9 242.432431 23.800036 SILUV 66.0 10 −418.172385 16.233683 62.2 11 −135.497448 9.999688 SILUV 53.8 12 −172.144731 14.407576 51.0 13 0.000000 14.446986 37.2 14 403.537798 17.810754 SILUV 47.2 15 −250.734154 43.083755 50.0 16 −86.913472 14.999924 SILUV 58.5 17 −119.371112 3.501271 67.2 18 −227.124051 29.708033 SILUV 72.5 19 −115.706665 0.999372 77.3 20 −6458.564488 21.246094 SILUV 81.9 21 −316.595524 244.245108 83.5 22 −175.503346 −209.246168 REFL 137.3 23 172.837073 259.698197 REFL 116.6 24 286.122846 54.616082 SILUV 114.1 25 −319.487475 0.999912 113.6 26 966.963595 26.197513 SILUV 104.1 27 −1040.269926 1.072535 101.1 28 1363.207517 10.039037 SILUV 93.7 29 99.625589 52.260353 77.5 30 4756.567563 10.000836 SILUV 78.0 31 153.387698 31.977828 78.4 32 −621.996267 10.519453 SILUV 80.7 33 337.392641 11.072501 89.8 34 737.023107 38.757083 SILUV 94.6 35 −226.600466 0.999349 98.8 36 2080.296355 23.152743 SILUV 107.0 37 −464.590999 1.039809 110.3 38 1055.490633 38.268883 SILUV 115.5 39 −319.028277 39.203877 117.8 40 653.756661 35.609928 SILUV 125.1 41 −584.439739 12.416338 125.1 42 531.560104 43.648724 SILUV 121.9 43 −344.752529 0.999813 121.1 44 216.368978 41.075323 SILUV 104.1 45 −1287.916059 1.004925 99.2 46 80.185742 39.619634 SILUV 69.4 47 176.364295 1.538101 59.8 48 85.292538 38.558988 SILUV 48.9 49 0.000000 3.000000 H2O 21.1 50 0.000000 16.5

TABLE 37A Aspherical Constants Surface 3 8 20 22 23 K 0 0 0 −2.68078 −2.40925 C1 −3.607637E−08  1.865463E−07 −2.924038E−08 −4.659443E−08  5.109968E−08 C2 −2.229774E−12 −7.002614E−12 −1.606274E−13  1.037806E−12 −5.972057E−13 C3 −9.424200E−17  6.321555E−16 −3.464603E−17 −3.569130E−17  2.704163E−17 C4  2.475481E−20 −2.270568E−20 −8.460050E−22  1.252351E−21 −7.866414E−22 C5 −2.200899E−24 −7.376870E−24 −3.093437E−26 −4.105857E−26  3.951644E−26 C6  2.031865E−28  4.292117E−28  1.330447E−29  1.072302E−30 −1.866653E−30 C7 −1.376196E−32 −4.030529E−32 −2.982210E−33 −1.880272E−35  6.750678E−35 C8  1.838592E−38  6.145449E−36  1.368410E−37  1.598017E−40 −1.047201E−39 Surface 27 36 38 42 45 K 0 0 0 0 0 C1 −7.658966E−08 −5.016408E−08  −9.533350E−10 −3.314101E−08 −6.295604E−09 C2  5.681524E−12 6.321012E−13 −5.085963E−13  3.915833E−13  2.792116E−12 C3 −2.238871E−16 1.067455E−16 −9.972640E−17  5.982003E−17 −1.225842E−16 C4  5.298747E−21 −7.397651E−21   6.787141E−21 −1.575240E−21  1.102964E−20 C5  6.569464E−25 1.926832E−25 −1.791598E−25 −3.559970E−26 −1.065854E−24 C6 −9.223653E−29 6.753657E−30 −3.368098E−30  1.054274E−30  8.785997E−29 C7  5.022050E−33 −9.556799E−34   3.525219E−34  1.406168E−35 −4.393692E−33 C8 −1.105440E−37 1.329917E−38 −3.436374E−39 −3.845075E−40  1.041770E−37

TABLE 38 (j344p) Surface Radius Asphere Thickness Material ½ Diameter 0 0.000000 35.248514 66.0 1 143.248122 28.781110 SILUV 86.3 2 358.453084 2.742037 85.3 3 249.892226 15.480033 SILUV 85.2 4 590.981355 14.283399 84.5 5 117.666799 24.212151 SILUV 83.0 6 167.854363 18.418499 79.6 7 383.299246 37.170753 SILUV 78.0 8 −249.806207 1.005138 72.8 9 176.708488 25.812894 SILUV 64.2 10 −489.209320 17.845992 60.0 11 −138.689463 10.119648 SILUV 47.3 12 −180.883089 11.123457 43.8 13 1814.626805 14.880881 SILUV 38.4 14 −249.444318 45.270915 42.1 15 −80.916188 15.005805 SILUV 54.4 16 −125.947065 2.167332 65.0 17 −470.801754 30.186754 SILUV 72.8 18 −134.611795 2.050714 78.1 19 −522.384219 31.415391 SILUV 84.0 20 −154.268791 249.623006 87.1 21 −181.420630 −209.608609 REFL 140.1 22 169.119629 250.842406 REFL 114.7 23 291.616363 51.793776 SILUV 110.3 24 −309.683041 17.091881 109.8 25 −940.483291 12.127436 SILUV 99.3 26 −42805.292832 1.002005 97.3 27 220.631691 10.003981 SILUV 88.3 28 99.320400 49.161757 77.3 29 −561.336190 9.999954 SILUV 77.2 30 154.957512 24.909934 79.0 31 1924.820454 13.223705 SILUV 81.7 32 303.786903 14.995612 89.2 33 1300.890310 31.155401 SILUV 93.9 34 −258.803624 9.929012 98.4 35 −3575.038127 30.701987 SILUV 109.0 36 −265.328196 2.056209 113.6 37 2294.378555 44.440918 SILUV 123.1 38 −267.747777 29.673499 125.9 39 557.248167 36.861702 SILUV 131.7 40 −783.213643 −0.938224 131.3 41 −14802.205529 16.206383 129.7 42 828.039709 43.221788 SILUV 129.1 43 −324.649154 0.998849 128.8 44 206.870457 45.792196 SILUV 109.6 45 −1913.727624 0.997376 104.5 46 81.421622 39.892459 SILUV 70.6 47 171.051496 1.070665 60.3 48 81.435251 36.484505 CAFUV 48.6 49 0.000000 3.000000 H2O 21.1 50 0.000000 16.5

TABLE 38A (j344p) Aspherical Constants Surface 3 8 17 19 21 K 0 0 0 0 −2.35919 C1 −4.239547E−08 1.776408E−07 −3.517097E−08 −2.260275E−08 −3.531314E−08 C2 −3.439882E−12 −7.365374E−12  −1.680998E−12  1.477964E−12  5.754980E−13 C3  2.585420E−17 6.010661E−16  1.988836E−16 −5.557313E−17 −1.422154E−17 C4 −7.398192E−21 3.465765E−20 −8.317822E−21 −1.521633E−21  3.469778E−22 C5  2.490541E−24 −1.352374E−23   1.490936E−25  2.529206E−25 −6.366916E−27 C6 −1.543807E−28 7.789367E−28  9.086464E−29 −2.473128E−29  6.303151E−32 Surface 22 26 34 35 37 K −2.55041 0 0 0 0 C1  5.763867E−08 −9.608615E−08 1.305280E−08 −5.677213E−08  3.512847E−09 C2 −8.648037E−13  4.888828E−12 5.858393E−13  1.460926E−12 −4.457077E−13 C3  3.811912E−17 −1.061062E−16 −2.240057E−17   7.309271E−17 −9.211061E−17 C4 −1.031346E−21  2.226871E−21 1.299691E−21 −7.691388E−21  7.360949E−21 C5  2.586799E−26  6.374143E−26 1.071950E−25  4.906816E−25 −3.041901E−25 C6 −2.333304E−31 −5.123581E−30 −1.228055E−29  −1.882267E−29  6.008115E−30 Surface 42 45 K 0 0 C1 −2.753413E−08 −2.014104E−08 C2 −1.731330E−13  3.259304E−12 C3  6.979195E−17 −1.414937E−16 C4 −2.163794E−21  5.867152E−21 C5  9.215216E−27 −1.748151E−25 C6  2.896055E−31  3.188929E−30

TABLE 39 (dave 040421) Surface Radius Asphere Thickness Material ½ Diameter 0 0.000000 40.000000 68.0 1 146.623761 AS 35.648639 SIO2V 84.3 2 −262.402199 AS 11.489893 86.4 3 −1418.271111 AS 55.535686 SIO2V 89.1 4 −149.803131 80.058956 92.8 5 −316.127680 −80.058956 REFL 66.8 6 −149.803131 −55.535686 SIO2V 77.9 7 −1418.271111 −11.489893 77.7 8 −262.402199 11.489893 REFL 78.4 9 −1418.271111 55.535686 SIO2V 88.5 10 −149.803131 90.058608 97.6 11 −318.170858 AS 42.027645 SIO2V 125.7 12 −174.217513 221.335808 130.9 13 −245.648700 AS −201.335981 REFL 202.8 14 114.970031 AS 241.335931 REFL 93.2 15 372.783567 AS 46.864614 SIO2V 124.6 16 −819.903755 1.038628 123.6 17 177.861341 41.772805 SIO2V 112.5 18 341.365208 37.021407 104.9 19 −466.562113 12.000000 SIO2V 100.5 20 162.712763 42.079202 91.1 21 −370.098539 12.000000 SIO2V 91.3 22 462.418362 26.721285 96.0 23 −356.944827 27.234109 SIO2V 97.2 24 −176.415718 1.000000 100.3 25 250.680892 AS 35.225819 SIO2V 109.0 26 −1151.380195 1.000000 108.8 27 400.524336 38.251924 SIO2V 107.1 28 −405.535651 31.160614 105.6 29 −149.637246 50.218339 SIO2V 104.4 30 −384.493074 AS 30.129631 114.6 31 0.000000 −29.129631 116.2 32 266.421209 50.004341 SIO2V 116.1 33 −466.737916 1.000000 115.2 34 142.958212 42.562558 SIO2V 102.2 35 432.609562 AS 0.098646 97.2 36 114.421108 32.582267 SIO2V 82.2 37 573.116962 AS 1.000000 76.7 38 60.777409 26.925305 SIO2V 52.9 39 76.682879 1.000000 41.9 40 70.399871 26.141931 CAF2V193 40.0 41 0.000000 3.000000 H2OV193 21.6 42 0 0 17.0

TABLE 39A (dave 040421) Aspherical Constants Surface 1 2 3 11 13 K 0 0 0 0 0 C1 −3.341087E−07  8.388602E−08  3.429680E−08  3.116059E−09 3.046218E−09 C2 −2.505072E−12 −1.111052E−11 −9.182012E−12  4.201540E−13 4.170047E−14 C3  2.943082E−15  1.569768E−15  8.908974E−16 −8.967249E−17 3.681161E−19 C4 −4.955011E−19 −1.841754E−19 −1.039175E−19  4.467021E−21 2.802579E−23 C5  4.666851E−23  1.342877E−23  7.467060E−24 −1.240183E−25 −1.004802E−27  C6 −1.905456E−27 −4.061739E−28 −2.463306E−28 −3.737311E−31 3.611732E−32 C7 −6.507196E−37  C8 6.094959E−42 Surface 14 15 25 30 35 K 0 0 0 0 0 C1 −1.471452E−07 1.493626E−09 −2.761928E−08 3.891658E−09  8.202081E−10 C2  3.389142E−12 7.786239E−13  1.065077E−13 −2.344148E−13  −6.269685E−13 C3 −1.091618E−15 3.130190E−17  8.399310E−18 1.511118E−17 −2.459088E−16 C4  1.594470E−19 2.199868E−22 −2.005406E−21 −1.816247E−21   5.806198E−20 C5 −2.248477E−23 −1.132529E−25   1.619754E−25 3.834331E−26 −3.997034E−24 C6  1.655691E−27 2.738900E−30 −8.094709E−30 5.510731E−31  1.041043E−28 C7 −5.527960E−32 C8 −3.066052E−37 Surface 37 K 0 C1 1.252989E−07 C2 2.533320E−12 C3 1.123761E−16 C4 −1.266332E−19  C5 1.618688E−23 C6 −8.614797E−28  C7 C8

TABLE 40 (d125i9) Surface Radius Asphere Thickness Material ½ Diameter 0 0.000000 31.999820 72.0 1 1121.871530 AS 22.353990 SIO2V 81.6 2 −593.507575 151.330057 83.2 3 −276.701090 −150.330068 REFL 99.4 4 −1841.732700 158.991136 REFL 58.1 5 −1993.161426 66.359854 SIO2V 129.7 6 −226.138813 0.999989 137.1 7 320.967306 58.008492 SIO2V 147.2 8 −521.971452 AS 138.103093 146.7 9 1018.489753 AS 33.863171 SIO2V 132.4 10 −836.147368 169.056435 131.1 11 −150.333251 22.332601 SIO2V 98.2 12 −264.622066 19.637756 104.6 13 −642.439229 −19.637756 REFL 105.6 14 −264.622066 −22.332601 SIO2V 96.6 15 −150.333251 −169.056435 86.0 16 −836.147368 −33.863171 SIO2V 72.6 17 1018.489753 AS −94.088120 78.6 18 196.895316 −14.999941 SIO2V 99.4 19 1436.276484 −28.015060 114.2 20 263.470635 28.015060 REFL 117.3 21 1436.276484 14.999941 SIO2V 115.4 22 196.895316 94.088120 104.5 23 1018.489753 AS 33.863171 SIO2V 98.4 24 −836.147368 232.111001 96.3 25 −203.114130 AS 20.739811 SIO2V 89.7 26 −179.567740 1.000292 94.4 27 214.374385 45.853859 SIO2V 107.3 28 −685.859253 AS 14.406908 106.3 29 155.448944 34.186529 SIO2V 99.0 30 402.440360 26.948978 95.4 31 1784.180000 14.999955 SIO2V 87.8 32 215.162499 22.977434 79.8 33 −1182.190098 22.085678 SIO2V 78.7 34 −212.011934 1.511427 77.6 35 −2234.326431 AS 16.015583 SIO2V 73.6 36 102.656630 55.587588 68.2 37 227.255721 75.569686 SIO2V 88.7 38 −317.233998 1.001303 92.3 39 1810.772356 AS 34.492120 SIO2V 91.9 40 −251.541624 3.237774 94.2 41 0.000000 −2.238080 92.7 42 312.037351 16.355638 SIO2V 94.5 43 1101.731550 AS 0.999509 94.2 44 373.203773 35.331514 SIO2V 95.0 45 −352.262575 0.999305 95.0 46 800.952563 34.674551 SIO2V 91.8 47 −210.477645 AS 0.999728 90.3 48 72.234210 29.521553 SIO2V 58.5 49 126.294484 7.096090 50.0 50 89.472175 36.272448 SIO2V 41.5 51 0.000000 0.000000 18.0

TABLE 40A (d125i9) Aspherical Constants Surface 1 8 9 17 23 K 0 0 0 0 0 C1 −6.489547E−09  1.779063E−08 −2.537260E−09  −2.537260E−09  −2.537260E−09  C2  2.573979E−12 −1.318309E−13 8.794118E−14 8.794118E−14 8.794118E−14 C3 −6.945437E−18  1.871976E−18 1.370489E−18 1.370489E−18 1.370489E−18 C4 −9.856064E−22 −2.538137E−23 2.480376E−23 2.480376E−23 2.480376E−23 C5 −5.398838E−26  5.262554E−28 3.221917E−28 3.221917E−28 3.221917E−28 C6  3.582736E−29 −4.568847E−33 −1.526882E−32  −1.526882E−32  −1.526882E−32  Surface 25 28 35 39 43 K 0 0 0 0 0 C1  3.488627E−08  5.518741E−08 −1.889508E−07 −1.194060E−07 2.132675E−08 C2 −5.495753E−13 −1.879963E−12 −7.683963E−12 −3.708989E−13 3.335407E−12 C3 −6.723461E−17 −1.208371E−18  9.545139E−17  4.020986E−17 8.797815E−17 C4  2.810907E−21  8.370662E−22  1.920197E−20 −1.082725E−20 −6.582985E−21  C5 −1.827899E−25 −3.751988E−26  1.709381E−24  3.369011E−26 −4.306562E−26  C6  4.402454E−30  1.768617E−30 −4.887431E−30  1.763283E−29 1.609953E−29 Surface 47 K 0 C1 1.327564E−08 C2 8.696711E−13 C3 −1.462960E−16  C4 1.072413E−20 C5 −5.792663E−25  C6 7.946613E−30

TABLE 41 FIG. NA Y′ N_(L) N_(OP) D_(max) COMP1 COMP2 COMP3 4 1.10 16.25 17 3 201.5 10.25 174.21 58.07 7 1.10 16.25 17 3 220.9 11.23 190.99 63.66 8 1.15 16.25 17 3 220.1 10.24 174.11 58.04 16 1.20 16.25 20 3 219.7 9.39 187.78 62.59 17 1.20 16.25 21 3 235.5 10.06 211.35 70.45 19 1.20 16.25 20 3 263.9 11.28 225.56 75.19 20 1.20 16.00 19 3 306.5 13.30 252.76 84.25 21 1.20 16.17 20 3 240.6 10.33 206.66 68.89 22 1.20 16.25 19 3 249.3 10.65 202.42 67.47 23 1.20 16.17 18 3 264.2 11.35 204.24 68.08 27 1.20 16.50 23 3 269.9 11.36 261.27 87.09 28 1.20 16.50 23 3 229.4 9.65 222.06 74.02 30 1.20 16.50 21 3 266.1 11.20 235.19 78.40 31 1.20 16.50 20 3 272.6 11.47 229.46 76.49 32 1.20 16.50 20 3 272.3 11.46 229.21 76.40 34 1.20 16.50 22 3 241.0 10.14 223.15 74.38 36 1.20 16.50 23 3 278.6 11.73 269.69 89.90 37 1.20 16.50 23 3 250.2 10.53 242.20 80.73 38 1.20 16.50 23 3 263.4 11.09 254.97 84.99 39 1.20 17.00 16 3 260.0 10.62 169.93 56.64 40 1.05 18.00 19 3 294.0 14.81 281.48 93.83 

1-16. (canceled)
 17. A lithographic process for making an integrated circuit, comprising: projecting, using ultraviolet light, a pattern of a mask onto a semiconductor wafer supporting a layer sensitive to the ultraviolet light, the projecting comprising: imaging the pattern to a first intermediate image using a first objective part of a catadioptric projection objective, a first pupil surface being formed between the pattern and the first intermediate image; imaging the first intermediate image to a second intermediate image using a second objective part of the catadioptric projection objective, the second objective part comprising two concave mirrors, the ultraviolet light illuminating a continuous area of a reflective surface of each of the two concave mirrors, and a second pupil surface being formed between the first intermediate image and the second intermediate image; imaging the second intermediate image to a final image at the semiconductor wafer using a third objective part of the catadioptric projection objective, a third pupil surface being formed between the second intermediate image and the final image, wherein both concave mirrors are arranged optically remote from the pupil surfaces.
 18. The process of claim 17, wherein the numerical aperture of the catadioptric projection objective at the semiconductor wafer is 1.05 or more and the ultraviolet light has a wavelength of 193 nm.
 19. The process of claim 17, wherein the pattern is imaged to the first intermediate image by focusing the ultraviolet light solely by refraction.
 20. The process of claim 17, wherein the first intermediate image is imaged to the second intermediate image by focusing the ultraviolet light solely by reflection.
 21. The process of claim 20, wherein the first intermediate image is imaged to the second intermediate image by focusing the ultraviolet light by both refraction and reflection.
 22. The process of claim 17, wherein the projecting further comprises providing liquid water in a path of the ultraviolet light between the catadioptric projection objective and the semiconductor wafer.
 23. The process of claim 17, wherein both concave mirrors are arranged optically remote from a pupil surface at a position where a chief ray height exceeds a marginal ray height of the imaging process.
 24. The process of claim 17, wherein the first, second, and third objective parts share a common straight optical axis.
 25. The process of claim 17, wherein at least one of the two concave mirrors is aspheric.
 26. The process of claim 17, wherein the third objective part comprises at least two negative lenses.
 27. The process of claim 26, wherein an aperture stop is located in the third objective part and the at least two negative lenses are positioned between the second intermediate image and the aperture stop.
 28. The process of claim 17, wherein the catadioptric projection objective comprises an optical axis and the pattern is projected from a field that does not intersect the optical axis.
 29. The process of claim 28, wherein the pattern is projected into a field at the semiconductor wafer that does not intersect the optical axis.
 30. The process of claim 29, wherein the field at the semiconductor wafer has a dimension of 5.5 mm or more.
 31. The process of claim 30, wherein the field at the semiconductor wafer has a size of 26 mm×5.5 mm.
 32. The process of claim 17, wherein the image at the semiconductor wafer is reduced in size relative to the pattern. 